John R. Swyers
District Sales Manager at Applied Materials Inc
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 5 April 2007 Paper
Proceedings Volume 6518, 65181S (2007) https://doi.org/10.1117/12.714214
KEYWORDS: Photoresist materials, Semiconducting wafers, Metrology, Critical dimension metrology, Scanning electron microscopy, Scanners, Lithography, Process control, Calibration

Proceedings Article | 5 April 2007 Paper
Benjamin Bunday, John Allgair, Bryan Rice, Jeff Byers, Yohanan Avitan, Ram Peltinov, Maayan Bar-zvi, Ofer Adan, John Swyers, Roni Shneck
Proceedings Volume 6518, 65182B (2007) https://doi.org/10.1117/12.714203
KEYWORDS: Lithography, Photoresist materials, Metrology, Deep ultraviolet, Extreme ultraviolet lithography, Extreme ultraviolet, Scanning electron microscopy, 193nm lithography, Semiconducting wafers, Scanners

Proceedings Article | 2 June 2003 Paper
Proceedings Volume 5038, (2003) https://doi.org/10.1117/12.485016
KEYWORDS: Semiconducting wafers, Etching, Calibration, Critical dimension metrology, Deep ultraviolet, Process control, Scanning electron microscopy, Lithography, Photoresist processing, Reticles

Proceedings Article | 16 July 2002 Paper
Proceedings Volume 4689, (2002) https://doi.org/10.1117/12.473452
KEYWORDS: Semiconducting wafers, Calibration, Etching, Critical dimension metrology, Scanning electron microscopy, Lithography, Line edge roughness, Cadmium, Error analysis, Process control

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