A phase correction method that utilizes fringe color-coding in phase-measuring profilometry is proposed. Original and additional fringes are encoded into the R and B channels, respectively. The R + B channel patterns are projected onto an object, captured using a camera, where the R and B channels are extracted. Then, phase shifts obtained from the R and B channels are utilized for absolute phase calculation and correction. Simulations and experiments demonstrate that this method can correct edge order errors and avoid increasing the fringe number. Experiments performed using the R + G, G + B, and R + B channels demonstrate that R + B exhibits the least color crosstalk.
To improve the phase-measuring profilometry measurement speed, phase-shifted fringes can be encoded into color channels. However, for colored objects, the intensity of the fringes in each channel is affected by surface texture. Therefore, a measurement method based on color coding and sinusoidal correction is proposed. First, two color images are encoded. The red (R) and blue (B) channels for the first image and the green (G) channel for the second image are used in a three-step phase-shifting process. Meanwhile, the G channel of the first coded image and the R and B channels of the second coded image are corresponding solid colors. Two color-coded images are projected onto the object’s surface, and the CCD captures the modulated deformed fringe pattern. After decoupling, the channels of the images are separated, the pure color channels are extracted, and the reflectivity of each point on the object surface in the RGB channels is calculated. Then, the intensity of the phase-shifted fringes in the two images is corrected by the calculated reflectivity. A 24-color standard color card and color lion mask were used to verify the method. Compared with the traditional color coding method, we were able to reduce the influence of color texture and obtain better results.
Absolute phase retrieval has been widely studied, as it is not much influenced by the discontinuity and occlusion of objects in phase-measuring profilometry. In the practical measurement, however, fringe order determination is by no means easy when the grayscale of deformed patterns is degraded because of uneven reflectivity or the large curvature of measured objects. We introduce a phase-shifting coding (PSC) method to overcome that problem. In the PSC method, fringe order is encoded by the phase-shifting amounts of additional fringe patterns, and the decoding algorithm to retrieve absolute phase is designed on the basis of phase difference and neighborhood consistency. The special statistical filtering and self-correcting filtering methods are utilized to eliminate absolute phase errors. Experiment results demonstrate that the proposed PSC method is effective and has strong robustness in grayscale degradation regions.
An online fringe projection profilometry (OFPP) based on scale-invariant feature transform (SIFT) is proposed. Both rotary and linear models are discussed. First, the captured images are enhanced by “retinex” theory for better contrast and an improved reprojection technique is carried out to rectify pixel size while keeping the right aspect ratio. Then the SIFT algorithm with random sample consensus algorithm is used to match feature points between frames. In this process, quick response code is innovatively adopted as a feature pattern as well as object modulation. The characteristic parameters, which include rotation angle in rotary OFPP and rectilinear displacement in linear OFPP, are calculated by a vector-based solution. Moreover, a statistical filter is applied to obtain more accurate values. The equivalent aligned fringe patterns are then extracted from each frame. The equal step algorithm, advanced iterative algorithm, and principal component analysis are eligible for phase retrieval according to whether the object moving direction accords with the fringe direction or not. The three-dimensional profile of the moving object can finally be reconstructed. Numerical simulations and experimental results verified the validity and feasibility of the proposed method.
A new approach for large field of view measurement using the Shack-Hartmann wavefront sensor (SHWS) is proposed. The object to be measured is divided into several subaperture units. Each unit is measured using the SHWS and a new algorithm is applied to stitch these units. Both theoretical principle and experimental verification are provided in this paper. A comparison between the present global optimization stitching scheme with the conventional sequential stitching method highlights the benefits of the new system. Experimental validation of the SHWS stitching algorithm is carried out by using a coated mirror. Comparison is made with a phase shifting interferometer and good agreement is found. Lastly, a new methodology for large aperture measurement of optical components is provided.
In 3D measurement, specular surfaces can be reconstructed by phase shift reflectometry and the system configuration is simple. In this paper, a wafer is measured for industrial inspection to make sure the quality of the wafer by calibrating, phase unwrapping, slope calculation and integration. The profile result of the whole wafer can be reconstructed and it is a curve. As the height of the structures on the wafer is the target we are interested in, by fitting and subtracting the curve surface, the structures on the wafer can be observed on the flat surface. To confirm the quality farther, a part of the wafer is captured and zoomed in to be detected so that the difference between two structures can be observed better.
A novel quantitative 3D imaging system of silicon microstructures using InfraRed Transport of Intensity Equation (IRTIE) is proposed in this paper. By recording the intensity at multiple planes and using FFT or DCT based TIE solver, fast and accurate phase retrieval for both uniform and non-uniform intensity distributions is proposed. Numerical simulation and experiments confirm the accuracy and reliability of the proposed method. The application of IR-TIE for inspection of micro-patterns in visibly opaque media using 1310 nm light source is demonstrated. For comparison, micro-patterns are also inspected by the contact scanning mode Taylor Hobson system. Quantitative agreement suggests the possibility of using IR-TIE for phase imaging of silicon wafers.
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