Using artificial materials such as electromagnetic bandgap structures can be one of the promising ways to improve the efficiency of compact miniaturized vacuum electronic devices such as millimeter-band traveling-wave tubes with 2D planar microstrip slow-wave structures on dielectric substrates. Precision micromachining of the microsized elements of the electromagnetic bandgap structures is challenging. Here we proposed and studied an approach for microfabrication of the electromagnetic bandgap structure with microsized patterns by pulsed laser ablation. The obtained results of the morphology studies by scanning electron microscopy and optical microscopy show that the proposed approach allows fabricating of the microsized pattern with suitable tolerance. Also, we showed several results of numerical simulations of the electromagnetic parameters of the meander-line slow-wave structure on a dielectric substrate with an incorporated electromagnetic bandgap structure.
In recent decades, there has been a steady trend towards the miniaturization of electronic devices, and their key components. Fabrication of such microsized devices and their key part is a real challenge. One of the well-known methods of microfabrication is laser ablation based micromachining. In this work, we study the peculiarities of the influence of nanosecond laser pulses on thin copper films on dielectric substrates. The main aim of this work is to reveal the effective regime of nanosecond ablation of the copper thin film with different thicknesses. The deposition of a copper thin film on the dielectric substrate was carried out by magnetron sputtering. Glass slides were used as dielectric substrates. To quantitatively describe the interaction of a thin copper film with laser pulses of nanoseconds duration, the fluence was calculated taking into account the velocity of the laser spot. The threshold of fluence that needs to effectively ablate the rectangular region of the copper film with a certain thickness was revealed. The obtained results will be used in the future in precision microfabrication of planar electromagnetic structures for vacuum electron devices operating in millimeter-wave bands.
Access to the requested content is limited to institutions that have purchased or subscribe to SPIE eBooks.
You are receiving this notice because your organization may not have SPIE eBooks access.*
*Shibboleth/Open Athens users─please
sign in
to access your institution's subscriptions.
To obtain this item, you may purchase the complete book in print or electronic format on
SPIE.org.
INSTITUTIONAL Select your institution to access the SPIE Digital Library.
PERSONAL Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.