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Gordon Chan
Engineer at Tekscend Photomask Chunghwa Inc.
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Publications (2)
Proceedings Article | 30 October 2007 Paper
Evaluation of the effect of mask-blank flatness on CDU and DOF in high-NA systems
Christopher Lee, Chia Wen Chang, Tomas Chin, Richard Lu, Steven Fan, Derek Chen, Gordon Chan, Torey Huang
Proceedings Volume 6730, 67300D (2007) https://doi.org/10.1117/12.746614
KEYWORDS: Photomasks, Semiconducting wafers, Lithography, Finite element methods, Critical dimension metrology, Error analysis, Lutetium, Fluctuations and noise, Printing, Pellicles
Proceedings Article | 8 November 2005 Paper
Advanced e-beam CAR resist evaluation for 65nm generation
Gordon Chan, Orson Lin, Wesen Tseng, Booky Lee, Torey Huang, Makoto Kozuma
Proceedings Volume 5992, 59923B (2005) https://doi.org/10.1117/12.632052
KEYWORDS: Critical dimension metrology, Photomasks, Line edge roughness, Photoresist processing, Etching, Manufacturing, Edge roughness, Chemically amplified resists, Tin, Electronics
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