Mr. David M. Williamson Profile

David M. Williamson

Retired

SPIE Involvement:

Author | Instructor

Area of Expertise:

Optical Design , Microlithography

Proceedings Article | 25 September 2015 Paper

Frits Zernike and microlithography

David Williamson

Proceedings Volume 9626, 962606 (2015) https://doi.org/10.1117/12.2191129

KEYWORDS: Mirrors, Semiconducting wafers, Optics manufacturing, Projection systems, Aspheric lenses, Extreme ultraviolet, Photomasks, Wavefront aberrations, Optical lithography, Optical design

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Proceedings Article | 3 August 2006 Paper

The past, present, and future of optical design

Warren Smith, Ellis Betensky, David Williamson, Juan Miñano, R. John Koshel

Proceedings Volume 6342, 63422Y (2006) https://doi.org/10.1117/12.696972

KEYWORDS: Lens design, Zoom lenses, Chemical elements, Optical design, Monochromatic aberrations, Computing systems, Wavefronts, Glasses, Cameras, Lithography

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Proceedings Article | 15 March 2006 Paper

The lithographic lens: its history and evolution

Tomoyuki Matsuyama, Yasuhiro Ohmura, David Williamson

Proceedings Volume 6154, 615403 (2006) https://doi.org/10.1117/12.656163

KEYWORDS: Lithography, Optical design, Lens design, Aspheric lenses, Kinematics, Lens manufacturing, Wavefronts, Metrology, Manufacturing, Glasses

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Proceedings Article | 19 August 2005 Paper

Remaining challenges in microlithographic optical design

David Williamson

Proceedings Volume 5874, 58740N (2005) https://doi.org/10.1117/12.620615

KEYWORDS: Semiconducting wafers, Liquids, Monochromatic aberrations, Refractor telescopes, Reticles, Optical design, Projection systems, Lithography, Combined lens-mirror systems, Deep ultraviolet

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Proceedings Article | 14 September 2001 Paper

High-numerical-aperture 193-nm exposure tool

Harry Sewell, Daniel Cote, David Williamson, Mark Oskotsky, Lev Sakin, Tim O'Neil, John Zimmerman, Richard Zimmerman, Mike Nelson, Christopher Mason, David Ahouse, Hilary Harrold, Philip Lamastra, David Callan

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435758

KEYWORDS: Lithography, Reticles, Semiconducting wafers, Projection systems, Photomasks, Scanners, Combined lens-mirror systems, Wafer-level optics, 193nm lithography, Vibration isolation

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Proceedings Article | 8 November 2000 Paper

DUV or EUV: that is the question

David Williamson

Proceedings Volume 4146, (2000) https://doi.org/10.1117/12.406659

KEYWORDS: Extreme ultraviolet, Deep ultraviolet, Image enhancement, Ytterbium, X-ray imaging, X-rays, Imaging systems, Information operations, Projection systems, Extreme ultraviolet lithography

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Proceedings Article | 5 July 2000 Paper

Advances in 193-nm lithography tools

Daniel Cote, David Ahouse, Daniel Galburt, Hilary Harrold, Justin Kreuzer, Mike Nelson, Mark Oskotsky, Geoffrey O'Connor, Harry Sewell, David Williamson, John Zimmerman, Richard Zimmerman

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.389043

KEYWORDS: Lithography, Semiconducting wafers, 193nm lithography, Reticles, Distortion, Combined lens-mirror systems, Binary data, Calcium, Critical dimension metrology, Mirrors

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Proceedings Article | 21 September 1998 Paper

Evolution of ring-field systems in microlithography

David Williamson

Proceedings Volume 3482, (1998) https://doi.org/10.1117/12.322040

KEYWORDS: Mirrors, Optical lithography, Semiconducting wafers, Reticles, Monochromatic aberrations, Distortion, Lithography, Optical design, Projection systems, Extreme ultraviolet

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Proceedings Article | 7 July 1997 Paper

Micrascan III: performance of a third-generation catadioptric step-and-scan lithographic tool

Daniel Cote, Keith Andresen, David Cronin, Hilary Harrold, Marc Himel, J. Kane, Joe Lyons, Louis Markoya, Christopher Mason, Diane McCafferty, Matthew McCarthy, Geoffrey O'Connor, Harry Sewell, David Williamson

Proceedings Volume 3051, (1997) https://doi.org/10.1117/12.276001

KEYWORDS: Combined lens-mirror systems, Lithography, Imaging systems, Optical lithography, Reticles, Semiconducting wafers, Fiber optic illuminators, Image resolution, Image quality

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Proceedings Article | 7 June 1996 Paper

Micrascan III: 0.25-um resolution step-and-scan system

David Williamson, James McClay, Keith Andresen, Gregg Gallatin, Marc Himel, Jorge Ivaldi, Christopher Mason, Andrew McCullough, Charles Otis, John Shamaly, Carol Tomczyk

Proceedings Volume 2726, (1996) https://doi.org/10.1117/12.240939

KEYWORDS: Semiconducting wafers, Projection systems, Mirrors, Reticles, Optical alignment, Multispectral imaging, Distortion, Lithography, Combined lens-mirror systems, Beam splitters

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Proceedings Article | 1 July 1992 Paper

Monochromatic quartet explained

David Williamson

Proceedings Volume 10263, 1026306 (1992) https://doi.org/10.1117/12.131969

KEYWORDS: Lens design, Photography, Lithography, Combined lens-mirror systems

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Proceedings Article | 1 July 1991 Paper

Effects of higher order aberrations on the process window

Joseph Gortych, David Williamson

Proceedings Volume 1463, (1991) https://doi.org/10.1117/12.44796

KEYWORDS: Monochromatic aberrations, Wavefronts, Spherical lenses, Lithography, Optical lithography, Lawrencium, Lithographic lenses, Computer simulations, Photomasks, Diffraction

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Showing 5 of 12 publications

Conference Committee Involvement (6)

SPIE Optical Systems Design

14 May 2018 | Frankfurt, Germany

Optical Design and Testing VII

12 October 2016 | Beijing, China

SPIE Optical Systems Design

7 September 2015 | Jena, Germany

SPIE Optical Systems Design

26 November 2012 | Barcelona, Spain

SPIE Optical Systems Design

5 September 2011 | Marseille, France

Showing 5 of 6 Conference Committees

Course Instructor

SC115: Microlithographic Optical Design

Microlithographic lenses are used to project an electrical circuit pattern onto the surface of a semiconductor wafer. This course will provide a background in the design and manufacturing issues of such optical projection systems used in photolithography.

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