Mr. Hoyeon Kim Profile

Hoyeon Kim

at SAMSUNG Electronics Co Ltd

SPIE Involvement:

Author

Publications (5)

Proceedings Article | 24 March 2017 Open Access

Progress in EUV lithography toward manufacturing

Seong-Sue Kim, Roman Chalykh, Hoyeon Kim, Seungkoo Lee, Changmin Park, Myungsoo Hwang, Joo-On Park, Jinhong Park, Hocheol Kim, Jinho Jeon, Insung Kim, Donggun Lee, Jihoon Na, Jungyeop Kim, Siyong Lee, Hyunwoo Kim, Seok-Woo Nam

Proceedings Volume 10143, 1014306 (2017) https://doi.org/10.1117/12.2264043

KEYWORDS: Extreme ultraviolet lithography, Manufacturing, Extreme ultraviolet, Pellicles, Photomasks, Transmittance, Logic, Scanners, Reticles, Chemical elements

Read Abstract +

DOWNLOAD PAPER

Proceedings Article | 20 April 2011 Paper

Reduction of SEM noise and extended application to prediction of CD uniformity and its experimental validation

Hoyeon Kim, Chan Hwang, Seok-hwan Oh, Jeongho Yeo, Young hee Kim

Proceedings Volume 7971, 79710K (2011) https://doi.org/10.1117/12.879590

KEYWORDS: Line width roughness, Scanning electron microscopy, Critical dimension metrology, Inspection, Photoresist materials, Image processing, Denoising, Semiconducting wafers, Data modeling, Metrology

Read Abstract +

Proceedings Article | 23 September 2009 Paper

Revisit to aberration: a simulation study of lens aberration induced overlay misalignment and its experimental validation

Hoyeon Kim, Sung-Woo Lee, Byeongcheol Lee, Sanghwa Lee, Kyoungyong Cho, Seong-Woon Choi, Chan-Hoon Park

Proceedings Volume 7488, 74883E (2009) https://doi.org/10.1117/12.833345

KEYWORDS: Semiconducting wafers, Overlay metrology, Projection systems, Scanners, Monochromatic aberrations, Lithography, Solids, Aberration correction, Metrology, Optical alignment

Read Abstract +

Proceedings Article | 19 May 2008 Paper

32 nm imprint masks using variable shape beam pattern generators

Kosta Selinidis, Ecron Thompson, Gerard Schmid, Nick Stacey, Joseph Perez, John Maltabes, Douglas Resnick, Jeongho Yeo, Hoyeon Kim, Ben Eynon

Proceedings Volume 7028, 70280R (2008) https://doi.org/10.1117/12.793034

KEYWORDS: Semiconducting wafers, Line width roughness, Lithography, Etching, Photomasks, Critical dimension metrology, Beam shaping, Overlay metrology, Manufacturing, Line edge roughness

Read Abstract +

Proceedings Article | 20 March 2008 Paper

Full-field imprinting of sub-40 nm patterns

Jeongho Yeo, Hoyeon Kim, Ben Eynon

Proceedings Volume 6921, 692107 (2008) https://doi.org/10.1117/12.775115

KEYWORDS: Photomasks, Semiconducting wafers, Line width roughness, Lithography, Etching, Critical dimension metrology, Electron beam lithography, Overlay metrology, Line edge roughness, Manufacturing

Read Abstract +

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years