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Drew R. Russell
Senior Reticle Technologist at Freescale Semiconductor Inc
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Publications (4)
Proceedings Article | 30 October 2007 Paper
Driving photomask supplier quality through automation
Drew Russell, Andrew Espenscheid
Proceedings Volume 6730, 67302W (2007) https://doi.org/10.1117/12.745457
KEYWORDS: Photomasks, Quality systems, Phase modulation, Databases, Error analysis, Semiconductors, Yield improvement, Semiconducting wafers, Control systems, Single crystal X-ray diffraction
Proceedings Article | 30 December 1999 Paper
Die-to-die and die-to-database capability analysis for advanced OPC inspection
Jerry Chen, Drew Russell, Robert Terhune, John Riddick, Franklin Kalk, Kevin Lucas, Bradley Falch
Proceedings Volume 3873, (1999) https://doi.org/10.1117/12.373358
KEYWORDS: Optical proximity correction, Inspection, Dysprosium, Databases, Photomasks, Manufacturing, Reticles, Lithography, Photography, Scanning electron microscopy
Proceedings Article | 26 July 1999 Paper
Practicing extension of 248-nm DUV optical lithography using trim-mask PSM
Michael Kling, Nigel Cave, Bradley Falch, Chong-Cheng Fu, Kent Green, Kevin Lucas, Bernard Roman, Alfred Reich, John Sturtevant, Ruiqi Tian, Drew Russell, Linard Karklin, Yao-Ting Wang
Proceedings Volume 3679, (1999) https://doi.org/10.1117/12.354297
KEYWORDS: Photomasks, Binary data, Reticles, Deep ultraviolet, Optical proximity correction, Optical lithography, Optics manufacturing, Manufacturing, Etching, Phase shifts
Proceedings Article | 26 July 1999 Paper
Design, reticle, and wafer OPC manufacturability for the 0.18-um lithography generation
Kevin Lucas, Martin McCallum, Bradley Falch, James Wood, Franklin Kalk, Robert Henderson, Drew Russell
Proceedings Volume 3679, (1999) https://doi.org/10.1117/12.354306
KEYWORDS: Optical proximity correction, Reticles, Optical lithography, Lithography, Semiconducting wafers, Phase shifts, Scanning electron microscopy, Calibration, Optics manufacturing, Electron beam lithography
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