Dr. Jisoong Park Profile

Dr. Jisoong Park

at SAMSUNG Electronics Co Ltd

SPIE Involvement:

Author

Publications (19)

Proceedings Article | 23 October 2015 Paper

MPC model validation using reverse analysis method

Sukho Lee, So-Eun Shin, Jungwook Shon, Jisoong Park, Inkyun Shin, Chan-Uk Jeon

Proceedings Volume 9635, 96350V (2015) https://doi.org/10.1117/12.2197162

KEYWORDS: Data modeling, Calibration, Critical dimension metrology, Reverse modeling, Process modeling, Scanning electron microscopy, Model-based design, Distortion, Reliability, Statistical modeling

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Proceedings Article | 23 October 2015 Paper

Mask process simulation for mask quality improvement

Nobuyasu Takahashi, So Goto, Dai Tsunoda, So-Eun Shin, Sukho Lee, Jungwook Shon, Jisoong Park

Proceedings Volume 9635, 96351G (2015) https://doi.org/10.1117/12.2196713

KEYWORDS: Photomasks, Process modeling, Calibration, Error analysis, Computer simulations, Etching, Statistical modeling, Scanning electron microscopy, Photoresist processing, Cadmium

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Proceedings Article | 8 October 2014 Paper

General shot refinement technique on fracturing of curvilinear shape for VSB mask writer

Takuya Tao, Nobuyasu Takahashi, Masakazu Hamaji, Jisoong Park, Sukho Lee, Sunghoon Park

Proceedings Volume 9235, 923521 (2014) https://doi.org/10.1117/12.2069240

KEYWORDS: Photomasks, Vestigial sideband modulation, Ions, Lithography, Resolution enhancement technologies, Optical proximity correction, Modulation, Data processing, Model-based design, Control systems

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SPIE Journal Paper | 2 December 2013

Inverse e-beam lithography on photomask for computational lithography

Jin Choi, Ji Soong Park, In Kyun Shin, Chan-Uk Jeon

JM3, Vol. 13, Issue 01, 011003, (December 2013) https://doi.org/10.1117/12.10.1117/1.JMM.13.1.011003

KEYWORDS: Photomasks, Electron beam lithography, Computational lithography, Lithography, Manufacturing, Data modeling, Optical proximity correction, Vestigial sideband modulation, Semiconducting wafers, Model-based design

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Proceedings Article | 12 April 2013 Paper

Manufacturability of computation lithography mask: current limit and requirements for sub-20nm node

Jin Choi, In-Yong Kang, Ji Soong Park, In Kyun Shin, Chan-Uk Jeon

Proceedings Volume 8683, 86830L (2013) https://doi.org/10.1117/12.2011341

KEYWORDS: Photomasks, Data modeling, Manufacturing, Lithography, Computational lithography, Optical proximity correction, Optical lithography, Semiconducting wafers, Electron beam lithography, Computer aided design

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Proceedings Article | 8 November 2012 Paper

Improving CD uniformity using MB-MDP for 14nm node and beyond

Byung Kim, Jin Choi, Jisoong Park, Chan Jeon, Sterling Watson, Anthony Adamov, Bob Pack, Ingo Bork

Proceedings Volume 8522, 852205 (2012) https://doi.org/10.1117/12.966327

KEYWORDS: Photomasks, Semiconducting wafers, Monte Carlo methods, Data modeling, Critical dimension metrology, Backscatter, Model-based design, Modulation, SRAF, Lithography

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Proceedings Article | 8 November 2012 Paper

An enhanced measure of mask quality using separated models

Anthony Adamov, Bob Pack, Kazuyuki Hagiwara, Ingo Bork, Jin Choi, Jissong Park, Byung-Gook Kim

Proceedings Volume 8522, 852207 (2012) https://doi.org/10.1117/12.964379

KEYWORDS: Photomasks, Semiconducting wafers, Critical dimension metrology, Monte Carlo methods, Quality measurement, Lithography, Optical proximity correction, Model-based design, Error analysis, Data modeling

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Proceedings Article | 5 November 2005 Paper

Reduction of MDP complexity through the application of OASIS based data flow

Sung-Hoon Jang, Ji-Hyeon Choi, Ji-Soong Park, Seong-Woon Choi, Woo-Sung Han

Proceedings Volume 5992, 599212 (2005) https://doi.org/10.1117/12.632370

KEYWORDS: Data conversion, Photomasks, Optical proximity correction, Data processing, Inspection, Magnetoencephalography, Databases, Glasses, Semiconducting wafers, Projection systems

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Proceedings Article | 28 June 2005 Paper

Simulation of resist heating effect with e-beam lithography using distributed processing (DP)

Won-Tai Ki, Byung-Sup Ahn, Ji-Soong Park, Seung-Woon Choi, Sang-Back Ma, Woo-Sung Han

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617091

KEYWORDS: Photomasks, Chromium, Electron beam lithography, Double patterning technology, Computer simulations, Roentgenium, Semiconducting wafers, Factor analysis, Error analysis, Beam shaping

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Proceedings Article | 28 June 2005 Paper

The application of phase grating to CLM technology for the sub-65nm node optical lithography

Gi-Sung Yoon, Sung-Hyuck Kim, Ji-Soong Park, Sun-Young Choi, Chan-Uk Jeon, In-Kyun Shin, Sung-Woon Choi, Woo-Sung Han

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617201

KEYWORDS: Photomasks, Optical lithography, Camera shutters, Semiconducting wafers, Optical proximity correction, Manufacturing, Chromium, Nanoimprint lithography, Lithography, Wafer-level optics

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Proceedings Article | 28 May 2004 Paper

Study of Cr patch validity for ArF CPL mask and its fabrication

Chang-Hwan Kim, Sung-Hyuk Kim, Myoung-Soo Lee, Ji-Soong Park, In-Gyun Shin, Sung-Woon Choi, Hee-Sun Yoon, Woo-Sung Han

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.535976

KEYWORDS: Chromium, Photomasks, Resolution enhancement technologies, Optical alignment, Laser processing, Semiconducting wafers, Phase shifts, Lithography, Logic devices, Control systems

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Proceedings Article | 17 December 2003 Paper

Full-chip application for SRAM gate at 100-nm node and beyond using chromeless phase lithography

Ji-Soong Park, Sung-Hyuck Kim, In-Kyun Shin, Sung-Woon Choi, Jung-Min Sohn, Jae-Han Lee, Hye-soo Shin, Thomas Laidig, Douglas Van Den Broeke, J. Fung Chen

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518014

KEYWORDS: Photomasks, Scattering, Semiconducting wafers, Neodymium, Lithography, Optical proximity correction, Camera shutters, Optics manufacturing, Wafer-level optics, Phase shifting

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Proceedings Article | 26 June 2003 Paper

Hybrid PPC methodology using multistep correction and implementation for the sub-100-nm node

Soo-Han Choi, Ji-Soong Park, Chul-Hong Park, Won-Young Chung, In-sung Kim, Dong-Hyun Kim, Yoo-Hyon Kim, Moon-Hyun Yoo, Jeong-Taek Kong

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485397

KEYWORDS: SRAF, Etching, Critical dimension metrology, Logic devices, Process control, Process modeling, Semiconductors, Control systems, Plasma, Instrument modeling

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Proceedings Article | 27 December 2002 Paper

Application of Cr-less mask technology for sub-100-nm gate with single exposure

Sung-Hyuck Kim, Dong-Hoon Chung, Ji-Soong Park, In-Kyun Shin, Seong-woon Choi, Jung-Min Sohn, Jae-Han Lee, Hye-Soo Shin, J. Fung Chen, Douglas Van Den Broeke

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.468097

KEYWORDS: Photomasks, Camera shutters, Semiconducting wafers, Critical dimension metrology, Optical proximity correction, Chromium, Lithography, Wafer-level optics, Phase shifts, Printing

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Proceedings Article | 30 July 2002 Paper

Hybrid PPC methodology and implementation in the correction of etch proximity

Chul-Hong Park, Sang-Uhk Rhie, Soo-Han Choi, Dong-Hyun Kim, Ji-Soong Park, Yoo-Hyon Kim, Moon-Hyun Yoo, Jeong-Taek Kong

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474586

KEYWORDS: Critical dimension metrology, Etching, Model-based design, Instrument modeling, Performance modeling, Image segmentation, Data modeling, Cadmium, Data corrections, Lithography

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Proceedings Article | 11 March 2002 Paper

Robust and fast OPC approach for metal interconnects of 0.13um logic devices

Ji-Soong Park, Dong-Hyun Kim, Chul-Hong Park, Yoo-Hyon Kim, Moon-Hyun Yoo, Jeong-Taek Kong, Hyun-Woo Kim, Sun-Il Yoo

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458275

KEYWORDS: Optical proximity correction, Metals, Logic devices, Optical alignment, Photomasks, Resistance, Bridges, Reliability, Scanners, Overlay metrology

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Proceedings Article | 14 September 2001 Paper

Improvement of metal photo process margin with OPC and CMP for 0.14 um DRAM technology node and beyond

Dong-il Bae, Jun-Sik Bae, Seung-Won Sung, Ji-Soong Park, Sang-Uhk Rhie, Dong-Won Shin, Tae-Young Chung, Kinam Kim

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435684

KEYWORDS: Optical proximity correction, Metals, Chemical mechanical planarization, Photomasks, Manufacturing, Lithography, Optical lithography, Data corrections, Semiconductors, Electronics

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Proceedings Article | 5 July 2000 Paper

Optical proximity correction considering mask manufacturability and its application to 0.25-um DRAM for enhanced device performance

Chul-Hong Park, Sang-Uhk Rhie, Ji-Hyeon Choi, Ji-Soong Park, Hyeong-Weon Seo, Yoo-Hyon Kim, Young-Kwan Park, Woo-Sung Han, Won-Seong Lee, Jeong-Taek Kong

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.388939

KEYWORDS: Optical proximity correction, Critical dimension metrology, Photomasks, Inspection, Manufacturing, Etching, Optics manufacturing, Data corrections, Cadmium, Mask making

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Proceedings Article | 26 July 1999 Paper

Systematic approach to correct critical patterns induced by the lithography process at the full-chip level

Chul-Hong Park, Yoo-Hyon Kim, Ji-Soong Park, Kwan-Do Kim, Moon-Hyun Yoo, Jeong-Taek Kong

Proceedings Volume 3679, (1999) https://doi.org/10.1117/12.354376

KEYWORDS: Lithography, Bridges, Computer aided design, Optical proximity correction, Inspection, Product engineering, Integrated circuits, Optical lithography, Process engineering, Cadmium sulfide

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Showing 5 of 19 publications

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