Mr. Hayato Kimura Profile

Hayato Kimura

at NuFlare Technology Inc

SPIE Involvement:

Author

Publications (15)

Proceedings Article | 12 November 2024 Presentation + Paper

Recent advancement and future plans on electron multi-beam mask writers

Jumpei Yasuda, Tomoo Motosugi, Hayato Kimura, Kenichi Yasui, Hiroshi Matsumoto, Michihiro Kawaguchi, Yoshinori Kojima, Masato Saito

Proceedings Volume 13216, 1321617 (2024) https://doi.org/10.1117/12.3034512

KEYWORDS: Extreme ultraviolet, Beam path, Industry, Glasses, Resolution enhancement technologies, Semiconductors, Scanners, Quartz, Photoresist processing, Optical systems

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Proceedings Article | 18 September 2024 Paper

Recent progress of multi-beam mask writer MBM-3000

Issei Aibara, Hiroshi Matsumoto, Jumpei Yasuda, Ken-ichi Yasui, Tomoo Motosugi, Hayato Kimura, Michihiro Kawaguchi, Yoshinori Kojima, Masato Saito, Noriaki Nakayamada

Proceedings Volume 13273, 132730O (2024) https://doi.org/10.1117/12.3028706

KEYWORDS: Industry, Extreme ultraviolet, Design, Singular optics, Semiconducting wafers, Optical lithography, Optical design, Glasses, Extreme ultraviolet lithography, Deep ultraviolet

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Proceedings Article | 26 August 2024 Paper

Recent advancements of multibeam mask writer MBM-3000

Moeka Oshiro, Jumpei Yasuda, Hiroshi Matsumoto, Tomoo Motosugi, Hayato Kimura, Michihiro Kawaguchi, Yoshinori Kojima, Hiroshi Yamashita, Masato Saito, Noriaki Nakayamada

Proceedings Volume 13177, 131770U (2024) https://doi.org/10.1117/12.3034396

KEYWORDS: Beam path, Optical systems, Industry, Glasses, Extreme ultraviolet, Resolution enhancement technologies, Semiconductors, Scanners, Optical lithography, Optical design

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Proceedings Article | 9 April 2024 Presentation + Paper

Multi-beam mask writer MBM-3000 for next generation EUV mask production

Hiroshi Matsumoto, Jumpei Yasuda, Tomoo Motosugi, Hayato Kimura, Yoshinori Kojima, Hiroshi Yamashita, Masato Saito, Noriaki Nakayamada

Proceedings Volume 12956, 1295602 (2024) https://doi.org/10.1117/12.3010686

KEYWORDS: Extreme ultraviolet, Aberration correction, Optical lithography, Optical design, Resolution enhancement technologies, Printing, Distortion, Semiconducting wafers, Projection systems

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Proceedings Article | 21 November 2023 Presentation + Paper

Multi-beam mask writer MBM-3000 for next generation EUV mask production

Hiroshi Matsumoto, Jumpei Yasuda, Tomoo Motosugi, Hayato Kimura, Michihiro Kawaguchi, Yoshinori Kojima, Hiroshi Yamashita, Masato Saito, Takao Tamura, Noriaki Nakayamada

Proceedings Volume 12751, 127510X (2023) https://doi.org/10.1117/12.2687415

KEYWORDS: Extreme ultraviolet, Electron beam lithography, Projection lithography, Resolution enhancement technologies, Distortion, Mask making

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Proceedings Article | 1 May 2023 Presentation + Paper

Current performance and future plans on electron multi-beam mask writers toward high-NA EUV era

Hiroshi Matsumoto, Haruyuki Nomura, Hayato Kimura, Keisuke Yamaguchi, Yoshinori Kojima, Masato Saito, Takao Tamura, Noriaki Nakayamada

Proceedings Volume 12497, 1249708 (2023) https://doi.org/10.1117/12.2657994

KEYWORDS: Manufacturing, Extreme ultraviolet, Data conversion, Control systems, Microelectromechanical systems, Photomasks, Electron beam lithography

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Proceedings Article | 11 November 2022 Presentation

Selective leading-edge mask writing and high-throughput mask writing in multi-beam mask writer MBM-2000PLUS

Haruyuki Nomura, Hiroshi Matsumoto, Keisuke Yamaguchi, Hayato Kimura, Noriaki Nakayamada

Proceedings Volume PC12293, PC122930I (2022) https://doi.org/10.1117/12.2641449

KEYWORDS: Photomasks, Glasses, Semiconductors, Physical phenomena, Optical lithography, Mask making, Line edge roughness, Extreme ultraviolet lithography, Error analysis, Edge roughness

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Proceedings Article | 16 September 2022 Paper

Multi-beam mask writer MBM-2000PLUS

Haruyuki Nomura, Hiroshi Matsumoto, Keisuke Yamaguchi, Hayato Kimura, Satoshi Nakahashi, Noriaki Nakayamada

Proceedings Volume 12325, 123250O (2022) https://doi.org/10.1117/12.2641338

KEYWORDS: Photomasks, Line edge roughness, Mask making, Metrology, Data conversion, Convolution, Data processing

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Proceedings Article | 25 May 2022 Presentation + Paper

Multi-beam mask writer MBM-2000PLUS

Haruyuki Nomura, Hiroshi Matsumoto, Keisuke Yamaguchi, Hayato Kimura, Satoshi Nakahashi, Nariaki Nakayamada

Proceedings Volume 12054, 1205408 (2022) https://doi.org/10.1117/12.2616664

KEYWORDS: Photomasks, Line edge roughness, Mask making, Data conversion, Data processing

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SPIE Journal Paper | 9 November 2021

Study on physical model of resist surface charge in multi-beam mask writer and single variable-shaped beam writers

Haruyuki Nomura, Noriaki Nakayamada, Hayato Kimura, Keisuke Yamaguchi, Takanao Touya, Kazuhiro Kishi, Yasunori Hatanaka, Kenji Ohtoshi

JM3, Vol. 20, Issue 04, 041404, (November 2021) https://doi.org/10.1117/12.10.1117/1.JMM.20.4.041404

KEYWORDS: Electron beam melting, Photomasks, Electron beams, Diffusion, Differential equations, Metrology, Glasses, Polymethylmethacrylate, Optical simulations, Statistical analysis

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Proceedings Article | 1 October 2021 Presentation

Multi-beam mask writer MBM-2000

Hiroshi Matsumoto, Keisuke Yamaguchi, Hayato Kimura, Noriaki Nakayamada

Proceedings Volume 11855, 118550W (2021) https://doi.org/10.1117/12.2600904

KEYWORDS: Photomasks, Optical design, Distortion, Data processing, Scattering, Photoresist processing, Modulation, Laser scattering, Glasses, Forward error correction

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Proceedings Article | 23 August 2021 Paper

Multi-beam mask writer, MBM-2000

Hiroshi Matsumoto, Keisuke Yamaguchi, Hayato Kimura, Noriaki Nakayamada

Proceedings Volume 11908, 119080L (2021) https://doi.org/10.1117/12.2604378

KEYWORDS: Photomasks, Thermal effects, Modulation, Vestigial sideband modulation, Forward error correction, Extreme ultraviolet lithography, Thin film coatings, Semiconductors, Semiconducting wafers, Error analysis

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Proceedings Article | 24 February 2021 Presentation

Multi-beam mask writer MBM-2000 (Conference Presentation)

Hiroshi Matsumoto, Keisuke Yamaguchi, Hayato Kimura, Noriaki Nakayamada

Proceedings Volume 11610, 116100Y (2021) https://doi.org/10.1117/12.2586288

KEYWORDS: Photomasks, Optical design, Distortion, Data processing, Scattering, Photoresist processing, Modulation, Laser scattering, Glasses, Forward error correction

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Proceedings Article | 20 September 2020 Presentation

Multi-beam mask writer MBM-2000

Hiroshi Matsumoto, Keisuke Yamaguchi, Hayato Kimura, Kenichi Yasui

Proceedings Volume 11518, 115180A (2020) https://doi.org/10.1117/12.2573147

KEYWORDS: Optical design, Electron beam lithography, Scattering, Distortion, Vestigial sideband modulation, Optical proximity correction, Forward error correction, Laser scattering, Extreme ultraviolet, Photoresist processing

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Proceedings Article | 26 March 2019 Paper

Multi-beam mask writer MBM-1000

Hiroshi Matsumoto, Hayato Kimura, Takao Tamura, Kenji Ohtoshi

Proceedings Volume 10958, 109580J (2019) https://doi.org/10.1117/12.2515200

KEYWORDS: Photomasks, Extreme ultraviolet, Photoresist processing, Electron beam lithography, Electron beams

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Showing 5 of 15 publications

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