Mr. Kaoru Koike Profile

Kaoru Koike

Researcher at Sony Atsugi Technology Ctr

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Author

Publications (12)

Proceedings Article | 21 March 2007 Paper

OPC to reduce variability of transistor properties

Kaoru Koike, Kohichi Nakayama, Kazuhisa Ogawa, Hidetoshi Ohnuma

Proceedings Volume 6521, 65210J (2007) https://doi.org/10.1117/12.711812

KEYWORDS: Transistors, Optical proximity correction, Ions, Distortion, Process modeling, Lithography, Semiconducting wafers, Manufacturing, Semiconductors, Statistical analysis

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Proceedings Article | 20 May 2006 Paper

Optimization of layout design and OPC by using estimation of transistor properties

Kaoru Koike, Kohichi Nakayama, Kazuhisa Ogawa, Hidetoshi Ohnuma

Proceedings Volume 6283, 62830P (2006) https://doi.org/10.1117/12.681850

KEYWORDS: Transistors, Optical proximity correction, Ions, Distortion, Semiconducting wafers, Lithography, Design for manufacturability, Device simulation, Photomasks, Design for manufacturing

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Proceedings Article | 23 March 2006 Paper

Advanced Image Placement Performance for the Current EPL Masks

Hideyuki Eguchi, Hiroshi Sugimura, Kaoru Koike, Hiroshi Sakaue, Hiroshi Arimoto, Kentaro Ogawa, Takashi Susa, Shinji Kunitani, Toshiaki Kurosu, Takashi Yoshii, Kojiro Itoh, Akira Tamura

Proceedings Volume 6151, 61511G (2006) https://doi.org/10.1117/12.655423

KEYWORDS: Photomasks, Semiconducting wafers, Metrology, Photoresist processing, Mask making, Optical alignment, Image processing, Silicon, Process control, Reactive ion etching

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Proceedings Article | 28 June 2005 Paper

Local IP evaluations of EPL reticle with 4 mm-sq Si membranes

Kaoru Koike, Hiroshi Sakaue, Hiroshi Arimoto, Tukasa Yamazaki, Hiroshi Sugimura, Takashi Susa, Kojiro Ito, Akira Tamura

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617467

KEYWORDS: Reticles, Distortion, Semiconducting wafers, Photomasks, Silicon, Metrology, Electron beam lithography, Optical alignment, Data corrections, Overlay metrology

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Proceedings Article | 6 May 2005 Paper

The improvement of the overlay accuracy using the reticle distortion correction for EPL technologies

Kaoru Koike, Hiroshi Sakaue, Hiroshi Arimoto, Akira Tamura, Takashi Susa, Kojiro Ito

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.599332

KEYWORDS: Distortion, Reticles, Metrology, Photomasks, Semiconducting wafers, Time metrology, Electron beam lithography, Silicon, Optical alignment, Overlay metrology

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Proceedings Article | 6 May 2005 Paper

EPL performance in 65-nm node metallization technology and beyond

F. Koba, T. Tsuchida, H. Sakaue, K. Koike, J. Yamamoto, N. Iriki, H. Yamashita, S. Kageyama, T. Nasuno, E. Soda, K. Takeda, H. Kobayashi, F. Shoji, H. Okamura, Y. Matsubara, H. Arimoto

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.599257

KEYWORDS: Metals, Transmission electron microscopy, Lithography, Scanners, Copper, Scanning electron microscopy, Resistance, Electron beam lithography, Overlay metrology, Chemical mechanical planarization

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Proceedings Article | 20 May 2004 Paper

Design rule of hole-layer for electron projection lithography

Kaoru Koike, Hiroshi Sakaue, Hiroshi Takenaka, Fumihiro Koba, Takahiro Tsuchida, Masaki Yamabe

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.534868

KEYWORDS: Photomasks, Electron beam lithography, Projection lithography, Lithography, Finite element methods, Semiconducting wafers, Critical dimension metrology, Optical lithography, Semiconductors, Optical simulations

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Proceedings Article | 20 May 2004 Paper

Preliminary results of EB stepper in the application of 65-nm process

Hiroshi Takenaka, Kaoru Koike, Takahiro Tsuchida, Fumihiro Koba, Hiroshi Sakaue, Masaki Yamabe

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.534875

KEYWORDS: Metals, Resistance, Overlay metrology, Lithography, Photomasks, Distortion, Copper, Photography, Electron beam lithography, Optical lithography

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Proceedings Article | 20 May 2004 Paper

Performance and stability of electron projection lithography tool

Hiroshi Sakaue, Kaoru Koike, Hiroshi Takenaka, Takahiro Tsuchida, Fumihiro Koba, Masaki Yamabe

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.534892

KEYWORDS: Distortion, Reticles, Semiconducting wafers, Photomasks, Optical alignment, Overlay metrology, Electron beam lithography, Projection lithography, Lithography, Data corrections

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Proceedings Article | 16 June 2003 Paper

Subfield distortion of an EPL stencil mask

Hiroshi Takenaka, Hiroshi Yamashita, Kaoru Koike, Masaki Yamabe

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.484980

KEYWORDS: Distortion, Photomasks, Finite element methods, Lithography, Silicon, Electron beam lithography, Projection lithography, Semiconductors, Semiconducting wafers, Chemical elements

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Proceedings Article | 1 August 2002 Paper

New mask format for low-energy electron-beam proximity projection lithography

Kaoru Koike, Shinji Omori, Kazuya Iwase, Isao Ashida, Shigeru Moriya

Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.477009

KEYWORDS: Photomasks, Charged-particle lithography, Semiconducting wafers, Projection lithography, Electron beam lithography, Finite element methods, Lithography, Electron beams, Diamond, Computer simulations

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Proceedings Article | 1 August 2002 Paper

Imaging capability of low-energy electron-beam proximity projection lithography toward the 70-nm node

Hiroyuki Nakano, Kumiko Oguni, Shinichiro Nohdo, Kaoru Koike, Shigeru Moriya

Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.476996

KEYWORDS: Photomasks, Charged-particle lithography, Optical alignment, Lithography, Semiconducting wafers, Electron beam lithography, Projection lithography, Photoresist processing, Etching, Dry etching

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Showing 5 of 12 publications

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