Ms. Jee-Hye You Profile

Jee-Hye You

at Hanyang Univ

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Author

Publications (8)

Proceedings Article | 23 March 2010 Paper

Influence of mask surface roughness on 22nm node extreme ultraviolet lithography

Eun-Jin Kim, Jee-Hye You, Seoung-Sue Kim, Han-Ku Cho, Jinho Ahn, Ilsin An, Hye-Keun Oh

Proceedings Volume 7636, 76362K (2010) https://doi.org/10.1117/12.846895

KEYWORDS: Surface roughness, Extreme ultraviolet lithography, Reflectivity, Photomasks, Carbon, Extreme ultraviolet, Ruthenium, Image processing, Contamination, Optical lithography

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Proceedings Article | 4 March 2010 Paper

Pattern deformation caused by deformed pellicle with ArF exposure

Jee-Hye You, Ilsin An, Hye-Keun Oh

Proceedings Volume 7640, 76402E (2010) https://doi.org/10.1117/12.846483

KEYWORDS: Pellicles, Photomasks, Critical dimension metrology, Semiconducting wafers, Transmittance, Optical lithography, Laser energy, Prisms, Air contamination, Binary data

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Proceedings Article | 14 December 2009 Paper

Evaluation of 172-nm wavelength as a possible candidate for 22-nm and below

Jee-Hye You, Eun-Jin Kim, Hye-Keun Oh

Proceedings Volume 7520, 75202U (2009) https://doi.org/10.1117/12.837231

KEYWORDS: Lithography, Refractive index, Immersion lithography, Double patterning technology, Extreme ultraviolet lithography, Photomasks, Absorbance, Liquids, Lithographic illumination, Extreme ultraviolet

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Proceedings Article | 1 April 2009 Paper

Position shift analysis in resist reflow process for sub-50-nm contact hole

Jee-Hye You, Joonwoo Park, Joon-Min Park, Heejun Jeong, Hye-Keun Oh

Proceedings Volume 7273, 727344 (2009) https://doi.org/10.1117/12.814016

KEYWORDS: Photoresist processing, Optical proximity correction, Electron beam lithography, Scanning electron microscopy, Optical lithography, Critical dimension metrology, Glasses, Lithography, Cadmium, Applied physics

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Proceedings Article | 18 March 2009 Paper

Incident angle change caused by different off-axis illumination in extreme ultraviolet lithography

Eun-Jin Kim, Jee-Hye You, Seong-Sue Kim, Han-Ku Cho, Ilsin An, Hye-Keun Oh

Proceedings Volume 7271, 727143 (2009) https://doi.org/10.1117/12.814031

KEYWORDS: Lithographic illumination, Photomasks, Extreme ultraviolet lithography, Critical dimension metrology, Extreme ultraviolet, Optical lithography, Lithography, Reflectivity, Coherence (optics), Resolution enhancement technologies

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Proceedings Article | 4 December 2008 Paper

22nm 1:1 line and space patterning by using double patterning and resist reflow process

Joon Min Park, Ji-Hye Yoo, Joo-Yoo Hong, Ilsin An, Hye-Keun Oh

Proceedings Volume 7140, 714038 (2008) https://doi.org/10.1117/12.804643

KEYWORDS: Double patterning technology, Photoresist processing, Etching, Lithography, Photomasks, Optical lithography, Extreme ultraviolet, Immersion lithography, Glasses, Applied physics

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Proceedings Article | 4 December 2008 Paper

Influences of various defects on extreme ultra-violet mask

Eun-Jin Kim, Jee-Hye You, Jung-Youl Lee, Deog-Bae Kim, Jae-Hyun Kim, Hye-Keun Oh

Proceedings Volume 7140, 71401N (2008) https://doi.org/10.1117/12.804570

KEYWORDS: Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Refractive index, Carbon, Ruthenium, Ultraviolet radiation, Lithography, Silicon, Molybdenum

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Proceedings Article | 4 December 2008 Paper

Acid diffusion length dependency for 32-nm node attenuated and chromeless phase shift mask

Jee-Hye You, Young-Min Kang, Minhee Jung, Hye-Keun Oh

Proceedings Volume 7140, 71403U (2008) https://doi.org/10.1117/12.804611

KEYWORDS: Diffusion, Photomasks, Nanoimprint lithography, Phase shifts, Critical dimension metrology, Double patterning technology, Lithography, Electroluminescence, Immersion lithography, Image processing

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Showing 5 of 8 publications

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