Mr. Jong-Hyun Hwang Profile

Jong-Hyun Hwang

at SAMSUNG Electronics Co Ltd

SPIE Involvement:

Author

Publications (8)

Proceedings Article | 10 April 2024 Presentation + Paper

Computational distortion prediction method considering characteristics of EUV lithography

Jong-hyun Hwang, Jae-il Lee, Hyeon-jun Ha, Jung-hwan Kim, Kwang-sun Song, Young-jin Park

Proceedings Volume 12953, 129530L (2024) https://doi.org/10.1117/12.3010639

KEYWORDS: Extreme ultraviolet, Distortion, Simulations, Overlay metrology, Semiconducting wafers, Deep ultraviolet, Optical lithography, Extreme ultraviolet lithography, Zernike polynomials, Projection systems

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Proceedings Article | 27 April 2023 Paper

Wide-field massive CD metrology based on the imaging Mueller-matrix ellipsometry for semiconductor devices

Juntaek Oh, Jaehyeon Son, Eunsoo Hwang, Jinwoo Ahn, Jaewon Lee, Byungkwan Oh, Donggun Lee, Seunga Lim, Kihun Kang, Sangil Im, Jibin Jeong, Taehyun Yun, Jinsoo Lee, Changhyeong Yoon, Hyukjoon Cho, Gangbu Kim, Byeongki Kang, Hankyoul Moon, Jong-hyun Hwang, Youngkyu Park, Taejoong Kim, Suyoung Lee, Yusin Yang, Myungjun Lee

Proceedings Volume 12496, 124962X (2023) https://doi.org/10.1117/12.2658131

KEYWORDS: Critical dimension metrology, Semiconducting wafers, Metrology, Semiconductors, Mueller matrices, Ellipsometry, Inspection

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Proceedings Article | 27 April 2023 Presentation + Paper

Massive overlay metrology solution by realizing imaging Mueller matrix spectroscopic ellipsometry

Jaehyeon Son, Juntaek Oh, Eunsoo Hwang, Jinwoo Ahn, Jaewon Lee, Byungkwan Oh, Donggun Lee, Seunga Lim, Kihun Kang, Sangil Im, Jibin Jeong, Taehyun Yun, Jinsoo Lee, Changhyeong Yoon, Hyukjoon Cho, Gangbu Kim, Byeongki Kang, Hankyoul Moon, Jong-hyun Hwang, Youngkyu Park, Taejoong Kim, Suyoung Lee, Yusin Yang, Myungjun Lee

Proceedings Volume 12496, 124960L (2023) https://doi.org/10.1117/12.2657414

KEYWORDS: Overlay metrology, Mueller matrices, Semiconducting wafers, Spectroscopic ellipsometry, Critical dimension metrology, Imaging spectroscopy, Metrology, Polarization, Polysomnography, Image sensors

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Proceedings Article | 27 April 2023 Poster + Paper

Absolute alignment measurement of underlayer and overlayer of diffraction-based overlay mark by image-based alignment metrology system

Jaeil Lee, Iksun Park, Youngjin Park, Jonghyun Hwang, Hyeonjun Ha, Jaewoong Sohn, Jaehee Lee, Jinseok Moon, Yuki Kondo, Satoshi Ando

Proceedings Volume 12496, 124962F (2023) https://doi.org/10.1117/12.2657656

KEYWORDS: Overlay metrology, Optical alignment, Metrology

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Proceedings Article | 26 May 2022 Poster + Paper

Reduction in on-product overlay random error using machine learning algorithm

Gilwoo Song, Sungchai Kim, Sungwon Park, Taeyoung Jo, Euiseok Kum, Jonghyun Hwang, Seonho Lee

Proceedings Volume 12053, 120531O (2022) https://doi.org/10.1117/12.2612771

KEYWORDS: Semiconducting wafers, Overlay metrology, Optical parametric oscillators, Scanners, Metrology, Machine learning, Neural networks, Error analysis, Semiconductors, Process control

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Proceedings Article | 26 March 2019 Paper

YieldStar uDBO overlay metrology in Samsung D1y DRAM volume production

Jang-Sun Kim, Jin-Moo Byun, Remco Lancee, Jong-Hyun Hwang, Hyeon-Jun Ha, Kwang-Young Hu, Se-Ra Jeon, Won-Jae Jang, Hyung-Sub Son, Vidar van der Meijden, Marc Noot, Bartosz Foltynski, Lukasz Macht, Grzegorz Grzela, Cedric Grouwstra

Proceedings Volume 10959, 109592M (2019) https://doi.org/10.1117/12.2514931

KEYWORDS: Overlay metrology, Metrology, Front end of line, Yield improvement, Control systems, Scatterometry

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Proceedings Article | 2 April 2014 Paper

Improvement of inter-field CDU by using on-product focus control

Kyeong Dong Park, Tony Park, Jong Hyun Hwang, Jin Phil Choi, Young Seog Kang

Proceedings Volume 9050, 90500R (2014) https://doi.org/10.1117/12.2046224

KEYWORDS: Semiconducting wafers, Metrology, Reticles, Signal processing, Control systems, Lithography, Scanners, Process control, Scanning electron microscopy, Computer simulations

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Proceedings Article | 2 April 2014 Paper

Focus control budget analysis for critical layers of flash devices

Jong Hoon Jang, Tony Park, Kyeong Dong Park, Jong Hyun Hwang, Jin Phil Choi, Young Seog Kang

Proceedings Volume 9050, 90502F (2014) https://doi.org/10.1117/12.2046235

KEYWORDS: Semiconducting wafers, Scanners, Finite element methods, Monochromatic aberrations, Control systems, Error analysis, Code division multiplexing, Critical dimension metrology, Process control, Sensors

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Showing 5 of 8 publications

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