Mr. David K. Poon Profile

David K. Poon

at Simon Fraser Univ

SPIE Involvement:

Author

Publications (10)

Proceedings Article | 13 March 2007 Paper

Improving the optical characteristics of bimetallic grayscale photomasks

James Dykes, David Poon, Jun Wang, Jimmy Tsui, Glenn Chapman

Proceedings Volume 6458, 64580T (2007) https://doi.org/10.1117/12.702589

KEYWORDS: Photomasks, Argon ion lasers, Thin films, Binary data, Cameras, Raster graphics, Glasses, Video, Optical filters, CCD cameras

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Proceedings Article | 22 January 2007 Paper

Creation of embedded structures in SU-8

James Dykes, David Poon, Jun Wang, Dan Sameoto, Jimmy T. K. Tsui, Chinheng Choo, Glenn Chapman, Ash Parameswaren, Bonnie Gray

Proceedings Volume 6465, 64650N (2007) https://doi.org/10.1117/12.702876

KEYWORDS: Photomasks, Ultraviolet radiation, Semiconducting wafers, Quartz, Bridges, Glasses, Scanning electron microscopy, Microscopes, Binary data, Photoresist materials

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Proceedings Article | 20 October 2006 Paper

Adding grayscale layer to chrome photomasks

David Poon, James Dykes, Chinheng Choo, Jimmy T. Tsui, Jun Wang, Glenn Chapman, Yuqiang Tu, Patrick Reynolds, Andrew Zanzal

Proceedings Volume 6349, 634931 (2006) https://doi.org/10.1117/12.686599

KEYWORDS: Photomasks, Argon ion lasers, Binary data, Photoresist materials, Reticles, Optical lithography, Thin films, Calibration, Glasses, Oxidation

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Proceedings Article | 29 March 2006 Paper

Laser-induced oxidation of metallic thin films as a method for creating grayscale photomasks

Glenn Chapman, Yuqiang Tu, Chinheng Choo, Jun Wang, David Poon, Marian Chang

Proceedings Volume 6153, 61534G (2006) https://doi.org/10.1117/12.657067

KEYWORDS: Photomasks, Thin films, Photoresist materials, Argon ion lasers, Metals, Lithography, Beam splitters, Radium, Raster graphics, Oxidation

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Proceedings Article | 1 March 2006 Paper

Real-time optical characterization of laser oxidation process in bimetallic direct write gray scale photomasks

David Poon, Glenn Chapman, Chinheng Choo, Marian Chang, Jun Wang, Yuqiang Tu

Proceedings Volume 6106, 61060G (2006) https://doi.org/10.1117/12.647251

KEYWORDS: Photodiodes, Absorbance, Thin films, Diodes, Photovoltaics, Camera shutters, Optical filters, Argon ion lasers, Photomasks, Oxidation

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Proceedings Article | 1 March 2006 Paper

Laser-induced oxidation of Zn and Zn alloy films for direct-write grayscale photomasks

Jun Wang, Marian Chang, Yuqiang Tu, David Poon, Glenn Chapman, Chinheng Choo, Jun Peng

Proceedings Volume 6106, 61060F (2006) https://doi.org/10.1117/12.648618

KEYWORDS: Zinc, Photomasks, Argon ion lasers, Glasses, Zinc oxide, Objectives, Raster graphics, Modulation, Oxides, Oxidation

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Proceedings Article | 4 November 2005 Paper

Expanding grayscale capability of direct-write grayscale photomask by using modified Bi/In compositions

David Poon, Glenn Chapman, Chinheng Choo, Jun Wang, Yuqiang Tu, Michelle La Haye

Proceedings Volume 5992, 59920K (2005) https://doi.org/10.1117/12.632245

KEYWORDS: Photomasks, Absorbance, Argon ion lasers, Gaussian beams, Transparency, Absorption, Oxides, Glasses, Bismuth, Oxidation

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Proceedings Article | 4 May 2005 Paper

Enhanced inorganic bimetallic thermal resists transparency and resolution for photomask fabrication

Glenn Chapman, David Poon, Chinheng Choo, Yuqiang Tu, James Dykes, Jun Wang, Jun Peng, Willy Lennard, Karen Kavanagh

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.600463

KEYWORDS: Photomasks, Glasses, Photoresist materials, Silicon, Aluminum, Absorbance, Transparency, Silicon films, Lithography, Oxidation

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Proceedings Article | 12 April 2005 Paper

Creating precise 3D microstructures using laser direct-write bimetallic thermal resist grayscale photomasks

Glenn Chapman, James Dykes, David Poon, Chinheng Choo, Jun Wang, Jun Peng, Yuqiang Tu

Proceedings Volume 5713, (2005) https://doi.org/10.1117/12.601545

KEYWORDS: Photoresist materials, Photomasks, Glasses, Silicon, Photoresist developing, Lithography, Calibration, Raster graphics, Silicon films, Camera shutters

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Proceedings Article | 6 December 2004 Paper

Calibrating grayscale direct write bimetallic photomasks to create 3D photoresist structures

Yuqiang Tu, Glenn Chapman, James Dykes, David Poon, Chinheng Choo, Jun Peng

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569405

KEYWORDS: Photomasks, Photoresist materials, Calibration, Raster graphics, Camera shutters, Absorbance, Tin, Silicon, Transparency, Binary data

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Showing 5 of 10 publications

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