Ms. Claudia Zech Profile

Claudia Zech

at Physikalisch-Technische Bundesanstalt

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Publications (1)

Proceedings Article | 4 November 2020 Presentation + Paper

Study of EUV reticle storage effects through exposure on EBL2 and NXE

Rik Jonckheere, Chien-Ching Wu, Veronique de Rooij-Lohmann, Dorus Elstgeest, Henk Lensen, Philipp Hönicke, Michael Kolbe, Victor Soltwisch, Claudia Zech, Frank Scholze, Remko Aubert, Vineet Nair, Eric Hendrickx

Proceedings Volume 11517, 115170Z (2020) https://doi.org/10.1117/12.2573125

KEYWORDS: Reticles, Extreme ultraviolet lithography, Photomasks, Semiconducting wafers, Ruthenium, Scanners, Contamination, Integrated circuits, Semiconductors, X-rays

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