Prof. Dominique Drouin Profile

Prof. Dominique Drouin

Director of Operations/Associate Professor at Univ de Sherbrooke

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Publications (14)

Proceedings Article | 1 April 2020 Presentation

Improving silicon nitride ring resonator performances on 300 mm industrial environment for point of care applications (Conference Presentation)

Michele Calvo, Guillaume Beaudin, Laurence Mercier-Coderre, Pauline Girault, Pedro Rojo-Romeo, Regis Orobtchouk, Romain Stricher, Stephane Monfray, Serge Ecoffey, Dominique Drouin, Frederic Boeuf, Michael Canva, Paul Charette

Proceedings Volume 11361, 1136105 (2020) https://doi.org/10.1117/12.2555339

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Point-of-care tests (POCT) are important for detecting illnesses and monitoring patients without the need of a medical laboratory. To be useful, POCT must be sensitive, specific, integrated, and affordable. Since the early 2000s, integrated photonics have offered a possible solution for this problem. In particular, silicon micro-ring resonators represent a compact and sensitive choice known in the industry. This paper details the design, fabrication, and characterization of two methods for improving the performance of ring resonators by engineering their cross section. More precisely, improving devices made out of silicon nitride in an industrial environment to work in the infrared (around 1.31 µm). The first approach is to selectively excite the first order mode of the ring resonator’s waveguide. The first order mode, with its greater exposure to the sensing liquid than the fundamental mode, results in a higher device sensitivity. The second method consists in coupling a dielectric mode with a surface plasmon polariton (SPP) forming a hybrid plasmonic waveguide. Hybrid plasmonic waveguides combine the low losses of the dielectric mode with the high sensitivity of the SPP, which increases the sensitivity in comparison to conventional dielectric ring resonators. Furthermore, hybrid plasmonic micro-ring resonators make possible a stable and easy differential functionalization. Through the optical characterization of the devices, this study shows an experimental sensitivity of first order ring resonators of over 200 nm/RIU* and of hybrid plasmonic devices of 300 nm/RIU*. This demonstrates improvement with respect to the reference silicon nitride dielectric ring (120 nm/RIU*). Characterizations were performed using a PolyDiMethylSiloxane (PDMS) fluidic system to prove the compatibility of the substrate to POCT applications. This paper shows two alternative approaches to integrated nano-photonic sensing for point of care testing. The proposed structures, demonstrate not only a higher sensitivity, but consider selectivity and manufacturing issues, which are fundamental for POCT development. *RIU = Refractive Index Unit

Proceedings Article | 4 March 2019 Presentation + Paper

Laser grooving of multi stack material modeling: implementation of a high accuracy tool for laser-grooving and dicing application

J. Moussodji, O. Chacon, F. Santerre, D. Drouin

Proceedings Volume 10905, 109050D (2019) https://doi.org/10.1117/12.2504649

KEYWORDS: Back end of line, Liquids, Silicon, Pulsed laser operation, Mathematical modeling, Laser ablation, Laser processing, Semiconductor lasers, Interfaces, Thin films

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Proceedings Article | 27 February 2019 Presentation + Paper

A porous Ge/Si interface layer for defect-free III-V multi-junction solar cells on silicon

Youcef Bioud, Meghan Beattie, Abderraouf Boucherif, Mourad Jellit, Romain Stricher, Serge Ecoffey, Gilles Patriarche, David Troadec, Ali Soltani, Nadi Braidy, Matthew Wilkins, Christopher Valdivia, Karin Hinzer, Dominique Drouin, Richard Arès

Proceedings Volume 10913, 109130T (2019) https://doi.org/10.1117/12.2511080

KEYWORDS: Silicon, Germanium, Interfaces, Multijunction solar cells, Photovoltaics, Electrochemical etching, Transmission electron microscopy, Chemical mechanical planarization, Solar cells

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Proceedings Article | 11 May 2010 Paper

3D harnessing of light with photon cage

C. Sieutat, J. L. Leclercq, X. Letartre, S. Callard, M. Gendry, G. Grenet, K. Naji, P. Regreny, P. Rojo-Romeo, P. Viktorovitch, G. Beaudin, M. Cloutier, D. Drouin, V. Aimez

Proceedings Volume 7712, 77120E (2010) https://doi.org/10.1117/12.854428

KEYWORDS: Optical microcavities, Photonic crystals, Waveguides, Nanophotonics, Silicon, Reflectivity, Nanotechnology, Waveguide modes, Mirrors, Nanowires

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Proceedings Article | 21 June 2006 Paper

Plasma deposited and evaporated thin resists for template fabrication

Eric Lavallée, Jacques Beauvais, Bertrand Takam Mangoua, Dominique Drouin

Proceedings Volume 6281, 62810O (2006) https://doi.org/10.1117/12.692742

KEYWORDS: Plasma, Electron beam lithography, Photomasks, Lithography, Electron beams, Plasma enhanced chemical vapor deposition, Surface roughness, Glasses, Chromium, Line edge roughness

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Proceedings Article | 29 March 2006 Paper

Self-aligned direct write of a double-sided transistor gate on membrane using an evaporated e-beam resist

Jacques Beauvais, Prasad Kelkar, Eric Lavallée, Dominique Drouin, Kien Mun Lau

Proceedings Volume 6153, 615348 (2006) https://doi.org/10.1117/12.656823

KEYWORDS: Silicon, Electron beam lithography, Chromium, Monte Carlo methods, Electron beams, Transistors, Silicon films, Resistance, Plasma etching, Line edge roughness

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Proceedings Article | 3 March 2006 Paper

Cathodoluminescence study of GaN and GaN:Si on sapphire

Nicolas Pauc, Matthew Phillips, Vincent Aimez, Dominique Drouin

Proceedings Volume 6121, 61210A (2006) https://doi.org/10.1117/12.646837

KEYWORDS: Gallium nitride, Diffusion, Silicon, Excitons, Luminescence, Spatial resolution, Image resolution, Sapphire, Microscopy, Electron beams

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Proceedings Article | 6 May 2005 Paper

Resist sensitivity and thickness-based beam count optimization for parallel low energy E-beam exposure systems

Jacques Beauvais, Eric Lavallee, Dominique Drouin, Andrew Zanzal, Prasad Kelkar

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.599723

KEYWORDS: Electron beam lithography, Electron beams, Line edge roughness, Semiconducting wafers, Photomasks, Lithography, Systems modeling, Standards development, Line width roughness, Tolerancing

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Proceedings Article | 6 May 2005 Paper

Fabrication of a 3D nano-imprint template with a conformal dry vapor deposited electron beam resist

Jacques Beauvais, Eric Lavallee, Andrew Zanzal, Dominique Drouin, Kien Mun Lau, Teodor Veres, Bo Cui

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.599795

KEYWORDS: Etching, Lithography, Photomasks, Electron beam lithography, Electron beams, Photomicroscopy, Reactive ion etching, Silica, Metals, Optical lithography

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Proceedings Article | 20 May 2004 Paper

Evaporated resist for the fabrication and replication of LEEPL mask

Melanie Cloutier, Yousef Awad, Eric Lavallee, David Turcotte, Jacques Beauvais, Dominique Drouin, Lau Kien Mun, Pan Yang, Pierre Lafrance, Ron Legario, Akira Yoshida, Hiroshi Nozue

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.535747

KEYWORDS: Photomasks, Charged-particle lithography, Etching, Electron beam lithography, Reactive ion etching, Mask making, Nickel, Optical lithography, Plating, Lithography

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Proceedings Article | 14 May 2004 Paper

Nanopatterning on fragile or 3D surfaces with sterol based vapour deposited electron beam resist

Ron Legario, Prasad Kelkar, Jacques Beauvais, Eric Lavallee, Dominique Drouin, Melanie Cloutier, David Turcotte, Pan Yang, Lau Mun, Yousef Awad, Pierre Lafrance

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.535775

KEYWORDS: Electron beam lithography, Photomasks, Semiconductor lasers, Lithography, Coating, Etching, Silicon, Zone plates, Semiconducting wafers, Electron beams

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A novel and effective approach to nano-fabrication lithography is the vapour deposition of the negative tone electron beam resists QSR-5 and QSR-15 (Quantiscript’s sterol based resist) onto a substrate. Vapour deposition is especially conducive for patterning thin delicate membranes (e.g. advanced masks for X-ray lithography - XRL, and Low Energy Electron Proximity Projection Lithography - LEEPL), that are susceptible to breakage during the spin coating process. With the capability for depositing highly uniform thin layers (<50nm) and a demonstrated resolution better than 60nm, QSR-5 and QSR-15 have potential for the fabrication of next generation lithography masks. Optimized for low energy electron exposure where proximity effects become negligible and thus well suited for 1X lithography mask patterning, QSR-5 and QSR-15 have shown exposure doses as low as 100μC/cm² at 3KeV. In addition to this type of application, the versatility of QSR-5 and QSR-15 have also been demonstrated by the fabrication of a Fresnel zone plate lens on the tip of an optical fibre with the goal of improving the coupling of diode laser emission into the fiber. This application clearly shows the capabilities of this process for producing nano-scale patterns on very small area surfaces that are completely unsuitable for spin-coating of the resist. A second demonstration of the resist's capabilities is the patterning of optical diffractive elements directly on the facet of a semiconductor laser. This opens the way to direct patterning on laser diode facets in order to control the emission profile from the device. It has also proven capabilities in the manufacture of delicate photo masks. In their natural state, QSR-5 and QSR-15 are solids at room temperature and are sterol based heterocyclic compounds, with unsaturated bonding capable of cross linking. On their own merit, QSR-5 and QSR-15 are capable of cross linking under electron beam exposure and are comparable in certain properties to conventional spin-coated resists such as PMMA. When cross linked, their heterocyclic structure gives it excellent selective resistance to solvent based developers (such as alcohols and ketones) for pattern formation. They have also been shown to be highly resistant to etching solutions, even when working with thin high resolution layers on the order of 30 nm. They are highly stable and have a relatively long shelf life, greater than one year. Compared to conventional resists utilizing complex, toxic, and expensive resin systems, QSR-5 and QSR-15 are non-toxic and significantly cost effective. Before evaporation, the resists are in a powder state that allows for direct evaporation and sublimation onto a target substrate that contributes to film uniformity and capabilities for a very thin film; the powder state allows for a wide degree of adjustment in temperature of the vapour chamber, as a means to achieving the desired film thickness and uniformity.

Proceedings Article | 27 December 2001 Paper

Low-energy ion implantation-induced control of InP-based heterostructure properties

Vincent Aimez, Jacques Beauvais, Dominique Drouin, Jean Beerens, Denis Morris, Serge Jandl

Proceedings Volume 4468, (2001) https://doi.org/10.1117/12.452544

KEYWORDS: Ion implantation, Heterojunctions, Ions, Semiconductor lasers, Quantum wells, Arsenic, Phosphorus, Annealing, Raman spectroscopy, Photonic integrated circuits

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Proceedings Article | 9 April 2001 Paper

Resistless electron beam lithography technique for the fabrication of x-ray masks

Eric Lavallee, Dominique Drouin, Jacques Beauvais

Proceedings Volume 4349, (2001) https://doi.org/10.1117/12.425086

KEYWORDS: Tantalum, Photomasks, Metals, Etching, Chromium, Silicon, Electron beam lithography, Fabrication, X-ray lithography, Nickel

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Proceedings Article | 30 July 1997 Paper

SEM techniques for materials characterization

Jacques Beauvais, Dominique Drouin, Raynald Gauvin

Proceedings Volume 10291, 102910B (1997) https://doi.org/10.1117/12.279839

KEYWORDS: Scanning electron microscopy, Material characterization, Electron microscopes, X-ray imaging, X-rays, Statistical analysis, Crystals, Photonic crystals, Crystallography, Semiconductors

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Showing 5 of 14 publications

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