Dr. Haruhiko Kusunose Profile

Dr. Haruhiko Kusunose

Managing Director at Lasertec Corp

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Author

Publications (25)

Proceedings Article | 9 April 2020 Paper

Enabling EUVL high-volume manufacturing with actinic patterned mask inspection

Anna Tchikoulaeva, Hiroki Miyai, Tsunehito Kohyama, Kiwamu Takehisa, Haruhiko Kusunose

Proceedings Volume 11323, 113231K (2020) https://doi.org/10.1117/12.2557858

KEYWORDS: Inspection, Photomasks, Extreme ultraviolet lithography, Extreme ultraviolet, Reticles, Defect detection, High volume manufacturing, Particles, Pellicles, Deep ultraviolet

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Proceedings Article | 25 November 2019 Open Access

Actinic patterned mask defect inspection for EUV lithography

Hiroki Miyai, Tsunehito Kohyama, Tomohiro Suzuki, Kiwamu Takehisa, Haruhiko Kusunose

Proceedings Volume 11148, 111480W (2019) https://doi.org/10.1117/12.2538001

KEYWORDS: Photomasks, Inspection, Extreme ultraviolet, Defect inspection, Deep ultraviolet, Defect detection, Semiconducting wafers, Extreme ultraviolet lithography, Lithography, Image resolution

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Proceedings Article | 13 July 2017 Paper

Development of high sensitivity and high speed large size blank inspection system LBIS

Shinobu Ohara, Akinori Yoshida, Mitsuo Hirai, Takenori Kato, Koichi Moriizumi, Haruhiko Kusunose

Proceedings Volume 10454, 1045402 (2017) https://doi.org/10.1117/12.2284332

KEYWORDS: Inspection, Photomasks, Light scattering, Organic light emitting diodes, Digital image correlation, Manufacturing, Laser development, Optics manufacturing, LCDs, Particles

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Proceedings Article | 18 March 2016 Paper

Advances in the detection capability on actinic blank inspection

Takeshi Yamane, Tsuyoshi Amano, Noriaki Takagi, Hidehiro Watanabe, Ichro Mori, Tomohisa Ino, Tomohiro Suzuki, Kiwamu Takehisa, Hiroki Miyai, Haruhiko Kusunose

Proceedings Volume 9776, 97761G (2016) https://doi.org/10.1117/12.2222747

KEYWORDS: Inspection, Photomasks, Extreme ultraviolet lithography, Light scattering, Multilayers, Defect detection, Extreme ultraviolet, Semiconducting wafers, Lithographic illumination, Mirrors, EUV optics, CCD cameras

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Proceedings Article | 9 July 2015 Paper

Detection capability of Actinic Blank Inspection tool

Tomohiro Suzuki, Hiroki Miyai, Kiwamu Takehisa, Haruhiko Kusunose, Hidehiro Watanabe, Ichiro Mori

Proceedings Volume 9658, 96580O (2015) https://doi.org/10.1117/12.2197309

KEYWORDS: Inspection, Mirrors, Lithographic illumination, Extreme ultraviolet, Defect detection, Photomasks, Ray tracing, Data modeling, Extreme ultraviolet lithography, High volume manufacturing

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Proceedings Article | 28 July 2014 Paper

Performance in practical use of actinic EUVL mask blank inspection

Takeshi Yamane, Yongdae Kim, Noriaki Takagi, Tsuneo Terasawa, Tomohisa Ino, Tomohiro Suzuki, Hiroki Miyai, Kiwamu Takehisa, Haruhiko Kusunose

Proceedings Volume 9256, 92560P (2014) https://doi.org/10.1117/12.2067566

KEYWORDS: Photomasks, Inspection, Surface roughness, Prototyping, Semiconducting wafers, Defect detection, Critical dimension metrology, Extreme ultraviolet lithography, Light scattering, CCD cameras

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Proceedings Article | 28 July 2014 Paper

Defect analysis on actinic blank inspection tool

Tomohiro Suzuki, Hiroki Miyai, Kiwamu Takehisa, Haruhiko Kusunose, Takeshi Yamane, Hidehiro Watanabe, Ichiro Mori

Proceedings Volume 9256, 92560O (2014) https://doi.org/10.1117/12.2069197

KEYWORDS: Inspection, Extreme ultraviolet lithography, Photomasks, Extreme ultraviolet, Image classification, Mirrors, Geometrical optics, Ray tracing, Lithography, Manufacturing

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Proceedings Article | 28 June 2013 Paper

The capability of high magnification review function for EUV actinic blank inspection tool

Hiroki Miyai, Tomohiro Suzuki, Kiwamu Takehisa, Haruhiko Kusunose, Takeshi Yamane, Tsuneo Terasawa, Hidehiro Watanabe, Ichiro Mori

Proceedings Volume 8701, 870118 (2013) https://doi.org/10.1117/12.2030712

KEYWORDS: Inspection, Mirrors, Extreme ultraviolet, Extreme ultraviolet lithography, Photomasks, Charge-coupled devices, Defect detection, Multilayers, Switches, Ions

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Proceedings Article | 1 April 2013 Paper

EUV actinic blank inspection: from prototype to production

Anna Tchikoulaeva, Hiroki Miyai, Tomohiro Suzuki, Kiwamu Takehisa, Haruhiko Kusunose, Takeshi Yamane, Tsuneo Terasawa, Hidehiro Watanabe, Soichi Inoue, Ichiro Mori

Proceedings Volume 8679, 86790I (2013) https://doi.org/10.1117/12.2011776

KEYWORDS: Inspection, Extreme ultraviolet, Photomasks, Defect inspection, Prototyping, Extreme ultraviolet lithography, Defect detection, High volume manufacturing, Metrology, Mirrors

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Proceedings Article | 30 June 2012 Paper

EUV actinic blank inspection tool with a high magnification review mode

Tomohiro Suzuki, Hiroki Miyai, Kiwamu Takehisa, Haruhiko Kusunose, Takeshi Yamane, Tsuneo Terasawa, Hidehiro Watanabe, Soichi Inoue, Ichiro Mori

Proceedings Volume 8441, 844115 (2012) https://doi.org/10.1117/12.964983

KEYWORDS: Inspection, Mirrors, Extreme ultraviolet, Switches, EUV optics, Photomasks, Charge-coupled devices, Cameras, Extreme ultraviolet lithography, Electroluminescent displays

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Proceedings Article | 11 May 2009 Paper

Phase-shift/transmittance measurements in a micro pattern using MPM193EX

Hiroto Nozawa, Takayuki Ishida, Satoru Kato, Osamu Sato, Koji Miyazaki, Kiwamu Takehisa, Naoki Awamura, Hideo Takizawa, Hal Kusunose

Proceedings Volume 7379, 737925 (2009) https://doi.org/10.1117/12.824318

KEYWORDS: Phase measurement, Transmittance, Photomasks, Signal detection, Lithography, Distance measurement, Interferometers, Image processing, Charge-coupled devices, Objectives

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Proceedings Article | 11 May 2009 Paper

Improvement of EUVL mask blank inspection capability at Intel

Andy Ma, Ted Liang, Seh-Jin Park, Guojing Zhang, Tomoya Tamura, Kazunori Omata, Yuta Sato, Hal Kusunose

Proceedings Volume 7379, 73790I (2009) https://doi.org/10.1117/12.824259

KEYWORDS: Inspection, Quartz, Silica, Photomasks, Particles, Extreme ultraviolet lithography, Extreme ultraviolet, Defect detection, Surface roughness, Defect inspection

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Proceedings Article | 30 October 2007 Paper

EUV mask substrate flatness improvement by laser irradiation

Kiwamu Takehisa, Jun Kodama, Haruhiko Kusunose

Proceedings Volume 6730, 67305I (2007) https://doi.org/10.1117/12.746537

KEYWORDS: Laser irradiation, Excimer lasers, Extreme ultraviolet, Quartz, Pulsed laser operation, Optical simulations, Extreme ultraviolet lithography, EUV optics, Polishing, Surface finishing

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Proceedings Article | 13 March 2007 Paper

Inspection with the Lasertec M7360 at the SEMATECH Mask Blank Development Center

Wonil Cho, Patrick Kearney, Eric Gullikson, Anwei Jia, Tomoya Tamura, Atsushi Tajima, Hal Kusunose, Chan-Uk Jeon

Proceedings Volume 6517, 65170D (2007) https://doi.org/10.1117/12.712990

KEYWORDS: Inspection, Photomasks, Extreme ultraviolet lithography, Defect detection, Extreme ultraviolet, Reflectivity, Multilayers, Defect inspection, Atomic force microscopy, Optical spheres

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Proceedings Article | 6 May 2005 Paper

Modeling the defect inspection sensitivity of a confocal microscope

E. Gullikson, E. Tejnil, K.-Y. Tsai, A. Stivers, H. Kusunose

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.600209

KEYWORDS: Optical spheres, Multilayers, Confocal microscopy, Photomasks, Microscopes, Silica, Defect inspection, Light scattering, Inspection, Scattering

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Proceedings Article | 17 December 2003 Paper

EUV substrate and blank inspection with confocal microscopy

Jan-Peter Urbach, Jan Cavelaars, Hal Kusunose, Ted Liang, Alan Stivers

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518388

KEYWORDS: Inspection, Photomasks, Semiconducting wafers, Extreme ultraviolet lithography, Quartz, Confocal microscopy, Scattering, Particles, Signal detection, Extreme ultraviolet

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Proceedings Article | 17 December 2003 Paper

Development of phase-shift and transmittance metrology system for 157-nm PSMs

Hal Kusunose, Takashi Yasui, Iwao Higashikawa

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518033

KEYWORDS: Transmittance, Phase measurement, Photomasks, Interferometers, Quartz, Lithography, Ultraviolet radiation, Deep ultraviolet, Charge-coupled devices, Metrology

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Proceedings Article | 24 July 1996 Paper

Performance of i- and g-line phase-shift measurement system MPM-100

Hiroshi Fujita, Hisatake Sano, Haruhiko Kusunose, Hideo Takizawa, Kouji Miyazaki, Naoki Awamura, Takahiro Ode, Daikichi Awamura

Proceedings Volume 2793, (1996) https://doi.org/10.1117/12.245227

KEYWORDS: Phase shifts, Phase measurement, Halftones, Sodium, Transmittance, Refractive index, Photomasks, Objectives, Quartz, Laser systems engineering

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Proceedings Article | 24 July 1996 Paper

Direct phase-shift measurement with transmitted deep-UV illumination

Haruhiko Kusunose, Naoki Awamura, Hideo Takizawa, Kouji Miyazaki, Takahiro Ode, Daikichi Awamura

Proceedings Volume 2793, (1996) https://doi.org/10.1117/12.245242

KEYWORDS: Phase measurement, Interferometers, Deep ultraviolet, Quartz, Refractive index, Photomasks, Semiconducting wafers, Excimer lasers, Lamps, Etching

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Proceedings Article | 24 July 1996 Paper

Transmittance measurement with interferometer system

Hideo Takizawa, Haruhiko Kusunose, Naoki Awamura, Kouji Miyazaki, Takahiro Ode, Daikichi Awamura

Proceedings Volume 2793, (1996) https://doi.org/10.1117/12.245226

KEYWORDS: Transmittance, Interferometers, Shearing interferometers, Microscopes, Virtual point source, Spectrophotometry, Optical testing, Photomasks, Mirrors, Particles

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Proceedings Article | 3 November 1994 Paper

Phase measurement system with transmitted UV light for phase-shifting mask inspection

Haruhiko Kusunose, Hiroyuki Nakae, Junji Miyazaki, Nobuyuki Yoshioka, Hiroaki Morimoto, Keiichi Murayama, Katsuhiro Tsukamoto

Proceedings Volume 2254, (1994) https://doi.org/10.1117/12.191941

KEYWORDS: Phase shifts, Phase measurement, Photomasks, Semiconducting wafers, Quartz, Inspection, Shearing interferometers, Transmittance, Microscopes, Refractive index

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Proceedings Article | 17 May 1994 Paper

Attenuated phase-shifting mask with a single-layer absorptive shifter of CrO, CrON, MoSiO, and MoSiON film

Masayuki Nakajima, Nobuyuki Yoshioka, Junji Miyazaki, Haruhiko Kusunose, Kunihiro Hosono, Hiroaki Morimoto, Wataru Wakamiya, Keiichi Murayama, Yaichiro Watakabe, Katsuhiro Tsukamoto

Proceedings Volume 2197, (1994) https://doi.org/10.1117/12.175405

KEYWORDS: Photomasks, Phase shifts, Lithography, Etching, Transmittance, Excimer lasers, Semiconducting wafers, Sputter deposition, Mask making, Molybdenum

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Proceedings Article | 8 August 1993 Paper

Advanced process with magnetically enhanced RIE for phase-shifting mask fabrication

Satoshi Aoyama, Haruhiko Kusunose, Minoru Hanazaki, Nobuyuki Yoshioka, Yaichiro Watakabe, Atsushi Hayashi, Akihiko Isao, Yasuo Tokoro

Proceedings Volume 1927, (1993) https://doi.org/10.1117/12.150466

KEYWORDS: Etching, Magnetism, Chromium, Phase shifts, Protactinium, Photomasks, Optical lithography, Reactive ion etching, Critical dimension metrology, Plasma

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Proceedings Article | 1 June 1992 Paper

Shape effects of edge-line phase shifter on light intensity contrast

Mitsunori Nakatani, Hirofumi Nakano, Haruhiko Kusunose, Kazuya Kamon, Shuichi Matsuda, Yaichiro Watakabe, Hirozo Takano, Mutuyuki Otsubo

Proceedings Volume 1674, (1992) https://doi.org/10.1117/12.130350

KEYWORDS: Phase shifts, Image processing, Photoresist processing, Optical lithography, Image resolution, Gallium arsenide, Field effect transistors, Phase shifting, Semiconducting wafers, Optoelectronics

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Proceedings Article | 1 June 1992 Paper

Novel process for phase-shifting mask fabrication

Haruhiko Kusunose, Satoshi Aoyama, Kunihiro Hosono, Susumu Takeuchi, Shuichi Matsuda, Maaike Op de Beeck, Nobuyuki Yoshioka, Yaichiro Watakabe

Proceedings Volume 1674, (1992) https://doi.org/10.1117/12.130323

KEYWORDS: Phase shifts, Chromium, Photomasks, Etching, Mask making, Ultraviolet radiation, Metals, Quartz, Inspection, Floods

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Showing 5 of 25 publications

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