Dr. Hervé Besaucele Profile

Dr. Hervé Besaucele

at Thales LAS France SAS

SPIE Involvement:

Author

Publications (12)

Proceedings Article | 20 April 2021 Presentation

10 petawatts laser operation within beam transport section at ELI-NP

François Lureau, Caroline Richard, Christophe Radier, Olivier Chalus, Guillaume Matras, Sandrine Ricaud, Sébastien Laux, Olivier Casagrande, Hervé Besaucele, Christophe Simon-Boisson

Proceedings Volume 11666, 1166605 (2021) https://doi.org/10.1117/12.2582963

KEYWORDS: Pulsed laser operation, Mirrors, Laser beam propagation, Ranging, Transmittance, Optical inspection, Nuclear physics, Inspection, Imaging systems

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Proceedings Article | 5 March 2021 Presentation + Paper

Multi-TW, sub 33-fs fiber laser seeded Ti:Sa amplifier

S. Boivinet, A. Pellegrina, L. Ranc, T. Morbieu, S. Vidal, J. Boullet, H. Beseaucele, B. Beaurepaire, O. Casagrande, S. Laux, S. Ricaud

Proceedings Volume 11664, 116640T (2021) https://doi.org/10.1117/12.2580390

KEYWORDS: Fiber lasers, Oscillators, Amplifiers, Pulsed laser operation, Second-harmonic generation, Manufacturing, Laser manufacturing, Laser development, Femtosecond phenomena, Chemical elements

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Proceedings Article | 3 January 2019 Paper

High energy excimer laser system for nanosecond annealing of semiconductor devices

Hervé Besaucèle, Audrey Adnet, François Beau, Yacine Bouksou, Cédric Bellier, Paul Ceccato, Maxime Chatelain, Nabil Douri, Hervé Dusserre, Cyril Dutems, Martin Heintzmann, Karim Huet, Mathieu Lenormand, Bobby Lespinasse, Vincent Martinez, Fulvio Mazzamuto, Antoine Melin, Sylvain Perrot, David Rodrigues, Laurent Ruet, Olivier Sannier, Guillaume Thebault, Inès Toqué-Tresonne, Armand Vestraete, Karim Zekri

Proceedings Volume 11042, 110420S (2019) https://doi.org/10.1117/12.2522443

KEYWORDS: Excimer lasers, Pulsed laser operation, Annealing, Semiconductors, Semiconductor lasers, Semiconducting wafers, Laser systems engineering, Temperature metrology, Ultraviolet radiation, Manufacturing

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Proceedings Article | 7 March 2008 Paper

Performance demonstration of significant availability improvement in lithography light sources using GLX control system

Kevin O'Brien, Wayne Dunstan, Daniel Riggs, Aravind Ratnam, Robert Jacques, Herve Besaucele, Daniel Brown, Kevin Zhang, Nigel Farrar

Proceedings Volume 6924, 69242Q (2008) https://doi.org/10.1117/12.777209

KEYWORDS: Light sources, Semiconducting wafers, Control systems, Pulsed laser operation, Scanners, Halogens, Lithography, Signal processing, Manufacturing, Semiconductor lasers

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Proceedings Article | 28 May 2004 Paper

Long-term reliable operation of a MOPA-based ArF light source for microlithography

Toshihiko Ishihara, Herve Besaucele, Cynthia Maley, Vladimir Fleurov, Patrick O'Keeffe, Mary Haviland, Richard Morton, Walter Gillespie, Timothy Dyer, Bryan Moosman, Robert Poole

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.535614

KEYWORDS: Molybdenum, Oscillators, Optical lithography, Calibration, Electrodes, Manufacturing, Optics manufacturing, Light sources, Laser stabilization, Pulsed laser operation

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Proceedings Article | 26 June 2003 Paper

Dual-chamber ultra line-narrowed excimer light source for 193-nm lithography

Vladimir Fleurov, Daniel Colon, Daniel Brown, Patrick O'Keeffe, Herve Besaucele, Alexander Ershov, Fedor Trintchouk, T. Ishihara, Paolo Zambon, R. Rafac, A. Lukashev

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485358

KEYWORDS: Molybdenum, Light sources, Excimers, Control systems, Lithography, Optical amplifiers, Acoustics, Optical lithography, Oscillators, Energy efficiency

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Proceedings Article | 5 July 2000 Paper

Comparison of ArF and KrF laser performance at 2 kHz for microlithography

Herve Besaucele, Palash Das, Thomas Duffey, Todd Embree, Alexander Ershov, Vladimir Fleurov, Steven Grove, Paul Melcher, Richard Ness, Gunasiri Padmabandu

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.388986

KEYWORDS: Optical lithography, Sensors, 193nm lithography, Pulsed power, Laser stabilization, Control systems, Laser applications, Optics manufacturing, Fabry–Perot interferometers, Optical components

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Proceedings Article | 5 July 2000 Paper

Performance of very high repetition rate ArF lasers

Jean-Marc Hueber, Herve Besaucele, Palash Das, Rick Eis, Alexander Ershov, Vladimir Fleurov, Dmitri Gaidarenko, Thomas Hofmann, Paul Melcher, William Partlo, Bernard Nikolaus, Scot Smith, Kyle Webb

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.388979

KEYWORDS: Laser applications, Laser scanners, 3D scanning, Laser development, Pulsed laser operation, Semiconducting wafers, Laser optics, Laser stabilization, Fabry–Perot interferometers, Manufacturing

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Proceedings Article | 26 July 1999 Paper

Performance characteristics of ultranarrow ArF laser for DUV lithography

Alexander Ershov, Herve Besaucele, Palash Das

Proceedings Volume 3679, (1999) https://doi.org/10.1117/12.354308

KEYWORDS: Fabry–Perot interferometers, Output couplers, Lithography, Fluorine, Deep ultraviolet, Manufacturing, Chromatic aberrations, Pulsed laser operation, Optical resonators, Reflectivity

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Proceedings Article | 4 April 1997 Paper

Improvement in the performance of a high average power XeCl laser

Bernard Lacour, Henri Brunet, Claude Gagnol, Bernard Vincent, Herve Besaucele

Proceedings Volume 3092, (1997) https://doi.org/10.1117/12.270260

KEYWORDS: Excimer lasers, Electrons, Gas lasers, Ionization, Energy efficiency, Electrodes, Capacitors, Inductance, Pulsed laser operation, Switches

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Proceedings Article | 16 August 1994 Paper

500 watts industrial excimer laser at high repetition rate

Bernard Lacour, Henri Brunet, Herve Besaucele, Claude Gagnol, Bernard Vincent

Proceedings Volume 2206, (1994) https://doi.org/10.1117/12.184601

KEYWORDS: Excimer lasers, Prototyping, Energy efficiency, Capacitors, Laser development, Reliability, Electrodes, Inductance, Laser applications, Control systems

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Proceedings Article | 4 May 1993 Paper

High average power XeCl excimer laser

Bernard Lacour, Henri Brunet, Herve Besaucele, Claude Gagnol

Proceedings Volume 1810, (1993) https://doi.org/10.1117/12.144666

KEYWORDS: Excimer lasers, Pulsed laser operation, Laser development, Capacitors, Reliability, Energy efficiency, Laser systems engineering, Mirrors, Chemical lasers, Lasers

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Showing 5 of 12 publications

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