Mr. Fumiaki Shigemitsu Profile

Fumiaki Shigemitsu

President at NuFlare Technology Inc

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Author

Publications (5)

Proceedings Article | 11 May 2009 Paper

Smart way to determine and guarantee mask specifications: tradeoff between cost and quality

Fumiaki Shigemitsu

Proceedings Volume 7379, 73790T (2009) https://doi.org/10.1117/12.824270

KEYWORDS: Photomasks, Inspection, Tolerancing, Semiconducting wafers, Lithography, Critical dimension metrology, Scanning electron microscopy, Scanners, Optical proximity correction, Yield improvement

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Proceedings Article | 28 August 2003 Paper

Photomask repeater strategy for high-quality and low-cost reticle fabrication

Suigen Kyoh, Soichi Inoue, Osamu Ikenaga, Tomotaka Higaki, Fumiaki Shigemitsu, Ichiro Mori, Haruo Kokubo, Naoya Hayashi, Nobuyuki Irie, Yuki Ishii, Toshikazu Umatate

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504178

KEYWORDS: Photomasks, Reticles, Mask making, Deep ultraviolet, Optical lithography, Semiconductors, Printing, Manufacturing, Lithography, Critical dimension metrology

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Proceedings Article | 19 July 2000 Paper

High-contrast i-line positive photoresist for laser reticle writer

Yoshihito Kobayashi, Y. Oppata, Y. Ezoe, Fumiaki Shigemitsu, K. Urayama, K. Doi

Proceedings Volume 4066, (2000) https://doi.org/10.1117/12.392066

KEYWORDS: Reticles, Photoresist materials, Photoresist processing, Photomasks, Mask making, Optical lithography, Critical dimension metrology, Photoresist developing, Radon, Process engineering

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Proceedings Article | 19 July 2000 Paper

Mask cleaner innovation

Hidehiro Watanabe, Kenji Masui, Akio Kosaka, Naoya Hayamizu, Akinori Iso, Hachiro Hiratsuka, Yoshiaki Minegishi, Fumiaki Shigemitsu

Proceedings Volume 4066, (2000) https://doi.org/10.1117/12.392045

KEYWORDS: Photomasks, Ultraviolet radiation, Particles, Mask cleaning, Contamination, Mechatronics, Control systems, Semiconductors, Process engineering, Inspection

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Proceedings Article | 17 May 1994 Paper

Optimization of optical properties for single-layer halftone masks

Shinichi Ito, Hiroaki Hazama, Takashi Kamo, Hideya Miyazaki, Hiroyuki Sato, Kenji Hayashi, Fumiaki Shigemitsu, Ichiro Mori

Proceedings Volume 2197, (1994) https://doi.org/10.1117/12.175486

KEYWORDS: Photomasks, Optical properties, Transmittance, Reflection, Phase shifts, Quartz, Halftones, Refractive index, Semiconductors, Silicon

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