Mr. Daniel S. Fischer Profile

Daniel S. Fischer

Reticle Engineer at GLOBALFOUNDRIES Inc

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Author

Publications (7)

Proceedings Article | 1 April 2016 Paper

Lithographic qualification of high-transmission mask blank for 10nm node and beyond

Yongan Xu, Tom Faure, Ramya Viswanathan, Granger Lobb, Richard Wistrom, Sean Burns, Lin Hu, Ioana Graur, Ben Bleiman, Dan Fischer, Yann Mignot, Yoshifumi Sakamoto, Yusuke Toda, John Bolton, Todd Bailey, Nelson Felix, John Arnold, Matthew Colburn

Proceedings Volume 9780, 978006 (2016) https://doi.org/10.1117/12.2219778

KEYWORDS: Photomasks, Semiconducting wafers, Optical proximity correction, Lithography, Transmittance, Resolution enhancement technologies, Printing, SRAF, Critical dimension metrology, Phase shifts

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Proceedings Article | 16 March 2009 Paper

A new method for post-etch OPC modeling to compensate for underlayer effects from integrated wafers

Chandra Sarma, Amr Abdo, Derren Dunn, Daniel Fischer, Klaus Herold, Scott Mansfield, Len Tsou

Proceedings Volume 7274, 72740Z (2009) https://doi.org/10.1117/12.813546

KEYWORDS: Semiconducting wafers, Etching, Data modeling, Optical proximity correction, Instrument modeling, Critical dimension metrology, Photomasks, Data integration, Integrated modeling, Photoresist processing

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Proceedings Article | 22 March 2008 Paper

Challenges of implementing contour modeling in 32nm technology

Daniel Fischer, Geng Han, James Oberschmidt, Yong Wah Cheng, Jae Yeol Maeng, Charles Archie, Wei Lu, Cyrus Tabery

Proceedings Volume 6922, 69220A (2008) https://doi.org/10.1117/12.775444

KEYWORDS: Calibration, Scanning electron microscopy, Metrology, Optical proximity correction, Critical dimension metrology, Cadmium, Data modeling, Line edge roughness, Tolerancing, Systems modeling

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Proceedings Article | 5 April 2007 Paper

OPC model data collection for 45-nm technology node using automatic CD-SEM offline recipe creation

Daniel Fischer, Mohamed Talbi, Alex Wei, Ovadya Menadeva, Roger Cornell

Proceedings Volume 6518, 65181E (2007) https://doi.org/10.1117/12.712718

KEYWORDS: Optical proximity correction, Metrology, Data modeling, Pattern recognition, Semiconducting wafers, Reticles, Time metrology, Target recognition, Optical lithography, Quality measurement

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Proceedings Article | 24 March 2006 Paper

Model-based calculation of weighting in OPC model calibration

Mohamed Talbi, Amr Abdo, Daniel Fischer, Geng Han, Scott Mansfield, James Oberschmidt, Ramya Viswanathan

Proceedings Volume 6152, 615202 (2006) https://doi.org/10.1117/12.656568

KEYWORDS: Optical proximity correction, Data modeling, Calibration, Scanning electron microscopy, Statistical modeling, Model-based design, Error analysis, Metrology, Statistical analysis, Computer simulations

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Proceedings Article | 9 November 2005 Paper

The effect of calibration feature weighting on OPC optical and resist models: investigating the influence on model coefficients and on the overall model fitting

Amr Abdo, Rami Fathy, Kareem Madkour, James Oberschmidt, Daniel Fischer, Mohamed Talbi

Proceedings Volume 5992, 599253 (2005) https://doi.org/10.1117/12.631817

KEYWORDS: Calibration, Optical proximity correction, Data modeling, Process modeling, 3D modeling, Optimization (mathematics), Model-based design, Photoresist processing, Integrated circuits, Optical lithography

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Proceedings Article | 6 December 2004 Paper

ArF lithography reticle crystal growth contributing factors

Florence Eschbach, Daniel Selassie, Peter Sanchez, Daniel Tanzil, Vikram Tolani, Mahmood Toofan, Huiying Liu, Barbara Greenebaum, Michael Murray, Raul Villacorta

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569272

KEYWORDS: Crystals, Reticles, Photomasks, Pellicles, Ions, Inspection, Lithography, Ultraviolet radiation, Semiconducting wafers, Glasses

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Showing 5 of 7 publications

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