Mr. Gaston Lee Profile

Gaston Lee

Technical Manager at Taiwan Semiconductor Manufacturing Co Ltd

SPIE Involvement:

Author

Area of Expertise:

Photomask , Lithography

Publications (7)

Proceedings Article | 10 May 2016 Paper

Investigation and modeling of CPL mask profiles using OCD

Hsuan-Chen Chen, Ren-Hao Lin, Chien-Cheng Chen, Cheng-Hsuan Huang, Ta-Cheng Lien, Chia-Jen Chen, Gaston Lee, Hsin-Chang Lee, Anthony Yen

Proceedings Volume 9984, 998408 (2016) https://doi.org/10.1117/12.2245332

KEYWORDS: Photomasks, Transmission electron microscopy, Atomic force microscopy, Critical dimension metrology, Scanning electron microscopy, Semiconducting wafers, Lithography, Metrology, Modeling, Phase shifts

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Proceedings Article | 25 September 2010 Paper

Fundamental study of droplet spray characteristics in photomask cleaning for advanced lithography

C. L. Lu, C. H. Yu, W. H. Liu, Luke Hsu, Angus Chin, S. C. Lee, Anthony Yen, Gaston Lee, Peter Dress, Sherjang Singh, Uwe Dietze

Proceedings Volume 7823, 782325 (2010) https://doi.org/10.1117/12.864303

KEYWORDS: Binary data, Particles, Photomasks, SRAF, Nitrogen, Personal digital assistants, Liquids, Quartz, Mask cleaning, Atomic force microscopy

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Proceedings Article | 23 September 2009 Paper

Reduction of local CD-linewidth variations in resist develop through acoustic streaming

Gaston Lee, Peter Dress, Ssuwei Chen, Uwe Dietze

Proceedings Volume 7488, 74880K (2009) https://doi.org/10.1117/12.829613

KEYWORDS: Critical dimension metrology, Photoresist processing, Acoustics, Photomasks, Forward error correction, Lithography, Standards development, Image processing, Double patterning technology, Data modeling

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Proceedings Article | 20 May 2006 Paper

Pattern fidelity enhancement with OPC pattern generation on laser lithography

Gaston Lee, Yi-Sheng Chung, Wei-Tsung Yang, Wen-Hwa Cheng, Ren-Jang Lin, Tsung Si Wang, Yuan-Cheng Cheng, Wei-Jen Chou

Proceedings Volume 6283, 62831H (2006) https://doi.org/10.1117/12.681742

KEYWORDS: Optical proximity correction, Double patterning technology, Inspection, Lithography, Photomasks, Visualization, Scattering, Laser applications, Manufacturing, Laser scattering

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Proceedings Article | 28 June 2005 Paper

Application of a wafer development process to mask making

Gaston Lee, Celine Berger, Christian Burgel, Axel Feicke, Rusty Cantrell, Martin Tschinkl

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617104

KEYWORDS: Photomasks, Semiconducting wafers, Forward error correction, Reticles, Manufacturing, Chromium, Control systems, Standards development, Etching, Photoresist processing

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Proceedings Article | 6 December 2004 Paper

First photomask developer based on state-of-the-art wafer processing technology

Peter Tichy, Takahiro Fukai, Shigenori Kamei, Hiroshi Asai, Tatsuhito Kotoda, Kazuhiro Takeshita, Tetsushi Miyamoto, Yoshiki Okamoto, Hideo Funakoshi, Shinji Koga, Shigemi Oono, Rusty Cantrell, Axel Feicke, Wolfram Porsche, Martin Tschinkl, Gaston Lee

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.568820

KEYWORDS: Photomasks, Semiconducting wafers, Photoresist developing, Manufacturing, Critical dimension metrology, Reticles, Control systems, Diffusion, Photoresist processing, Wafer manufacturing

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Proceedings Article | 6 December 2004 Paper

Evaluation of a new-generation photomask develop system for CAR

Rusty Cantrell, Martin Tschinkl, Axel Feicke, Wolfram Porsche, Gaston Lee, Tatsuhito Kotoda, Peter Tichy, Takahiro Fukai, Shigenori Kamei, Hiroshi Asai

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.568393

KEYWORDS: Photomasks, Semiconducting wafers, Particles, Deep ultraviolet, Standards development, Lithography, Manufacturing, Photoresist processing, Control systems, Diffractive optical elements

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Showing 5 of 7 publications

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