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Chung-Hsing Chang
R&D Manager at Remarkable Ltd
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Publications (3)
Proceedings Article | 27 January 2005 Paper
Achieving CDU requirement for 90-nm technology node and beyond with advanced mask making process technology
San-De Tzu, Chung-Hsing Chang, Wen-Chi Chen, Karl-Heinz Kliem, Peter Hudek, Dirk Beyer
Proceedings Volume 5645, (2005) https://doi.org/10.1117/12.577008
KEYWORDS: Photomasks, Critical dimension metrology, Mask making, Opacity, Etching, Phase measurement, Lithography, Line edge roughness, Scattering, Inspection
Proceedings Article | 27 January 2005 Paper
Novel contact hole reticle design for enhanced lithography process window in IC manufacturing
Proceedings Volume 5645, (2005) https://doi.org/10.1117/12.576519
KEYWORDS: Photomasks, Printing, Resolution enhancement technologies, Fourier transforms, Manufacturing, Lithography, Lithographic illumination, Optical lithography, Projection systems, Diffraction
Proceedings Article | 6 December 2004 Paper
Novel contact hole reticle design for enhanced lithography process window in IC manufacturing
Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569459
KEYWORDS: Photomasks, Printing, Resolution enhancement technologies, Fourier transforms, Manufacturing, Lithography, Lithographic illumination, Phase shifts, Projection systems, Diffraction
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