Ms. Donna J. O'Connell Profile

Donna J. O'Connell

Optical Engineer at Sandia National Labs California

SPIE Involvement:

Author

Publications (17)

Proceedings Article | 6 December 2004 Paper

Paper

Defect printability and inspection of EUVL mask

Bing Lu, James Wasson, Pawitter Mangat, Jonathan Cobb, Scott Hector, Donald Pettibone, Donna O'Connell

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569318

KEYWORDS: Inspection, Photomasks, Defect inspection, Scanning electron microscopy, Extreme ultraviolet lithography, Extreme ultraviolet, Printing, Defect detection, Reflectivity, Multilayers

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Proceedings Article | 20 May 2004 Paper

Paper

Process latitude measurements and their implications for CD control in EUV lithography

Jonathan Cobb, Richard Peters, Sergei Postnikov, Scott Hector, Bing Lu, Eric Weisbrod, James Wasson, Pawitter Mangat, Donna O'Connell

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.537366

KEYWORDS: Extreme ultraviolet lithography, Semiconducting wafers, Optical proximity correction, Lithography, Photomasks, Critical dimension metrology, Data modeling, Monte Carlo methods, Scanners, Scanning electron microscopy

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Proceedings Article | 16 June 2003 Paper

Paper

Calibration of EUV 2D photoresist simulation parameters for accurate predictive modeling

Stewart Robertson, Patrick Naulleau, Donna O'Connell, Kevin McDonald, Todd Delano, Kenneth Goldberg, Steven Hansen, Kirk Brown, Robert Brainard

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.499357

KEYWORDS: Photomasks, Photoresist materials, Extreme ultraviolet lithography, Lithography, Calibration, Data modeling, Diffusion, Modeling, Extreme ultraviolet, Wafer-level optics

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Proceedings Article | 16 June 2003 Paper

Paper

Effect of polymer molecular weight on AFM polymer aggregate size and LER of EUV resists

Charlotte Cutler, Joseph Mackevich, Jieming Li, Donna O'Connell, Gregory Cardinale, Robert Brainard

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.482370

KEYWORDS: Line edge roughness, Polymers, Surface roughness, Extreme ultraviolet, Atomic force microscopy, Deep ultraviolet, Molecular aggregates, Extreme ultraviolet lithography, Scanning electron microscopy, Semiconducting wafers

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Proceedings Article | 16 June 2003 Paper

Paper

Static EUV micro-exposures using the ETS Set-2 optics

Patrick Naulleau, Kenneth Goldberg, Erik Anderson, Jeffrey Bokor, Bruce Harteneck, Keith Jackson, Deirdre Olynick, Farhad Salmassi, Sherry Baker, Paul Mirkarimi, Eberhard Spiller, Christopher Walton, Donna O'Connell, Pei-Yang Yan, Guojing Zhang

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.490129

KEYWORDS: Lithography, Extreme ultraviolet, Printing, Photomasks, EUV optics, Wafer-level optics, Semiconducting wafers, Extreme ultraviolet lithography, Mirrors, Fiber optic illuminators

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Proceedings Article | 16 June 2003 Paper

Paper

Lithographic flare measurements of EUV full-field projection optics

Sang Hun Lee, Patrick Naulleau, Christof Krautschik, Manish Chandhok, Henry Chapman, Donna O'Connell, Michael Goldstein

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.485547

KEYWORDS: Mirrors, Extreme ultraviolet, Projection systems, Point spread functions, Lithography, Wavefronts, Spatial frequencies, Extreme ultraviolet lithography, Polishing, Surface roughness

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Proceedings Article | 16 June 2003 Paper

Paper

Lithographic characterization of improved projection optics in the EUVL engineering test stand

Donna O'Connell, Sang Hun Lee, William Ballard, Daniel Tichenor, Louis Bernardez, Steven Haney, Terry Johnson, Pamela Barr, Alvin Leung, Karen Jefferson, William Replogle, John Goldsmith, Henry Chapman, Patrick Naulleau, Stefan Wurm, Eric Panning

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.484967

KEYWORDS: Projection systems, Lithography, Monochromatic aberrations, Extreme ultraviolet lithography, Extreme ultraviolet, Semiconducting wafers, Scanning electron microscopy, Line edge roughness, Reticles, Wavefronts

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Proceedings Article | 16 June 2003 Paper

Paper

System and process learning in a full-field high-power EUVL alpha tool

William Ballard, Daniel Tichenor, Donna O'Connell, Luis Bernardez, Robert Lafon, Richard Anderson, Alvin Leung, Kenneth Williams, Steven Haney, Yon Perras, Karen Jefferson, Therese Porter, Daniel Knight, Pamela Barr, James Van de Vreugde, Richard Campiotti, Mark Zimmerman, Terry Johnson, Leonard Klebanoff, Philip Grunow, Samuel Graham, Dean Buchenauer, William Replogle, Tony Smith, John Wronosky, Joel Darnold, Kenneth Blaedel, Henry Chapman, John Taylor, Layton Hale, Gary Sommargren, Eric Gullikson, Patrick Naulleau, Kenneth Goldberg, Sang Hun Lee, Harry Shields, Randall St. Pierre, Samuel Ponti

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.482791

KEYWORDS: Semiconducting wafers, Reticles, Extreme ultraviolet, Sensors, Extreme ultraviolet lithography, Lithography, Projection systems, Xenon, EUV optics, Fiber optic illuminators

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Proceedings Article | 1 July 2002 Paper

Paper

EUV photoresist performance results from the VNL and the EUV LLC

Jonathan Cobb, Paul Dentinger, Luke Hunter, Donna O'Connell, Gregg Gallatin, William Hinsberg, Frances Houle, Martha Sanchez, Wolf-Dieter Domke, Stefan Wurm, Uzodinma Okoroanyanwu, Sang Hun Lee

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472316

KEYWORDS: Line edge roughness, Extreme ultraviolet lithography, Photoresist materials, Scanning electron microscopy, Extreme ultraviolet, Photoresist processing, Semiconducting wafers, Deep ultraviolet, Semiconductors, Photoresist developing

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Proceedings Article | 1 July 2002 Paper

Paper

Lithographic evaluation of the EUV engineering test stand

Sang Hun Lee, Daniel Tichenor, William Ballard, Luis Bernardez, John Goldsmith, Steven Haney, Karen Jefferson, Terry Johnson, Alvin Leung, Donna O'Connell, William Replogle, John Wronosky, Kenneth Blaedel, Patrick Naulleau, Kenneth Goldberg, Eric Gullikson, Henry Chapman, Stefan Wurm, Eric Panning, Pei-yang Yan, Guojing Zhang, John Bjorkholm, Glenn Kubiak, Donald Sweeney, David Attwood, Charles Gwyn

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472300

KEYWORDS: Extreme ultraviolet, Lithography, Projection systems, Semiconducting wafers, Extreme ultraviolet lithography, Photomasks, Reticles, Printing, Point spread functions, Image resolution

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Proceedings Article | 1 July 2002 Paper

Paper

Static microfield printing at the advanced light source with the ETS Set-2 optic

Patrick Naulleau, Kenneth Goldberg, Erik Anderson, David Attwood, Phillip Batson, Jeffrey Bokor, Paul Denham, Eric Gullikson, Bruce Harteneck, Brian Hoef, Keith Jackson, Deirdre Olynick, Senajith Rekawa, Farhad Salmassi, Kenneth Blaedel, Henry Chapman, Layton Hale, Regina Soufli, Eberhard Spiller, Donald Sweeney, John Taylor, Christopher Walton, Avijit Ray-Chaudhuri, Donna O'Connell, Richard Stulen, Daniel Tichenor, Charles Gwyn, Pei-yang Yan, Guojing Zhang

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472318

KEYWORDS: Printing, Extreme ultraviolet, Lithography, Fiber optic illuminators, Interferometry, Mirrors, Reticles, Modulation transfer functions, Wavefronts, Critical dimension metrology

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Proceedings Article | 20 December 2001 Paper

Paper

Initial results from the EUV engineering test stand

Daniel Tichenor, Avijit Ray-Chaudhuri, Sang Hun Lee, Henry Chapman, William Replogle, Kurt Berger, Richard Stulen, Glenn Kubiak, Leonard Klebanoff, John Wronosky, Donna O'Connell, Alvin Leung, Karen Jefferson, William Ballard, Layton Hale, Kenneth Blaedel, John Taylor, James Folta, Eberhard Spiller, Regina Soufli, Gary Sommargren, Donald Sweeney, Patrick Naulleau, Kenneth Goldberg, Eric Gullikson, Jeffrey Bokor, David Attwood, Uwe Mickan, Ralph Hanzen, Eric Panning, Pei-yang Yan, John Bjorkholm, Charles Gwyn

Proceedings Volume 4506, (2001) https://doi.org/10.1117/12.450953

KEYWORDS: Extreme ultraviolet, Reticles, Projection systems, Semiconducting wafers, Lithography, Monochromatic aberrations, Extreme ultraviolet lithography, Plasma, Sensors, Mirrors

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Proceedings Article | 21 July 2000 Paper

Paper

Development of an electric capillary discharge source

Neal Fornaciari, Jim Chang, Daniel Folk, Steven Gianoulakis, John Goldsmith, Glenn Kubiak, Bruce Long, Donna O'Connell, Gregory Shimkaveg, William Silfvast, Kenneth Stewart

Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390047

KEYWORDS: Capillaries, Extreme ultraviolet, Electrodes, Plasma, Fiber optic illuminators, Thermal modeling, Extreme ultraviolet lithography, Reflectivity, Semiconducting wafers, Lithography

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Proceedings Article | 21 July 2000 Paper

Paper

EUVL printing results of a low-thermal expansion material (LTEM) mask

William Tong, John Taylor, Scott Hector, Melissa Shell, Guojing Zhang, Patrick Kearney, Christopher Walton, Cindy Larson, James Wasson, Pawitter Mangat, Donna O'Connell, Daniel Folk

Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390038

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Semiconducting wafers, Silicon, Manufacturing, Printing, Distortion, Lithography, Extreme ultraviolet, Reflectivity

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Proceedings Article | 25 June 1999 Paper

Paper

Sub-100-nm lithographic imaging with an EUV 10X microstepper

John Goldsmith, Kurt Berger, Dan Bozman, Gregory Cardinale, Daniel Folk, Craig Henderson, Donna O'Connell, Avijit Ray-Chaudhuri, Kenneth Stewart, Daniel Tichenor, Henry Chapman, Richard Gaughan, Russell Hudyma, Claude Montcalm, Eberhard Spiller, John Taylor, Jeffrey Williams, Kenneth Goldberg, Eric Gullikson, Patrick Naulleau, Jonathan Cobb

Proceedings Volume 3676, (1999) https://doi.org/10.1117/12.351097

KEYWORDS: Cameras, Extreme ultraviolet, Imaging systems, Lithography, Extreme ultraviolet lithography, Projection systems, Photoresist developing, Photomasks, Wavefronts, Photoresist materials

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Proceedings Article | 5 June 1998 Paper

Paper

Recent advances in the Sandia EUV 10x microstepper

John Goldsmith, Pamela Barr, Kurt Berger, Luis Bernardez, Gregory Cardinale, Joel Darnold, Daniel Folk, Steven Haney, Craig Henderson, Karen Jefferson, Kevin Krenz, Glenn Kubiak, Rodney Nissen, Donna O'Connell, Yon Perras, Avijit Ray-Chaudhuri, Tony Smith, Richard Stulen, Daniel Tichenor, Alfred Ver Berkmoes, John Wronosky

Proceedings Volume 3331, (1998) https://doi.org/10.1117/12.309570

KEYWORDS: Extreme ultraviolet, Cameras, Imaging systems, Projection systems, Semiconducting wafers, Wavefronts, Extreme ultraviolet lithography, Photomasks, Xenon, Interferometry

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Proceedings Article | 5 June 1998 Paper

Paper

Top-surface imaging resists for EUV lithography

Craig Henderson, David Wheeler, Tim Pollagi, Donna O'Connell, John Goldsmith, Aaron Fisher, Gregory Cardinale, John Hutchinson, Veena Rao

Proceedings Volume 3331, (1998) https://doi.org/10.1117/12.309590

KEYWORDS: Extreme ultraviolet lithography, Etching, Digital micromirror devices, Line edge roughness, Photomasks, Photoresist processing, Silicon, Extreme ultraviolet, Photoresist materials, Image processing

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Showing 5 of 17 publications

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