Mr. Jie Wei Sun Profile

Jie Wei Sun

Senior Engineer at United Microelectronics Corp

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Author

Publications (4)

Proceedings Article | 24 March 2006 Paper

Scatterometry measurements of line end shortening structures for focus-exposure monitoring

Kelvin Hung, Yung Feng Cheng, Jie Wei Sun, Benjamin Szu-Min Lin, Steven Fu, Thaddeus Dziura, Marcelo Cusacovich, Walter Mieher

Proceedings Volume 6152, 61521W (2006) https://doi.org/10.1117/12.655746

KEYWORDS: Single crystal X-ray diffraction, Semiconducting wafers, Data modeling, Scatterometry, Finite element methods, Lithography, Metrology, Process control, Photoresist processing, Scatter measurement

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Proceedings Article | 21 March 2006 Paper

Inverse lithography technology at chip scale

Benjamin Lin, Ming Feng Shieh, Jie-wei Sun, Jonathan Ho, Yan Wang, Xin Wu, Wolfgang Leitermann, Orson Lin, Jason Lin, Yong Liu, Linyong Pang

Proceedings Volume 6154, 615414 (2006) https://doi.org/10.1117/12.656827

KEYWORDS: Photomasks, Optical proximity correction, Lithography, Manufacturing, Scanning electron microscopy, Calibration, Image quality, Semiconducting wafers, Image processing, Semiconductors

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Proceedings Article | 5 November 2005 Paper

Real-world impacts of inverse lithography technology

Jonathan Ho, Yan Wang, Xin Wu, Wolfgang Leitermann, Benjamin Lin, Ming Feng Shieh, Jie-wei Sun, Orson Lin, Jason Lin, Yong Liu, Linyong Pang

Proceedings Volume 5992, 59921Z (2005) https://doi.org/10.1117/12.632211

KEYWORDS: Photomasks, Optical proximity correction, Lithography, Manufacturing, Scanning electron microscopy, Calibration, Image quality, Semiconducting wafers, Semiconductors, Image segmentation

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Proceedings Article | 10 May 2005 Paper

Reaching a CD uniformity of below 3 nm for 300 mm post-etch wafers by adjusting the CD distribution of ADI wafers

Jie-Wei Sun, Yong-Fa Huang, Sho-Shen Lee, Chun-Chi Yu, Benjamin Lin, Steven Fu, Mike Slessor

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.598979

KEYWORDS: Critical dimension metrology, Semiconducting wafers, Etching, Metrology, Single crystal X-ray diffraction, Lithography, Spectroscopic ellipsometry, Inspection, Scatterometry, Temperature metrology

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