Dr. Doocheol Choi
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 17 March 2021 Presentation + Paper
Proceedings Volume 11611, 116111L (2021) https://doi.org/10.1117/12.2583473
KEYWORDS: Process control, Etching, Machine learning, Semiconductors, Cadmium, Temperature metrology, Semiconducting wafers, Neural networks, Metrology, Artificial neural networks

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