Dr. Christie R.K. Marrian Profile

Dr. Christie R.K. Marrian

Manager, Nanoscale Structures at Spansion Inc

SPIE Involvement:

Author | Editor

Proceedings Article | 24 July 2002 Paper

Facilities for fabricating nanostructures

Christie Marrian

Proceedings Volume 4608, (2002) https://doi.org/10.1117/12.465456

KEYWORDS: Nanostructures, Nanolithography, Etching, Nanofabrication, Microelectronics, Inspection, Silicon, Semiconductors, Humidity, Electron beam lithography

Read Abstract +

Proceedings Article | 25 June 1999 Paper

Sub-40-nm pattern replication with +/- 20% process latitude by soft-contact x-ray lithography

David Carter, Henry Smith, Kee Rhee, Christie Marrian

Proceedings Volume 3676, (1999) https://doi.org/10.1117/12.351076

KEYWORDS: Photomasks, X-rays, X-ray lithography, Nanolithography, Scanning electron microscopy, Image processing, Electrons, Polymethylmethacrylate, Lithography, X-ray imaging

Read Abstract +

Proceedings Article | 27 March 1997 Paper

Diffractive optical devices for spatial image separation

Dennis Prather, Hal Levitt, Edward Alexander, Christie Marrian, Anthony Spezio

Proceedings Volume 3073, (1997) https://doi.org/10.1117/12.270391

KEYWORDS: Diffractive optical elements, Sensors, Image segmentation, Phase measurement, Photodetectors, Optical components, Antennas, Diffraction, Optical design, Fabrication

Read Abstract +

Proceedings Article | 27 December 1996 Paper

Improved pattern placement in membrane mask making

F. Keith Perkins, Christie Marrian, Martin Peckerar

Proceedings Volume 2884, (1996) https://doi.org/10.1117/12.262817

KEYWORDS: Sensors, Photomasks, Raster graphics, Modulation, Diodes, Fourier transforms, Silicon, Amplifiers, Mask making, Electron beam lithography

Read Abstract +

SPIE Journal Paper | 1 September 1996

Proximity correction for electron beam lithography

Christie Marrian, Steven Chang, Martin Peckerar

OE, Vol. 35, Issue 09, (September 1996) https://doi.org/10.1117/12.10.1117/1.600846

KEYWORDS: Point spread functions, Electron beam lithography, Scattering, Laser scattering, Backscatter, Analog electronics, Optical engineering, Data processing, Electron beams, Optimization (mathematics)

Proceedings Article | 27 May 1996 Paper

Pattern-density-dependent contrast in commonly used dose-equalization schemes

Martin Peckerar, Christie Marrian

Proceedings Volume 2723, (1996) https://doi.org/10.1117/12.240463

KEYWORDS: Monte Carlo methods, Wind energy, Dielectric filters, Computer simulations, Tungsten, Data modeling, Distance measurement, Electronics, Analytical research, Lithography

Read Abstract +

Proceedings Article | 27 May 1996 Paper

Process latitude for 100-nm dimensions for e-beam lithography in SAL-601

Elizabeth Dobisz, Christie Marrian

Proceedings Volume 2723, (1996) https://doi.org/10.1117/12.240491

KEYWORDS: Monte Carlo methods, Electron beam lithography, Lithography, Polymethylmethacrylate, Diffusion, Electrons, Semiconducting wafers, Backscatter, Point spread functions, Photoresist processing

Read Abstract +

Proceedings Article | 27 May 1996 Paper

Position measurement of high-energy e-beams for pattern placement improvement

F. Keith Perkins, Daniel McCarthy, Christie Marrian, Martin Peckerar

Proceedings Volume 2723, (1996) https://doi.org/10.1117/12.240459

KEYWORDS: Sensors, Diodes, Modulation, Signal detection, Photomasks, Electrons, Fourier transforms, Silicon, Signal processing, Detection and tracking algorithms

Read Abstract +

Proceedings Article | 8 December 1995 Paper

Proximity correction for e-beam lithography

Christie Marrian, Steven Chang, Martin Peckerar

Proceedings Volume 2621, (1995) https://doi.org/10.1117/12.228169

KEYWORDS: Point spread functions, Scattering, Laser scattering, Electron beam lithography, Optimization (mathematics), Digital electronics, Backscatter, Data processing, Microelectronics, Integrated circuits

Read Abstract +

Proceedings Article | 19 May 1995 Paper

Error measure comparison of currently employed dose-modulation schemes for e-beam proximity effect control

Martin Peckerar, Christie Marrian

Proceedings Volume 2437, (1995) https://doi.org/10.1117/12.209187

KEYWORDS: Gallium arsenide, Monte Carlo methods, Scattering, Point spread functions, Backscatter, Excel, Convolution, Matrices, Modulation, Carbon

Read Abstract +

Proceedings Article | 13 May 1994 Paper

Comparison of dry-etch approaches for tungsten patterning

Elizabeth Dobisz, Charles Eddy, John Kosakowski, Orest Glembocki, Loretta Shirey, Kelly Foster, William Chu, Kee Rhee, D. Park, Christie Marrian, Martin Peckerar

Proceedings Volume 2194, (1994) https://doi.org/10.1117/12.175803

KEYWORDS: Etching, Reactive ion etching, Photomasks, Chemistry, Chromium, Ions, Argon, X-rays, Optical lithography, Electron beam lithography

Read Abstract +

Proceedings Article | 13 May 1994 Paper

Reactive-ion etching of tungsten for high-resolution x-ray masks

Loretta Shirey, Kelly Foster, William Chu, John Kosakowski, Kee Rhee, Elizabeth Dobisz, Charles Eddy, D. Park, I. Peter Isaacson, Daniel McCarthy, Christie Marrian, Martin Peckerar

Proceedings Volume 2194, (1994) https://doi.org/10.1117/12.175802

KEYWORDS: Etching, Chromium, Tungsten, Reactive ion etching, Photomasks, Reflectivity, X-rays, Electron beam lithography, Chemistry, Dry etching

Read Abstract +

Proceedings Article | 3 October 1993 Paper

Low voltage E-beam lithography with the STM

Christie Marrian, Elizabeth Dobisz, John Dagata

Proceedings Volume 10310, 1031005 (1993) https://doi.org/10.1117/12.183196

Proceedings Article | 3 October 1993 Paper

Technology of proximal probe lithography: an overview

John Dagata, Christie Marrian

Proceedings Volume 10310, 1031002 (1993) https://doi.org/10.1117/12.183184

SPIE Journal Paper | 1 October 1993

Thin silicon nitride films to increase resolution in e-beam lithography

Elizabeth Dobisz, Christie Marrian, R. Salvino, Mario Ancona, Kee Rhee, Martin Peckerar

OE, Vol. 32, Issue 10, (October 1993) https://doi.org/10.1117/12.10.1117/12.145970

KEYWORDS: Silicon, Electrons, Silicon films, Lithography, Electron beam lithography, Tungsten, Resolution enhancement technologies, Monte Carlo methods, Field effect transistors, X-rays

Read Abstract +

Proceedings Article | 24 June 1993 Paper

Thin silicon nitride films to increase resolution in e-beam lithography

Elizabeth Dobisz, Christie Marrian, R. Salvino, Mario Ancona, Kee Rhee, Martin Peckerar

Proceedings Volume 1924, (1993) https://doi.org/10.1117/12.146500

KEYWORDS: Silicon, Electrons, Resolution enhancement technologies, Monte Carlo methods, Silicon films, Tungsten, Lithography, Electron beam lithography, Electron beams, X-rays

Read Abstract +

Proceedings Article | 9 July 1992 Paper

Scanning tunneling microscope lithography: a viable lithographic technology?

Christie Marrian, Elizabeth Dobisz, John Dagata

Proceedings Volume 1671, (1992) https://doi.org/10.1117/12.136012

KEYWORDS: Scanning tunneling microscopy, Lithography, Electron beam lithography, Control systems, Silicon, Servomechanisms, Scanners, Microfabrication, Reactive ion etching, Oxides

Read Abstract +