Dr. Jeongho Ahn Profile

Dr. Jeongho Ahn

Senior Engineer at SAMSUNG Electronics Co Ltd

SPIE Involvement:

Author

Proceedings Article | 13 November 2024 Presentation

Massive on-cell overlay metrology solution based on Mueller-matrix analysis for advanced process control

Changhyeong Yoon, Hyukjoon Cho, Ji Yong Shin, Kihun Kang, Juntaek Oh, Donggun Lee, Jaehyun Son, Seunga Lim, Eunsoo Hwang, Jinsoo Lee, ByeongKi Kang, Jaewon Lee, Jinwoo Ahn, Taeyong Jo, Jungho Ahn, Jihye Lee, Seulki Kim, Kyunghoon Park, JangKyu Lee, Heedong Kwak, Younghoon Sohn, Yusin Yang, Myungjun Lee

Proceedings Volume PC13215, PC132150B (2024) https://doi.org/10.1117/12.3032695

KEYWORDS: Overlay metrology, Advanced process control, Metrology, Semiconductors, Imaging systems, Ellipsometry, Time metrology, Semiconductor manufacturing, Semiconducting wafers, Scanning electron microscopy

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Proceedings Article | 10 April 2024 Presentation + Paper

On-cell thickness monitoring of chalcogenide alloy layer using spectral interferometry, Raman spectroscopy, and hybrid machine learning

Hyunwoo Ryoo, Seul Ji Song, Min Ji Jeon, Juhyun Moon, JiHye Lee, ByungHyun Hwang, Jeongho Ahn, Yoon-jong Song, Hidong Kwak, Lior Neeman, Noga Meir, Jaehong Jang, Ik Hwan Kim, Hyunkyu Kim

Proceedings Volume 12955, 129550G (2024) https://doi.org/10.1117/12.3012496

KEYWORDS: Raman spectroscopy, Transmission electron microscopy, Interferometry, Semiconducting wafers, Signal intensity, Machine learning, Film thickness, Diffractive optical elements, Chalcogenides, Calibration

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Proceedings Article | 2 April 2014 Paper

Highly effective and accurate weak point monitoring method for advanced design rule (1x nm) devices

Jeongho Ahn, ShiJin Seong, Minjung Yoon, Il-Suk Park, HyungSeop Kim, Dongchul Ihm, Soobok Chin, Gangadharan Sivaraman, Mingwei Li, Raghav Babulnath, Chang Ho Lee, Satya Kurada, Christine Brown, Rajiv Galani, JaeHyun Kim

Proceedings Volume 9050, 905018 (2014) https://doi.org/10.1117/12.2046651

KEYWORDS: Inspection, Semiconducting wafers, Manufacturing, Modulation, Lithography, Electronic design automation, Semiconductors, Optical inspection, Wafer inspection, Design for manufacturability

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Historically when we used to manufacture semiconductor devices for 45 nm or above design rules, IC manufacturing yield was mainly determined by global random variations and therefore the chip manufacturers / manufacturing team were mainly responsible for yield improvement. With the introduction of sub-45 nm semiconductor technologies, yield started to be dominated by systematic variations, primarily centered on resolution problems, copper/low-k interconnects and CMP. These local systematic variations, which have become decisively greater than global random variations, are design-dependent [1, 2] and therefore designers now share the responsibility of increasing yield with manufacturers / manufacturing teams. A widening manufacturing gap has led to a dramatic increase in design rules that are either too restrictive or do not guarantee a litho/etch hotspot-free design. The semiconductor industry is currently limited to 193 nm scanners and no relief is expected from the equipment side to prevent / eliminate these systematic hotspots. Hence we have seen a lot of design houses coming up with innovative design products to check hotspots based on model based lithography checks to validate design manufacturability, which will also account for complex two-dimensional effects that stem from aggressive scaling of 193 nm lithography. Most of these hotspots (a.k.a., weak points) are especially seen on Back End of the Line (BEOL) process levels like Mx ADI, Mx Etch and Mx CMP. Inspecting some of these BEOL levels can be extremely challenging as there are lots of wafer noises or nuisances that can hinder an inspector’s ability to detect and monitor the defects or weak points of interest. In this work we have attempted to accurately inspect the weak points using a novel broadband plasma optical inspection approach that enhances defect signal from patterns of interest (POI) and precisely suppresses surrounding wafer noises. This new approach is a paradigm shift in wafer inspection by leveraging systematic defect locations for high sensitivity inspection, thereby enhancing the discovery and monitoring of yield-limiting defects at traditional optical inspection throughput.

Proceedings Article | 10 April 2013 Paper

Optical analysis on the wafer defect inspection for yield enhancement

Jeongho Ahn, Byoungho Lee, Dong-Ryul Lee, Shijin Seong, Hyungseop Kim, Seongchae Choi, Heewon Sunwoo, Junbum Lee, Dongchul Ihm, Soobok Chin, Ho-Kyu Kang

Proceedings Volume 8681, 86811E (2013) https://doi.org/10.1117/12.2011387

KEYWORDS: Inspection, Finite-difference time-domain method, Semiconducting wafers, Defect inspection, Reflectivity, Numerical analysis, Wafer inspection, Thin films, Polarization, Multilayers

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Proceedings Article | 5 April 2012 Paper

Accelerating litho technology development for advanced design node flash memory FEOL by next-generation wafer inspection and SEM review platforms

Byoung Ho Lee, Jeongho Ahn, Dongchul Ihm, Soobok Chin, Dong-Ryul Lee, Seongchae Choi, Junbum Lee, Ho-Kyu Kang, Gangadharan Sivaraman, Tetsuya Yamamoto, Rahul Lakhawat, Ravikumar Sanapala, Chang Ho Lee, Arun Lobo

Proceedings Volume 8324, 832429 (2012) https://doi.org/10.1117/12.916505

KEYWORDS: Inspection, Scanning electron microscopy, Semiconducting wafers, Bridges, Front end of line, Defect detection, Wafer inspection, Defect inspection, Optical inspection, Particles

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Proceedings Article | 3 April 2012 Paper

Defect distribution study at through silicon via (TSV) bottom by scanning white-light interference microscopy

Jeongho Ahn, Jaeyoung Park, Dongchul Ihm, Byoungho Lee, Soobok Chin, Ho-Kyu Kang, Jiyoung Noh, Peter Ko, Timothy Johnson, Namki Suk

Proceedings Volume 8324, 83241U (2012) https://doi.org/10.1117/12.917797

KEYWORDS: Semiconducting wafers, Critical dimension metrology, Microscopy, Silicon, Inspection, High volume manufacturing, Phase measurement, Electronics, Metrology, Process control

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Showing 5 of 6 publications

Conference Committee Involvement (1)

2012 Advanced Lithography

12 February 2012 |

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