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Dr. Juhyun Kim
at Dongbu HiTek Co Ltd
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Author
Publications (4)
Proceedings Article | 5 April 2007 Paper
Optimization of lithography process to improve image deformation of contact hole sub-90 nm technology node
Proceedings Volume 6518, 65183T (2007) https://doi.org/10.1117/12.711978
KEYWORDS: Image processing, Photomasks, Lithography, Edge roughness, Etching, Critical dimension metrology, Image analysis, Resistance, Image resolution, Failure analysis
Proceedings Article | 30 March 2007 Paper
Optimization of hardmask for dual anti-reflection layers
Proceedings Volume 6519, 65192W (2007) https://doi.org/10.1117/12.712003
KEYWORDS: Photomasks, Etching, Reflectivity, Silicon, Silicon carbide, Dielectrics, Plasma etching, Refractive index, Interfaces, Plasma enhanced chemical vapor deposition
Proceedings Article | 21 March 2006 Paper
Methodology to set up mask CD specification including MEEF and process sensitivity of mask CD error
Proceedings Volume 6154, 61544B (2006) https://doi.org/10.1117/12.657081
KEYWORDS: Photomasks, Semiconducting wafers, Critical dimension metrology, Optical proximity correction, Lithography, Electroluminescence, Process control, Optical lithography, Reticles, Cadmium
Proceedings Article | 12 May 2005 Paper
Modified optical proximity correction model to compensate pattern density induced optical proximity effect
Jaehyun Kang, Juhyun Kim, Sukwon Jung, Honglae Kim, Keeho Kim
Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.601420
KEYWORDS: Optical proximity correction, Etching, Lithography, Image processing, Semiconducting wafers, Critical dimension metrology, Data modeling, Process modeling, Instrument modeling, Scanning electron microscopy
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