Dr. Jihoon Kim Profile

Dr. Jihoon Kim

Principal Scientist at Pall Microelectronics

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Author

Publications (11)

Proceedings Article | 25 March 2016 Paper

Directed self-assembly materials for high resolution beyond PS-b-PMMA

Eri Hirahara, Margareta Paunescu, Orest Polishchuk, EunJeong Jeong, Edward Ng, Jianhui Shan, Jian Yin, Jihoon Kim, Yi Cao, Jin Li, SungEun Hong, Durairaj Baskaran, Guanyang Lin

Proceedings Volume 9779, 977914 (2016) https://doi.org/10.1117/12.2220424

KEYWORDS: Directed self assembly, Semiconducting wafers, Scanning electron microscopy, Etching, Silicon, Optical lithography, Polymers, Line edge roughness, Photomicroscopy, Annealing

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SPIE Journal Paper | 2 July 2015

Defect mitigation and root cause studies in 14 nm half-pitch chemo-epitaxy directed self-assembly LiNe flow

Hari Pathangi, Boon Teik Chan, Hareen Bayana, Nadia Vandenbroeck, Dieter Van den Heuvel, Lieve Van Look, Paulina Rincon-Delgadillo, Yi Cao, JiHoon Kim, Guanyang Lin, Doni Parnell, Kathleen Nafus, Ryota Harukawa, Ito Chikashi, Marco Polli, Lucia D’Urzo, Roel Gronheid, Paul Nealey

JM3, Vol. 14, Issue 03, 031204, (July 2015) https://doi.org/10.1117/12.10.1117/1.JMM.14.3.031204

KEYWORDS: Etching, Scanning electron microscopy, Silicon, Inspection, Semiconducting wafers, Diffractive optical elements, Defect inspection, Thin film coatings, Directed self assembly

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Proceedings Article | 20 March 2015 Paper

The role of guide stripe chemistry in block copolymer directed self-assembly

Robert Seidel, Lance Williamson, YoungJun Her, Jihoon Kim, Guanyang Lin, Paul Nealey, Roel Gronheid

Proceedings Volume 9425, 94250W (2015) https://doi.org/10.1117/12.2085905

KEYWORDS: Chemistry, Tolerancing, Lithography, Semiconducting wafers, Line edge roughness, Thin films, Plasma etching, Etching, Polymethylmethacrylate, Directed self assembly

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Proceedings Article | 20 March 2015 Paper

Directed self-assembly of topcoat-free, integration-friendly high-X block copolymers

Eri Hirahara, Margareta Paunescu, Orest Polishchuk, EunJeong Jeong, Edward Ng, Jianhui Shan, Jihoon Kim, SungEun Hong, Durairaj Baskaran, Guanyang Lin, Ankit Vora, Melia Tjio, Noel Arellano, Charles Rettner, Elizabeth Lofano, Chi-Chun Liu, Hsinyu Tsai, Anindarupa Chunder, Khanh Nguyen, Alexander Friz, Amy Bowers, Srinivasan Balakrishnan, Joy Cheng, Daniel Sanders

Proceedings Volume 9425, 94250P (2015) https://doi.org/10.1117/12.2087398

KEYWORDS: Scanning electron microscopy, Etching, Photomicroscopy, Dry etching, Annealing, Thin films, Plasma etching, Polymers, Coating, Directed self assembly

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Proceedings Article | 19 March 2015 Paper

Defect mitigation and root cause studies in IMEC's 14nm half-pitch chemo-epitaxy DSA flow

Hari Pathangi, Boon Teik Chan, Hareen Bayana, Nadia Vandenbroeck, Dieter Van Den Heuvel, Lieve Van Look, Paulina Rincon-Delgadillo, Yi Cao, JiHoon Kim, Guanyang Lin, Doni Parnell, Kathleen Nafus, Ryota Harukawa, Ito Chikashi, Venkat Nagaswami, Lucia D'Urzo, Roel Gronheid, Paul Nealey

Proceedings Volume 9423, 94230M (2015) https://doi.org/10.1117/12.2085889

KEYWORDS: Etching, Silicon, Bridges, Scanning electron microscopy, Inspection, Diffractive optical elements, Semiconducting wafers, Thin film coatings, Defect inspection, Directed self assembly

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Proceedings Article | 19 March 2015 Paper

Impact of BCP asymmetry on DSA patterning performance

Lance Williamson, JiHoon Kim, Yi Cao, Guanyang Lin, Roel Gronheid, Paul Nealey

Proceedings Volume 9423, 942315 (2015) https://doi.org/10.1117/12.2085885

KEYWORDS: Scanning electron microscopy, Etching, Optical lithography, Tolerancing, Silicon, Polymethylmethacrylate, Annealing, Picosecond phenomena, Neodymium, Directed self assembly

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Proceedings Article | 19 March 2015 Paper

Toward high-performance quality meeting IC device manufacturing requirements with AZ SMART DSA process

JiHoon Kim, Jian Yin, Yi Cao, YoungJun Her, Claire Petermann, Hengpeng Wu, Jianhui Shan, Tomohiko Tsutsumi, Guanyang Lin

Proceedings Volume 9423, 94230R (2015) https://doi.org/10.1117/12.2086160

KEYWORDS: Picosecond phenomena, Line edge roughness, Semiconducting wafers, Line width roughness, Critical dimension metrology, Optical lithography, Polymethylmethacrylate, Etching, Plasma etching, Directed self assembly

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Proceedings Article | 2 April 2014 Paper

Novel metrology methods for fast 3D characterization of directed self-assembly (DSA) patterns for high volume manufacturing

Chandra Sarma, Benjamin Bunday, Aron Cepler, Ted Dziura, JiHoon Kim, Guanyang Lin, Jian Yin

Proceedings Volume 9050, 90500O (2014) https://doi.org/10.1117/12.2046785

KEYWORDS: Semiconducting wafers, Scatterometry, Metrology, Polymethylmethacrylate, Bridges, Data modeling, Critical dimension metrology, Picosecond phenomena, Line edge roughness, Directed self assembly

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Proceedings Article | 2 April 2014 Paper

Advanced CD-SEM metrology for pattern roughness and local placement of lamellar DSA

Takeshi Kato, Akiyuki Sugiyama, Kazuhiro Ueda, Hiroshi Yoshida, Shinji Miyazaki, Tomohiko Tsutsumi, JiHoon Kim, Yi Cao, Guanyang Lin

Proceedings Volume 9050, 90501T (2014) https://doi.org/10.1117/12.2060924

KEYWORDS: Semiconducting wafers, Line edge roughness, Line width roughness, Edge roughness, Etching, Critical dimension metrology, Finite element methods, Process control, Chemical analysis, Directed self assembly

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Proceedings Article | 20 March 2012 Paper

Combinatorial process optimization for negative photo-imageable spin-on dielectrics and investigation of post-apply bake and post-exposure bake interactions

Jihoon Kim, Ruzhi Zhang, Elizabeth Wolfer, Bharatkumar Patel, Medhat Toukhy, Zachary Bogusz, Tatsuro Nagahara

Proceedings Volume 8325, 83252A (2012) https://doi.org/10.1117/12.916453

KEYWORDS: Dielectrics, Lithography, Semiconducting wafers, Critical dimension metrology, Polymers, Photoresist materials, Image processing, Coating, Semiconductor manufacturing, Photoresist developing

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Proceedings Article | 24 March 2006 Paper

Tools to measure CD-SEM performance

Jihoon Kim, Kiran Jalhadi, Sachin Deo, Soo-Young Lee, David Joy

Proceedings Volume 6152, 61520T (2006) https://doi.org/10.1117/12.650649

KEYWORDS: Zone plates, Image resolution, Spatial resolution, Image analysis, Interference (communication), Fourier transforms, Scanning electron microscopy, Image enhancement, Electron beam lithography, Signal to noise ratio

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Showing 5 of 11 publications

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