Mr. Jen-Yi Wuu Profile

Jen-Yi Wuu

at ASML

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Publications (5)

Proceedings Article | 22 February 2021 Presentation + Paper

Stochastic defect criticality prediction enabled by physical stochastic modeling and massive metrology

ChangAn Wang, Peigen Cao, Maxence Delorme, Jen-Yi Wuu, Jiyou Fu, Fuming Wang, Bob Lin, Yiqiong Zhao, Yi-Hsing Peng, Yongfa Fan, Mu Feng, Bin Cheng, Jen-Shiang Wang, Mark Simmoms, Stefan Hunsche, Oliver Patterson, Kuo-Feng Pao, Abdalmohsen Elmalk, Kevin Gao, Ruochong Fei, Xuefeng Zeng, Xiaolong Zhang

Proceedings Volume 11609, 1160916 (2021) https://doi.org/10.1117/12.2584767

KEYWORDS: Stochastic processes, Pattern recognition, Semiconducting wafers, Wafer inspection, Inspection, Defect detection, Metrology, Failure analysis, Data modeling, Calibration

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Proceedings Article | 15 March 2012 Paper

Layout optimization through robust pattern learning and prediction in SADP gridded designs

Jen-Yi Wuu, Mark Simmons, Malgorzata Marek-Sadowska

Proceedings Volume 8327, 832705 (2012) https://doi.org/10.1117/12.916583

KEYWORDS: Lithography, Photomasks, Double patterning technology, Machine learning, Critical dimension metrology, Detection and tracking algorithms, Image classification, Optimization (mathematics), Optical lithography, Etching

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Proceedings Article | 5 April 2011 Paper

Efficient approach to early detection of lithographic hotspots using machine learning systems and pattern matching

Jen-Yi Wuu, Fedor Pikus, Malgorzata Marek-Sadowska

Proceedings Volume 7974, 79740U (2011) https://doi.org/10.1117/12.879546

KEYWORDS: Machine learning, Lithography, Databases, Image classification, Phase modulation, Calibration, Manufacturing, Tolerancing, Design for manufacturability, Detection and tracking algorithms

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Proceedings Article | 13 March 2009 Paper

Detecting context sensitive hot spots in standard cell libraries

Jen-Yi Wuu, Fedor Pikus, Andres Torres, Malgorzata Marek-Sadowska

Proceedings Volume 7275, 727515 (2009) https://doi.org/10.1117/12.814316

KEYWORDS: Lithography, Computer programming, Data modeling, Optics manufacturing, Resolution enhancement technologies, Manufacturing, Model-based design, Library classification systems, Visualization, Optical lithography

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Proceedings Article | 17 October 2008 Paper

Fast and simple modeling of non-rectangular transistors

Jen-Yi Wuu, Fedor Pikus, Malgorzata Marek-Sadowska

Proceedings Volume 7122, 71223S (2008) https://doi.org/10.1117/12.801541

KEYWORDS: Instrument modeling, TCAD, Device simulation, Transistors, Ions, Resolution enhancement technologies, Data modeling, Silicon, Process modeling, Computer simulations

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