Dr. Christian Helke Profile

Dr. Christian Helke

Research Assistant at Fraunhofer-ENAS

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Author

Publications (10)

Proceedings Article | 9 April 2024 Poster + Paper

2.5D-patterning via i-line grayscale exposure for photonic structures and micro lens arrays

Sebastian Schermer, Christian Helke, Balaji Sake, Andrew Zanzal, Patrick Reynolds, Stephen DeMoor, Anja Voigt, Danny Reuter

Proceedings Volume 12956, 129560J (2024) https://doi.org/10.1117/12.3008954

KEYWORDS: Reticles, Etching, Dry etching, Manufacturing, Lens arrays, Grayscale lithography, Photoresist processing, Design, Scanning electron microscopy, Electron beam lithography

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Proceedings Article | 13 March 2024 Presentation + Paper

Combining nano-scale imprint lithography and reactive ion etching to fabricate high-quality surface relief gratings

Micha Haase, Nils Dittmar, Andrea Kneidinger, Patrick Schuster, Frederik Bachhuber, Christian Helke, Danny Reuter

Proceedings Volume 12898, 128980L (2024) https://doi.org/10.1117/12.3002254

KEYWORDS: Etching, Nanoimprint lithography, Reactive ion etching, Glasses, Photoresist processing

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Proceedings Article | 12 March 2024 Presentation + Paper

Aluminum-nitride-based modular photonic integrated circuit technology and characterization platform (PIC-TCP)

F. Tank, J. Wecker, C. Stöckel, C. Helke, S. Schermer, A. Shaporin, K. Hiller, D. Reuter

Proceedings Volume 12889, 128890B (2024) https://doi.org/10.1117/12.3000807

KEYWORDS: Etching, Aluminum nitride, Photonic integrated circuits, Silicon, Semiconducting wafers, Waveguides, Laser resonators, Dry etching, Cladding, Wafer level optics

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Proceedings Article | 5 October 2023 Paper

Development of an e-beam/i-line stepper intra-level mix and match approach with the photoresist mr-EBL 6000.5 for PIC related structures such as waveguides, ring resonators and coupling structures

M. Reinhardt, C. Helke, S. Schermer, S. Hartmann, A. Voigt, D. Reuter

Proceedings Volume 12802, 128020E (2023) https://doi.org/10.1117/12.2675558

KEYWORDS: Resonators, Electron beam lithography, Design and modelling, Lithography, Photonic integrated circuits, Ultraviolet radiation, Semiconducting wafers, Photoresist processing, Waveguides, Manufacturing

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Proceedings Article | 13 March 2023 Presentation + Paper

Tunable Fabry-Pérot interferometer integrated in a silicon waveguide of an on-chip optical platform for long infrared wavelengths

Julia Wecker, Karla Hiller, Toni Großmann, Susann Hahn, Steffen Kurth, Christian Helke, Matthias Küchler, Danny Reuter, Jörg Martin, Alexander Weiß, Harald Kuhn

Proceedings Volume 12426, 124260M (2023) https://doi.org/10.1117/12.2650524

KEYWORDS: Reflectors, Silicon, Waveguides, Tunable filters, Etching, Actuators, Transmittance, Optical filters, Quantum cascade lasers, Design and modelling

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Proceedings Article | 1 November 2022 Paper

Lithographic performance of resist ma-N 1402 in an e-beam/i-line stepper intra-level mix and match approach

C. Canpolat-Schmidt, G. Heldt, C. Helke, A. Voigt, D. Reuter

Proceedings Volume 12472, 124720J (2022) https://doi.org/10.1117/12.2639447

KEYWORDS: Electron beam lithography, Lithography, Photoresist processing, Scanning electron microscopy, Bottom antireflective coatings, Beam shaping, Silicon

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Proceedings Article | 4 March 2019 Paper

VIS Fabry-Pérot Interferometer with structured (TiO2/PE-SiO2)³ Bragg-reflectors on 5mm large LP-Si3N4 membranes

Christian Helke, Karla Hiller, Jan Seiler, Thomas Werner, Marco Meinig, Steffen Kurth, Thomas Otto

Proceedings Volume 10931, 109310Q (2019) https://doi.org/10.1117/12.2509170

KEYWORDS: Reflectors, Semiconducting wafers, Silicon, Reflectivity, Etching, Refractive index, Transmittance, Microelectromechanical systems, Fabry–Perot interferometers

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Proceedings Article | 28 September 2017 Paper

Challenges of nanostructure-integration in Fabry-Pérot interferometers as alternative to Bragg reflectors: an example for Match 1:1-, eBeam-, and nanoimprint lithography

Christian Helke, Karla Hiller, Jens Erben, Danny Reuter, Marco Meinig, Steffen Kurth, Christoph Nowak, Herberth Kleinjans, Thomas Otto

Proceedings Volume 10446, 104460J (2017) https://doi.org/10.1117/12.2279603

KEYWORDS: Reflectors, Nanoimprint lithography, Silicon, Interferometers, Surface enhanced Raman spectroscopy, Nanostructuring, Nanostructures, Electron beam lithography, Photoresist processing

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Proceedings Article | 31 August 2017 Paper

Large-scale fabrication of LP-CVD Si3N4 photonic crystal structures as freestanding reflectors with 1 mm aperture for Fabry-Pérot interferometers

Christian Helke, Karla Hiller, Thomas Werner, Danny Reuter, Marco Meinig, Steffen Kurth, Christoph Nowak, Herberth Kleinjans, Thomas Otto

Proceedings Volume 10354, 1035403 (2017) https://doi.org/10.1117/12.2271683

KEYWORDS: Reflectors, Reflectivity, Photonic crystals, Microelectromechanical systems, Nanoimprint lithography, Nanostructuring, Manufacturing, Nanostructures, Interferometers, Microopto electromechanical systems

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Proceedings Article | 15 March 2016 Paper

VIS Fabry-Pérot-Interferometer with (HL)4 PE-Si3N4/PE-SiO2 reflectors on freestanding LP-Si3N4 membranes for surface enhanced Raman spectroscopy

Christian Helke, Marco Meinig, Mario Seifert, Jan Seiler, Karla Hiller, Steffen Kurth, Jörg Martin, Thomas Gessner

Proceedings Volume 9760, 97600I (2016) https://doi.org/10.1117/12.2208567

KEYWORDS: Fabry–Perot interferometers, Micromachined deformable membrane mirrors, Surface enhanced Raman spectroscopy, Reflectors, Silicon, Spectroscopy, Glasses, Dry etching, Interferometers, Tunable filters, Molecules, Molecular spectroscopy, Reflectivity, Semiconducting wafers, Aluminum, Silica, Microelectromechanical systems, Etching

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Showing 5 of 10 publications

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