Dr. Jan Pomplun Profile

Dr. Jan Pomplun

at JCMwave GmbH

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Author

Publications (37)

Proceedings Article | 14 March 2016 Paper

Reconstruction of photonic crystal geometries using a reduced basis method for nonlinear outputs

Martin Hammerschmidt, Carlo Barth, Jan Pomplun, Sven Burger, Christiane Becker, Frank Schmidt

Proceedings Volume 9756, 97561R (2016) https://doi.org/10.1117/12.2212482

KEYWORDS: Photonic crystals, Electromagnetism, Finite element methods, Chemical elements, Electroluminescent displays, Silicon, Reflectivity, Solids, Resonance enhancement, Electromagnetic scattering

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Proceedings Article | 8 March 2016 Paper

Method for fast computation of angular light scattering spectra from 2D periodic arrays

Jan Pomplun, Sven Burger, Lin Zschiedrich, Philipp Gutsche, Frank Schmidt

Proceedings Volume 9778, 977839 (2016) https://doi.org/10.1117/12.2219666

KEYWORDS: Finite element methods, Electromagnetism, Computer simulations, Optical metrology, Semiconductors, Light scattering, 3D metrology, Scatterometry, Computational lithography, Numerical analysis, Silicon, Scattering, Polarization, Metrology, Maxwell's equations, Computing systems

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Proceedings Article | 4 March 2016 Paper

Model order reduction for the time-harmonic Maxwell equation applied to complex nanostructures

Martin Hammerschmidt, Sven Herrmann, Jan Pomplun, Sven Burger, Frank Schmidt

Proceedings Volume 9742, 97420M (2016) https://doi.org/10.1117/12.2212367

KEYWORDS: Maxwell equations, Transistors, Modeling, Nanostructures, Finite element methods, Optical components, Photonics, Optical properties, Error analysis, Electroluminescent displays, Maxwell's equations, Electromagnetic scattering, Fourier transforms, Computer simulations

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Proceedings Article | 23 September 2015 Paper

Hp-finite-elements for simulating electromagnetic fields in optical devices with rough textures

Sven Burger, Philipp Gutsche, Martin Hammerschmidt, Sven Herrmann, Jan Pomplun, Frank Schmidt, Benjamin Wohlfeil, Lin Zschiedrich

Proceedings Volume 9630, 96300S (2015) https://doi.org/10.1117/12.2190119

KEYWORDS: Finite element methods, Electromagnetism, Absorption, Interfaces, Optical components, Maxwell's equations, Optical design, 3D equipment, Visualization, Transparent conductors

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Proceedings Article | 23 September 2015 Paper

Reduced basis method for Maxwell's equations with resonance phenomena

Martin Hammerschmidt, Sven Herrmann, Jan Pomplun, Lin Zschiedrich, Sven Burger, Frank Schmidt

Proceedings Volume 9630, 96300R (2015) https://doi.org/10.1117/12.2190425

KEYWORDS: Error analysis, Electroluminescent displays, Chemical elements, Maxwell's equations, Finite element methods, Nanophotonics, Instrument modeling, Photonic crystals, Silicon, Resonance enhancement

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Proceedings Article | 19 March 2015 Paper

Hp-finite element method for simulating light scattering from complex 3D structures

Sven Burger, Lin Zschiedrich, Jan Pomplun, Sven Herrmann, Frank Schmidt

Proceedings Volume 9424, 94240Z (2015) https://doi.org/10.1117/12.2085795

KEYWORDS: Light scattering, Finite element methods, Roentgenium, 3D metrology, Electromagnetism, Discretization errors, Optical metrology, Metrology, Silicon

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Proceedings Article | 30 September 2014 Paper

Determination of line profiles on nano-structured surfaces using EUV and x-ray scattering

Victor Soltwisch, Jan Wernecke, Anton Haase, Jürgen Probst, Max Schoengen, Michael Krumrey, Frank Scholze, Jan Pomplun, Sven Burger

Proceedings Volume 9235, 92351D (2014) https://doi.org/10.1117/12.2066165

KEYWORDS: Scattering, Diffraction, X-rays, Extreme ultraviolet, Laser scattering, Silicon, Reflectivity, Finite element methods, Sensors, Scatterometry

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Proceedings Article | 31 March 2014 Paper

Impact of topographic mask models on scanner matching solutions

Jacek Tyminski, Jan Pomplun, Stephen Renwick

Proceedings Volume 9052, 905218 (2014) https://doi.org/10.1117/12.2045919

KEYWORDS: Scanners, Photomasks, Fiber optic illuminators, Optimization (mathematics), Lithography, Computational lithography, Maxwell's equations, Optical proximity correction, Near field optics, Image acquisition

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Of keen interest to the IC industry are advanced computational lithography applications such as Optical Proximity Correction of IC layouts (OPC), scanner matching by optical proximity effect matching (OPEM), and Source Optimization (SO) and Source-Mask Optimization (SMO) used as advanced reticle enhancement techniques. The success of these tasks is strongly dependent on the integrity of the lithographic simulators used in computational lithography (CL) optimizers. Lithographic mask models used by these simulators are key drivers impacting the accuracy of the image predications, and as a consequence, determine the validity of these CL solutions. Much of the CL work involves Kirchhoff mask models, a.k.a. thin masks approximation, simplifying the treatment of the mask near-field images. On the other hand, imaging models for hyper-NA scanner require that the interactions of the illumination fields with the mask topography be rigorously accounted for, by numerically solving Maxwell’s Equations. The simulators used to predict the image formation in the hyper-NA scanners must rigorously treat the masks topography and its interaction with the scanner illuminators. Such imaging models come at a high computational cost and pose challenging accuracy vs. compute time tradeoffs. Additional complication comes from the fact that the performance metrics used in computational lithography tasks show highly non-linear response to the optimization parameters. Finally, the number of patterns used for tasks such as OPC, OPEM, SO, or SMO range from tens to hundreds. These requirements determine the complexity and the workload of the lithography optimization tasks. The tools to build rigorous imaging optimizers based on first-principles governing imaging in scanners are available, but the quantifiable benefits they might provide are not very well understood. To quantify the performance of OPE matching solutions, we have compared the results of various imaging optimization trials obtained with Kirchhoff mask models to those obtained with rigorous models involving solutions of Maxwell’s Equations. In both sets of trials, we used sets of large numbers of patterns, with specifications representative of CL tasks commonly encountered in hyper-NA imaging. In this report we present OPEM solutions based on various mask models and discuss the models’ impact on hyper- NA scanner matching accuracy. We draw conclusions on the accuracy of results obtained with thin mask models vs. the topographic OPEM solutions. We present various examples representative of the scanner image matching for patterns representative of the current generation of IC designs.

Proceedings Article | 8 March 2014 Paper

Numerical simulation of grating couplers for mode multiplexed systems

Benjamin Wohlfeil, Sven Burger, Christos Stamatiadis, Jan Pomplun, Frank Schmidt, Lars Zimmermann, Klaus Petermann

Proceedings Volume 8988, 89880K (2014) https://doi.org/10.1117/12.2044461

KEYWORDS: Waveguides, Waveguide modes, Polarization, 3D modeling, Optical design, Light scattering, Numerical simulations, Multiplexing, Computer simulations, Scattering

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Proceedings Article | 7 March 2014 Paper

Adaptive sampling strategies for efficient parameter scans in nano-photonic device simulations

Martin Hammerschmidt, Jan Pomplun, Sven Burger, Frank Schmidt

Proceedings Volume 8980, 89801O (2014) https://doi.org/10.1117/12.2036363

KEYWORDS: 3D modeling, Solar cells, Error analysis, MATLAB, Finite element methods, Chemical elements, Nanophotonics, Metrology, Scattering, Device simulation

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Proceedings Article | 9 October 2013 Paper

Finite-element based electromagnetic field simulations: benchmark results for isolated structures

Sven Burger, Lin Zschiedrich, Jan Pomplun, Frank Schmidt

Proceedings Volume 8880, 88801Z (2013) https://doi.org/10.1117/12.2026213

KEYWORDS: Finite element methods, Electromagnetism, Computer simulations, Metrology, Stanford Linear Collider, Silver, Near field, Sensors, Numerical analysis, Chemical elements

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Proceedings Article | 12 April 2013 Paper

Topographic mask modeling with reduced basis finite element method

Jacek Tyminski, Jan Pomplun, Lin Zschiedrich, Donis Flagello, Tomiyuki Matsuyama

Proceedings Volume 8683, 86831C (2013) https://doi.org/10.1117/12.2011613

KEYWORDS: Photomasks, Finite element methods, Fiber optic illuminators, Scanners, Near field, Maxwell's equations, Lithography, Image acquisition, Computational lithography, Computer simulations

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Proceedings Article | 10 April 2013 Paper

Fast simulation method for parameter reconstruction in optical metrology

Sven Burger, Lin Zschiedrich, Jan Pomplun, Frank Schmidt, Bernd Bodermann

Proceedings Volume 8681, 868119 (2013) https://doi.org/10.1117/12.2011154

KEYWORDS: Computer simulations, Light scattering, Optical metrology, Scatterometry, Electromagnetism, Finite element methods, Near field, Critical dimension metrology, Scattering, Statistical modeling

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Proceedings Article | 6 March 2013 Paper

Efficient design of photonic integrated circuits (PICs) by combining device- and circuit- level simulation tools

C. Arellano, S. Mingaleev, I. Koltchanov, A. Richter, J. Pomplun, S. Burger, F. Schmidt

Proceedings Volume 8627, 862711 (2013) https://doi.org/10.1117/12.2004378

KEYWORDS: Photonic integrated circuits, Device simulation, Waveguides, Finite element methods, Chemical elements, Instrument modeling, 3D modeling, Integrated circuit design, Integrated optics, Ions

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Proceedings Article | 5 March 2013 Paper

Advanced finite-element methods for design and analysis of nanooptical structures: applications

Sven Burger, Lin Zschiedrich, Jan Pomplun, Mark Blome, Frank Schmidt

Proceedings Volume 8642, 864205 (2013) https://doi.org/10.1117/12.2001094

KEYWORDS: Finite element methods, Photonic crystal fibers, Plasmonics, Photonic crystals, Solar cells, Optical simulations, Nano optics, Integrated optics, Computer simulations, Photomasks

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Proceedings Article | 13 March 2012 Paper

Finite element models of lithographic mask topography

Jacek Tyminski, Raluca Popescu, Sven Burger, Jan Pomplun, Lin Zschiedrich, Tomoyuki Matsuyama, Tomoya Noda

Proceedings Volume 8326, 83261B (2012) https://doi.org/10.1117/12.916957

KEYWORDS: Finite element methods, Photomasks, Near field, Fiber optic illuminators, Scanners, Stanford Linear Collider, Image acquisition, Lithography, Semiconducting wafers, Computer simulations

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Proceedings Article | 28 February 2012 Paper

Thermo-optical simulation of high-power diode lasers

Jan Pomplun, Hans Wenzel, Sven Burger, Lin Zschiedrich, Maria Rozova, Frank Schmidt, Paul Crump, Hossein Ekhteraei, Christoph Schultz, Götz Erbert

Proceedings Volume 8255, 825510 (2012) https://doi.org/10.1117/12.909330

KEYWORDS: Semiconductor lasers, High power lasers, Refractive index, Optical simulations, Thermal effects, Chemical elements, Maxwell's equations, Thermal blooming, Electro optical modeling, Thermal modeling

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Proceedings Article | 28 February 2012 Paper

3D finite element simulation of optical modes in VCSELs

Maria Rozova, Jan Pomplun, Lin Zschiedrich, Frank Schmidt, Sven Burger

Proceedings Volume 8255, 82550K (2012) https://doi.org/10.1117/12.906372

KEYWORDS: Vertical cavity surface emitting lasers, Finite element methods, 3D modeling, Chemical elements, Computer simulations, Optical simulations, Visualization, Thermal effects, Optical components, Maxwell's equations

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Proceedings Article | 14 October 2011 Paper

Investigation of 3D patterns on EUV masks by means of scatterometry and comparison to numerical simulations

Sven Burger, Lin Zschiedrich, Jan Pomplun, Frank Schmidt, Akiko Kato, Christian Laubis, Frank Scholze

Proceedings Volume 8166, 81661Q (2011) https://doi.org/10.1117/12.896839

KEYWORDS: Extreme ultraviolet, Diffraction, Photomasks, Scatterometry, Computer simulations, Numerical simulations, Multilayers, Sensors, 3D metrology, Extreme ultraviolet lithography

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Proceedings Article | 23 May 2011 Paper

Reduced basis method for real-time inverse scatterometry

Jan Pomplun, Sven Burger, Lin Zschiedrich, Frank Schmidt

Proceedings Volume 8083, 808308 (2011) https://doi.org/10.1117/12.889892

KEYWORDS: Scatterometry, Extreme ultraviolet, Error analysis, Data modeling, Diffraction, Chemical elements, Computer simulations, Finite element methods, Maxwell's equations, Reliability

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Proceedings Article | 23 May 2011 Paper

Fast online inverse scattering with Reduced Basis Method (RBM) for a 3D phase grating with specific line roughness

Bernd Kleemann, Julian Kurz, Jochen Hetzler, Jan Pomplun, Sven Burger, Lin Zschiedrich, Frank Schmidt

Proceedings Volume 8083, 808309 (2011) https://doi.org/10.1117/12.889364

KEYWORDS: Finite element methods, Diffraction, Maxwell's equations, Error analysis, Diffraction gratings, Inverse scattering, Scattering, Electromagnetism, Electromagnetic scattering, Polarization

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Proceedings Article | 23 May 2011 Paper

Rigorous simulations of 3D patterns on extreme ultraviolet lithography masks

Sven Burger, Lin Zschiedrich, Jan Pomplun, Frank Schmidt

Proceedings Volume 8083, 80831B (2011) https://doi.org/10.1117/12.889831

KEYWORDS: Diffraction, Extreme ultraviolet, Photomasks, Computer simulations, Light scattering, Mirrors, Finite element methods, Near field, Extreme ultraviolet lithography, 3D metrology

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Proceedings Article | 21 February 2011 Paper

Finite-element method simulations of high-Q nanocavities with 1D photonic bandgap

Sven Burger, Jan Pomplun, Frank Schmidt, Lin Zschiedrich

Proceedings Volume 7933, 79330T (2011) https://doi.org/10.1117/12.875044

KEYWORDS: Computer simulations, Finite element methods, Nickel, Optical microcavities, Waveguides, Waveguide modes, Modulation, Photonic nanostructures, Dielectrics, Photonic crystals

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Proceedings Article | 17 January 2011 Paper

Fast online simulation of 3D nanophotonic structures by the reduced basis method

Frank Schmidt, Jan Pomplun, Lin Zschiedrich, Sven Burger

Proceedings Volume 7941, 79410G (2011) https://doi.org/10.1117/12.874726

KEYWORDS: Computer simulations, Photomasks, Chemical elements, Nanophotonics, Optical metrology, Optical lithography, Optical proximity correction, 3D modeling, Source mask optimization, Inverse problems

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Proceedings Article | 25 September 2010 Paper

Reduced basis method for source mask optimization

Jan Pomplun, Lin Zschiedrich, Sven Burger, Frank Schmidt, Jacek Tyminski, Donis Flagello, Nakashima Toshiharu

Proceedings Volume 7823, 78230E (2010) https://doi.org/10.1117/12.866101

KEYWORDS: Source mask optimization, Chemical elements, Photomasks, Error analysis, Optimization (mathematics), Near field, Lithography, Maxwell's equations, Semiconducting wafers, Reliability

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Proceedings Article | 12 February 2010 Paper

Finite element method for accurate 3D simulation of plasmonic waveguides

Sven Burger, Lin Zschiedrich, Jan Pomplun, Frank Schmidt

Proceedings Volume 7604, 76040F (2010) https://doi.org/10.1117/12.841995

KEYWORDS: Plasmonic waveguides, Waveguides, Light wave propagation, Finite element methods, Computer simulations, Silver, Visualization, Magnesium fluoride, Resonators, Nanowires

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Proceedings Article | 23 September 2009 Paper

Reduced basis method for computational lithography

Jan Pomplun, Lin Zschiedrich, Sven Burger, Frank Schmidt

Proceedings Volume 7488, 74882B (2009) https://doi.org/10.1117/12.829639

KEYWORDS: Error analysis, Chemical elements, Optical proximity correction, Photomasks, Computational lithography, Reliability, Semiconducting wafers, Near field, Computer simulations, Scatterometry

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Proceedings Article | 17 June 2009 Paper

Reduced basis method for fast and robust simulation of electromagnetic scattering problems

Jan Pomplun, Frank Schmidt

Proceedings Volume 7390, 73900I (2009) https://doi.org/10.1117/12.827588

KEYWORDS: Error analysis, Chemical elements, Computer simulations, Electromagnetic scattering, Diffraction, Reliability, Finite element methods, Phase shifts, 3D modeling, Light scattering

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Proceedings Article | 17 June 2009 Paper

3D finite-element simulations of enhanced light transmission through arrays of holes in metal films

Sven Burger, Lin Zschiedrich, Jan Pomplun, Frank Schmidt, Benjamin Kettner, Daniel Lockau

Proceedings Volume 7390, 73900H (2009) https://doi.org/10.1117/12.827543

KEYWORDS: Finite element methods, Metals, Chemical elements, Computer simulations, Maxwell's equations, Numerical analysis, Silver, Lithium, Near field, Surface plasmons

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Proceedings Article | 19 May 2008 Paper

Metrology of EUV masks by EUV-scatterometry and finite element analysis

Jan Pomplun, Sven Burger, Frank Schmidt, Frank Scholze, Christian Laubis, Uwe Dersch

Proceedings Volume 7028, 70280P (2008) https://doi.org/10.1117/12.793032

KEYWORDS: Extreme ultraviolet, Diffraction, Finite element methods, Photomasks, Scanning electron microscopy, Critical dimension metrology, Chemical elements, Cadmium, Scatterometry, Maxwell's equations

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Proceedings Article | 21 March 2008 Paper

Evaluation of EUV scatterometry for CD characterization of EUV masks using rigorous FEM-simulation

Frank Scholze, Christian Laubis, Gerhard Ulm, Uwe Dersch, Jan Pomplun, Sven Burger, Frank Schmidt

Proceedings Volume 6921, 69213R (2008) https://doi.org/10.1117/12.771923

KEYWORDS: Extreme ultraviolet, Scatterometry, Critical dimension metrology, Photomasks, Diffraction, Finite element methods, Multilayers, Extreme ultraviolet lithography, Reflectivity, Reflectometry

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Proceedings Article | 12 February 2008 Paper

Advanced FEM analysis of optical waveguides: algorithms and applications

Frank Schmidt, Sven Burger, Jan Pomplun, Lin Zschiedrich

Proceedings Volume 6896, 689602 (2008) https://doi.org/10.1117/12.765720

KEYWORDS: Finite element methods, Chemical elements, Waveguides, Maxwell's equations, Cladding, Refractive index, Wave propagation, Zoom lenses, Photonic crystal fibers, Surface plasmons

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Proceedings Article | 18 June 2007 Paper

Finite element analysis of EUV lithography

Jan Pomplun, Sven Burger, Frank Schmidt, Frank Scholze, Christian Laubis, Uwe Dersch

Proceedings Volume 6617, 661718 (2007) https://doi.org/10.1117/12.726156

KEYWORDS: Diffraction, Extreme ultraviolet, Finite element methods, Photomasks, Scatterometry, Scatter measurement, Computer simulations, Extreme ultraviolet lithography, Scanning electron microscopy, Scattering

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Proceedings Article | 18 June 2007 Paper

Influence of line edge roughness and CD uniformity on EUV scatterometry for CD characterization of EUV masks

Frank Scholze, Christian Laubis, Uwe Dersch, Jan Pomplun, Sven Burger, Frank Schmidt

Proceedings Volume 6617, 66171A (2007) https://doi.org/10.1117/12.726159

KEYWORDS: Extreme ultraviolet, Diffraction, Scatterometry, Critical dimension metrology, Photomasks, Scattering, Light scattering, Finite element methods, Reflectometry, Reflectivity

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Proceedings Article | 9 February 2007 Paper

Goal oriented adaptive finite element method for precise simulation of optical components

Lin Zschiedrich, Sven Burger, Jan Pomplun, Frank Schmidt

Proceedings Volume 6475, 64750H (2007) https://doi.org/10.1117/12.698167

KEYWORDS: Waveguides, Error analysis, Wave propagation, Chemical elements, Finite element methods, Optical components, Radio propagation, Optical simulations, Waveguide modes, Electromagnetism

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Proceedings Article | 5 February 2007 Paper

FEM investigation of leaky modes in hollow core photonic crystal fibers

Jan Pomplun, Ronald Holzlöhner, Sven Burger, Lin Zschiedrich, Frank Schmidt

Proceedings Volume 6480, 64800M (2007) https://doi.org/10.1117/12.700495

KEYWORDS: Finite element methods, Photonic crystal fibers, Cladding, Optical fibers, Refractive index, Adaptive optics, Photonic crystals, Chemical elements, Interfaces, Numerical analysis

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Proceedings Article | 20 October 2006 Paper

Rigorous FEM simulation of EUV masks: influence of shape and material parameters

Jan Pomplun, Sven Burger, Frank Schmidt, Lin Zschiedrich, Frank Scholze, Christian Laubis, Uwe Dersch

Proceedings Volume 6349, 63493D (2006) https://doi.org/10.1117/12.686828

KEYWORDS: Extreme ultraviolet, Finite element methods, Diffraction, Scatterometry, Photomasks, Scatter measurement, Computer simulations, Numerical simulations, Critical dimension metrology, Scattering

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Showing 5 of 37 publications

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