Mr. Hironori Ikezawa Profile

Hironori Ikezawa

at Nikon Corp

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Author

Publications (4)

Proceedings Article | 20 March 2019 Paper

Automatic parameter setting for lens aberration control during product lot exposure

Yutaka Kanakutsu, Yukio Koizumi, Hironori Ikezawa, Shigeru Eto, Junji Ikeda, Takenori Takeuchi, Tomoyuki Matsuyama, Edward Stan, Ronald Hiltunen

Proceedings Volume 10961, 109610M (2019) https://doi.org/10.1117/12.2514917

KEYWORDS: Calibration, Reticles, Actuators, Control systems, Wavefronts, Scanners, Distortion, Automatic control, Feedback control, Deformable mirrors

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Proceedings Article | 15 March 2016 Paper

High-order aberration control during exposure for leading-edge lithography projection optics

Yasuhiro Ohmura, Yosuke Tsuge, Toru Hirayama, Hironori Ikezawa, Daisuke Inoue, Yasuhiro Kitamura, Yukio Koizumi, Keisuke Hasegawa, Satoshi Ishiyama, Toshiharu Nakashima, Takahisa Kikuchi, Minoru Onda, Yohei Takase, Akimasa Nagahiro, Susumu Isago, Hidetaka Kawahara

Proceedings Volume 9780, 97800Y (2016) https://doi.org/10.1117/12.2218840

KEYWORDS: Wavefronts, Control systems, Deformable mirrors, Distortion, Optical lithography, Lithography, Projection systems, Overlay metrology, Performance modeling, Mirrors

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Proceedings Article | 12 March 2008 Paper

An intelligent imaging system for ArF scanner

Tomoyuki Matsuyama, Yasuhiro Ohmura, Toshiharu Nakashima, Yusaku Uehara, Taro Ogata, Hisashi Nishinaga, Hironori Ikezawa, Tsuyoshi Toki, Slava Rokitski, James Bonafede

Proceedings Volume 6924, 69241S (2008) https://doi.org/10.1117/12.771942

KEYWORDS: Imaging systems, Scanners, Optical proximity correction, Line width roughness, Control systems, Wavefronts, Optical lithography, Double patterning technology, Reticles, Metrology

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Proceedings Article | 15 March 2006 Paper

A hyper-NA projection lens for ArF immersion exposure tool

Hironori Ikezawa, Yasuhiro Ohmura, Tomoyuki Matsuyama, Yusaku Uehara, Toshiro Ishiyama

Proceedings Volume 6154, 615421 (2006) https://doi.org/10.1117/12.656083

KEYWORDS: Polarization, Projection systems, Mirrors, Combined lens-mirror systems, Refractor telescopes, Monochromatic aberrations, Semiconducting wafers, Wafer-level optics, Wavefronts, Resolution enhancement technologies

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