Dr. Christopher Neil Anderson
Vice President of Photon Systems at xLight Inc
SPIE Involvement:
Conference Program Committee | Author
Publications (35)

Proceedings Article | 10 April 2024 Presentation + Paper
Proceedings Volume 12953, 129530T (2024) https://doi.org/10.1117/12.3012412
KEYWORDS: Speckle, Light sources and illumination, Free electron lasers, Photomasks, Scanners, Picosecond phenomena, Speckle pattern, Extreme ultraviolet lithography, Laser scanners, Projection systems

Proceedings Article | 9 April 2024 Presentation + Paper
Cong Que Dinh, Seiji Nagahara, Kayoko Cho, Hikari Tomori, Yuhei Kuwahara, Tomoya Onitsuka, Soichiro Okada, Shinichiro Kawakami, Arisa Hara, Seiji Fujimoto, Makoto Muramatsu, Reiko Tsuzuki, Xiang Liu, Arame Thiam, Yannick Feurprier, Kathleen Nafus, Michael Carcasi, Lior Huli, Kanzo Kato, Alexandra Krawicz, Michael Kocsis, Peter De Schepper, Lauren McQuade, Kazuki Kasahara, Jara Garcia Santaclara, Rik Hoefnagels, Bruno La Fontaine, Ryan Miyakawa, Chris Anderson, Patrick Naulleau
Proceedings Volume 12957, 1295705 (2024) https://doi.org/10.1117/12.3010207
KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, Inspection, Tin, Lithography, Etching

Proceedings Article | 1 May 2023 Paper
Cong Que Dinh, Seiji Nagahara, Yuhei Kuwahara, Arnaud Dauendorffer, Soichiro Okada, Seiji Fujimoto, Shinichiro Kawakami, Satoru Shimura, Makoto Muramatsu, Kayoko Cho, Xiang Liu, Kathleen Nafus, Michael Carcasi, Ankur Agarwal, Mark Somervell, Lior Huli, Kanzo Kato, Michael Kocsis, Peter De Schepper, Stephen Meyers, Lauren McQuade, Kazuki Kasahara, Jara Garcia Santaclara, Rik Hoefnagels, Chris Anderson, Patrick Naulleau
Proceedings Volume 12498, 1249806 (2023) https://doi.org/10.1117/12.2655928
KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, Line width roughness, Line edge roughness, Lithography, Etching

Proceedings Article | 1 December 2022 Presentation + Paper
Chawon Koh, Jinkyu Han, Jinmo Kim, Cheolhong Park, Eunju Kim, Tsunehiro Nishi, Chris Anderson, Patrick Naulleau
Proceedings Volume 12292, 1229203 (2022) https://doi.org/10.1117/12.2641648
KEYWORDS: Scanning electron microscopy, Nanoimprint lithography, Photomasks, Optical lithography, Printing, Extreme ultraviolet, Chemically amplified resists, Stochastic processes, Extreme ultraviolet lithography, Diffusion

Proceedings Article | 11 November 2022 Presentation
Proceedings Volume PC12292, PC1229206 (2022) https://doi.org/10.1117/12.2643076
KEYWORDS: Semiconducting wafers, Optical alignment, Metrology, Image processing, Ecosystems, Diagnostics, Computer security, Calibration

Proceedings Article | 22 February 2021 Presentation + Paper
Timothy Brunner, Jara Santaclara, Gerardo Bottiglieri, Chris Anderson, Patrick Naulleau
Proceedings Volume 11609, 1160906 (2021) https://doi.org/10.1117/12.2582751

Proceedings Article | 23 March 2020 Presentation + Paper
Chris Anderson, Arnaud Allezy, Weilun Chao, Lucas Conley, Carl Cork, Will Cork, Rene Delano, Jason DePonte, Michael Dickinson, Geoff Gaines, Jeff Gamsby, Eric Gullikson, Gideon Jones, Lauren McQuade, Ryan Miyakawa, Patrick Naulleau, Seno Rekawa, Farhad Salmassi, Brandon Vollmer, Daniel Zehm, Wenhua Zhu
Proceedings Volume 11323, 113230B (2020) https://doi.org/10.1117/12.2552125
KEYWORDS: Mirrors, Scanners, Semiconducting wafers, Scanning electron microscopy, Camera shutters, Image processing, Vibration isolation, Projection systems

Proceedings Article | 16 October 2019 Presentation
Proceedings Volume 11147, 1114712 (2019) https://doi.org/10.1117/12.2538717
KEYWORDS: Extreme ultraviolet lithography, Lithography, Photoresist materials, Robotic systems, Robotics, Printing

SPIE Journal Paper | 3 May 2019 Open Access
Guillaume Freychet, Isvar Cordova, Terry McAfee, Dinesh Kumar, Ronald Pandolfi, Chris Anderson, Scott Dhuey, Patrick Naulleau, Cheng Wang, Alexander Hexemer
JM3, Vol. 18, Issue 02, 024003, (May 2019) https://doi.org/10.1117/12.10.1117/1.JMM.18.2.024003
KEYWORDS: Scattering, X-rays, 3D image reconstruction, Extreme ultraviolet, X-ray imaging, Extreme ultraviolet lithography, 3D image processing, Modulation, Carbon, Image enhancement

Proceedings Article | 26 March 2019 Presentation + Paper
Christopher Anderson, Arnaud Allezy, Weilun Chao, Carl Cork, Will Cork, Rene Delano, Jason DePonte, Michael Dickinson, Geoff Gaines, Jeff Gamsby, Eric Gullikson, Gideon Jones, Stephen Meyers, Ryan Miyakawa, Patrick Naulleau, Senajith Rekawa, Farhad Salmassi, Brandon Vollmer, Daniel Zehm, Wenhua Zhu
Proceedings Volume 10957, 1095708 (2019) https://doi.org/10.1117/12.2516339
KEYWORDS: Scanning electron microscopy, Critical dimension metrology, Semiconducting wafers, Extreme ultraviolet lithography, Optical lithography, Monochromatic aberrations, Line width roughness, Photoresist materials, Image processing, Projection systems

Proceedings Article | 26 March 2019 Paper
Ryan Miyakawa, Chris Anderson, Wenhua Zhu, Geoff Gaines, Jeff Gamsby, Carl Cork, Gideon Jones, Michael Dickenson, Seno Rekawa, Weilun Chao, Sharon Oh, Patrick Naulleau
Proceedings Volume 10957, 109571X (2019) https://doi.org/10.1117/12.2516384
KEYWORDS: Wavefronts, Diffraction gratings, Interferometry, Shearing interferometers, Optical alignment, Diffraction, Optical design, Sensors, Multiplexing, Monochromatic aberrations

Proceedings Article | 12 October 2018 Presentation
Proceedings Volume 10809, 1080911 (2018) https://doi.org/10.1117/12.2501953
KEYWORDS: Wavefronts, Error analysis, Interferometry, Data modeling, Extreme ultraviolet, Shearing interferometers, Monochromatic aberrations, Projection lithography, Objectives, Optical resolution

Proceedings Article | 9 October 2018 Presentation + Paper
Guillaume Freychet, Isvar Cordova, Terry McAfee, Dinesh Kumar, Ronald Pandolfi, Chris Anderson, Patrick Naulleau, Cheng Wang, Alexander Hexemer
Proceedings Volume 10809, 108090V (2018) https://doi.org/10.1117/12.2502769
KEYWORDS: Scattering, X-rays, Extreme ultraviolet lithography, Modulation, Extreme ultraviolet, Carbon, X-ray imaging, Absorption, 3D image reconstruction, Laser scattering

Proceedings Article | 27 March 2017 Presentation + Paper
Ryan Miyakawa, Chris Anderson, Patrick Naulleau
Proceedings Volume 10143, 101430N (2017) https://doi.org/10.1117/12.2261893
KEYWORDS: Wavefronts, Metrology, Interferometry, Extreme ultraviolet, Optical testing, Wavefront sensors, Sensors, Inspection, Semiconducting wafers, Shearing interferometers, Monochromatic aberrations

Proceedings Article | 10 May 2016 Paper
Proceedings Volume 9984, 99840P (2016) https://doi.org/10.1117/12.2243321
KEYWORDS: Photomasks, Phase shifts, Optical lithography, Extreme ultraviolet, Printing, Chromium, Extreme ultraviolet lithography, Etching, Multilayers, Microscopes

Proceedings Article | 23 March 2012 Paper
Chris Anderson, Dominic Ashworth, Lorie Mae Baclea-An, Suchit Bhattari, Rikos Chao, Rene Claus, Paul Denham, Ken Goldberg, Andrew Grenville, Gideon Jones, Ryan Miyakawa, Ken Murayama, Hiroki Nakagawa, Senajith Rekawa, Jason Stowers, Patrick Naulleau
Proceedings Volume 8322, 832212 (2012) https://doi.org/10.1117/12.917386
KEYWORDS: Chemically amplified resists, Extreme ultraviolet, Mass attenuation coefficient, Optical lithography, Chemical elements, Extreme ultraviolet lithography, Phase shifts, Photomasks, Printing, Reticles

Proceedings Article | 16 April 2011 Paper
Patrick Naulleau, Christopher Anderson, Lorie-Mae Baclea-an, Paul Denham, Simi George, Kenneth Goldberg, Gideon Jones, Brittany McClinton, Ryan Miyakawa, Seno Rekawa, Nate Smith
Proceedings Volume 7972, 797202 (2011) https://doi.org/10.1117/12.882955
KEYWORDS: Line edge roughness, Extreme ultraviolet, Chemically amplified resists, Extreme ultraviolet lithography, Photons, Printing, Synchrotrons, Imaging spectroscopy, Stochastic processes, Light sources

Proceedings Article | 8 April 2011 Paper
Proceedings Volume 7969, 796917 (2011) https://doi.org/10.1117/12.879554
KEYWORDS: Distortion, Extreme ultraviolet lithography, 3D modeling, Photoresist materials, Extreme ultraviolet, Lithography, Silicon, Lanthanum, Current controlled current source, Electron beams

Proceedings Article | 8 April 2011 Paper
Christopher Anderson, Ryan Miyakawa, Patrick Naulleau
Proceedings Volume 7969, 796938 (2011) https://doi.org/10.1117/12.881553
KEYWORDS: Holograms, Speckle, Extreme ultraviolet, Holographic optical elements, Diffraction, Speckle pattern, Holography, Binary data, Beam shaping, Modulation

Proceedings Article | 7 April 2011 Paper
Jason Stowers, Alan Telecky, Michael Kocsis, Benjamin Clark, Douglas Keszler, Andrew Grenville, Chris Anderson, Patrick Naulleau
Proceedings Volume 7969, 796915 (2011) https://doi.org/10.1117/12.879542
KEYWORDS: Etching, Extreme ultraviolet lithography, Semiconducting wafers, Metals, Extreme ultraviolet, Oxides, Absorption, Coating, Photons, Photoresist processing

Proceedings Article | 5 April 2011 Paper
Christopher Anderson, Lorie Mae Baclea-An, Paul Denham, Simi George, Kenneth Goldberg, Michael Jones, Nathan Smith, Thomas Wallow, Warren Montgomery, Patrick Naulleau
Proceedings Volume 7969, 79690R (2011) https://doi.org/10.1117/12.881573
KEYWORDS: Printing, Illumination engineering, Metals, Oxides, Extreme ultraviolet, Chemically amplified resists, Image resolution, Optical lithography, Phase shifts, Modulation

Proceedings Article | 2 April 2011 Paper
Patrick Naulleau, Christopher Anderson, Lorie-Mae Baclea-an, Paul Denham, Simi George, Kenneth Goldberg, Gideon Jones, Brittany McClinton, Ryan Miyakawa, Iacopo Mochi, Warren Montgomery, Seno Rekawa, Tom Wallow
Proceedings Volume 7985, 798509 (2011) https://doi.org/10.1117/12.885420
KEYWORDS: Extreme ultraviolet lithography, Line edge roughness, Extreme ultraviolet, Photomasks, Synchrotrons, Light sources, Printing, Chemically amplified resists, Image resolution, Imaging systems

Proceedings Article | 23 March 2010 Paper
Patrick Naulleau, Christopher Anderson, Lorie-Mae Baclea-an, David Chan, Paul Denham, Simi George, Kenneth Goldberg, Brian Hoef, Gideon Jones, Chawon Koh, Bruno La Fontaine, Brittany McClinton, Ryan Miyakawa, Warren Montgomery, Seno Rekawa, Tom Wallow
Proceedings Volume 7636, 76361J (2010) https://doi.org/10.1117/12.848438
KEYWORDS: Line edge roughness, Photomasks, Extreme ultraviolet, Printing, Phase shifts, Lithographic illumination, Extreme ultraviolet lithography, Image resolution, Mask cleaning, Resolution enhancement technologies

Proceedings Article | 20 March 2010 Paper
Christopher Anderson, Joe Daggett, Patrick Naulleau
Proceedings Volume 7636, 763617 (2010) https://doi.org/10.1117/12.848362
KEYWORDS: Photoresist developing, Extreme ultraviolet lithography, Photoresist materials, Polymers, Extreme ultraviolet, Scanning electron microscopy, Semiconducting wafers, Metrology, X-ray optics, Lithography

Proceedings Article | 1 April 2009 Paper
Thomas Wallow, Bill Pierson, Hiroyuki Mizuno, Anita Fumar-Pici, Karen Petrillo, Chris Anderson, Patrick Naulleau, Steven Hansen, Yunfei Deng, Koen van Ingen Schenau, Chiew-Seng Koay, Linda Ohara, Sang-In Han, Robert Watso, Lior Huli, Martin Burkhardt, Obert Wood, Joerg Mallmann, Bart Kessels, Robert Routh, Kevin Cummings
Proceedings Volume 7273, 72733T (2009) https://doi.org/10.1117/12.814457
KEYWORDS: Optical proximity correction, Extreme ultraviolet lithography, Extreme ultraviolet, Data modeling, Lithography, Diagnostics, Photoresist processing, Nanoimprint lithography, Diffusion, Reticles

Proceedings Article | 23 March 2009 Paper
Christopher Anderson, Patrick Naulleau
Proceedings Volume 7272, 72720B (2009) https://doi.org/10.1117/12.814303
KEYWORDS: Wavefronts, Wavefront metrology, Diffraction, Metrology, Spherical lenses, Optical lithography, Model-based design, Monochromatic aberrations, Photomasks, Diffraction gratings

Proceedings Article | 18 March 2009 Paper
Patrick Naulleau, Christopher Anderson, Lorie-Mae Baclea-an, Paul Denham, Simi George, Kenneth Goldberg, Michael Goldstein, Brian Hoef, Russ Hudyma, Gideon Jones, Chawon Koh, Bruno La Fontaine, Brittany McClinton, Ryan Miyakawa, Warren Montgomery, John Roller, Thomas Wallow, Stefan Wurm
Proceedings Volume 7271, 72710W (2009) https://doi.org/10.1117/12.814232
KEYWORDS: Line edge roughness, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Printing, Lithography, Computer aided design, Synchrotrons, Surface roughness

Proceedings Article | 3 April 2008 Paper
Patrick Naulleau, Christopher Anderson, Jerrin Chiu, Kim Dean, Paul Denham, Kenneth Goldberg, Brian Hoef, Sungmin Huh, Gideon Jones, Bruno LaFontaine, Andy Ma, Dimitra Niakoula, Joo-on Park, Tom Wallow
Proceedings Volume 6921, 69213N (2008) https://doi.org/10.1117/12.773833
KEYWORDS: Line edge roughness, Monochromatic aberrations, Extreme ultraviolet, Photomasks, Printing, Lithography, Extreme ultraviolet lithography, Semiconducting wafers, Projection systems, Wafer-level optics

Proceedings Article | 28 March 2008 Paper
Elsayed Hassanein, Craig Higgins, Patrick Naulleau, Richard Matyi, Gregg Gallatin, Gregory Denbeaux, Alin Antohe, Jim Thackeray, Kathleen Spear, Charles Szmanda, Christopher Anderson, Dimitra Niakoula, Matthew Malloy, Anwar Khurshid, Cecilia Montgomery, Emil Piscani, Andrew Rudack, Jeff Byers, Andy Ma, Kim Dean, Robert Brainard
Proceedings Volume 6921, 69211I (2008) https://doi.org/10.1117/12.774099
KEYWORDS: Quantum efficiency, Extreme ultraviolet lithography, Photoresist materials, Extreme ultraviolet, X-rays, Absorbance, Photons, Coating, Reflectometry, Line edge roughness

Proceedings Article | 26 March 2008 Paper
Christopher Anderson, Patrick Naulleau
Proceedings Volume 6923, 69230Z (2008) https://doi.org/10.1117/12.768551
KEYWORDS: Scanning electron microscopy, Electron beams, Extreme ultraviolet lithography, Data modeling, Image resolution, Image analysis, Finite element methods, Extreme ultraviolet, Photoresist materials, Printing

Proceedings Article | 12 February 2008 Paper
Proceedings Volume 6883, 68830F (2008) https://doi.org/10.1117/12.769625
KEYWORDS: Extreme ultraviolet, Reflectivity, Mirrors, Multilayers, EUV optics, Silicon, Diamond, Atomic force microscopy, Surface finishing, Diamond turning

Proceedings Article | 3 May 2007 Paper
Thomas Wallow, Ryoung-han Kim, Bruno LaFontaine, Patrick Naulleau, Chris Anderson, Richard Sandberg
Proceedings Volume 6533, 653317 (2007) https://doi.org/10.1117/12.737189
KEYWORDS: Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Photoresist processing, Modulation transfer functions, Diffusion, Point spread functions, Line edge roughness, Cadmium sulfide, Photoresist technology

Proceedings Article | 21 March 2007 Paper
Patrick Naulleau, Christopher Anderson, Stephen Horne
Proceedings Volume 6517, 65172T (2007) https://doi.org/10.1117/12.715069
KEYWORDS: Extreme ultraviolet, Lithography, Interferometers, Extreme ultraviolet lithography, Diffraction gratings, Fiber optic illuminators, Spatial coherence, Fringe analysis, Lithographic illumination, Prisms

Proceedings Article | 20 March 2007 Paper
Patrick Naulleau, Christopher Anderson, Bruno La Fontaine, Ryoung-han Kim, Tom Wallow
Proceedings Volume 6517, 65172N (2007) https://doi.org/10.1117/12.712363
KEYWORDS: Extreme ultraviolet, Point spread functions, Line edge roughness, Modulation transfer functions, Diffusion, Lithography, Extreme ultraviolet lithography, Photoresist processing, Printing, Chemically amplified resists

Proceedings Article | 15 March 2007 Paper
Patrick Naulleau, Chris Anderson, Kim Dean, Paul Denham, Kenneth Goldberg, Brian Hoef, Bruno La Fontaine, Tom Wallow
Proceedings Volume 6517, 65170V (2007) https://doi.org/10.1117/12.713440
KEYWORDS: Monochromatic aberrations, Line edge roughness, Extreme ultraviolet lithography, Extreme ultraviolet, Fiber optic illuminators, Lithography, Line width roughness, Eye, Critical dimension metrology, Photomasks

Showing 5 of 35 publications
Conference Committee Involvement (2)
Optical and EUV Nanolithography XXXVIII
24 February 2025 | San Jose, California, United States
Optical and EUV Nanolithography XXXVII
26 February 2024 | San Jose, California, United States
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