Mr. Edward Ehrlacher Profile

Edward Ehrlacher

at Lucent Technologies

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Publications (2)

Proceedings Article | 29 June 1998 Paper

Applications of enhanced optical proximity correction models

Jack Zhao, Joseph Garofalo, James Blatchford, Edward Ehrlacher, Ellis Nease

Proceedings Volume 3334, (1998) https://doi.org/10.1117/12.310753

KEYWORDS: Optical proximity correction, Deep ultraviolet, Process modeling, Photoresist processing, Data modeling, Convolution, Calibration, Diffusion, Solids, Distortion

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Proceedings Article | 7 July 1997 Paper

Control and uniformity of 280-nm features in i-line lithography using optical proximity corrections and off-axis illumination

Pat Watson, Joseph Garofalo, M. Hansen, Ilya Grodnensky, Ludwik Zych, R. Takahashi, Willie Yarbrough, Edward Ehrlacher, A. Reim, R. Vella, A. Dunbar, Albert Colina, B. Herrero, D. Castro

Proceedings Volume 3051, (1997) https://doi.org/10.1117/12.275997

KEYWORDS: Lithographic illumination, Lithography, Optical proximity correction, Critical dimension metrology, Manufacturing, SRAF, Reticles, Photomasks, Matrices

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