Mr. Kazuhiko Fukazawa Profile

Kazuhiko Fukazawa

at Nikon Corp

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Publications (2)

Proceedings Article | 10 April 2024 Poster + Paper

Technology for high density CD measurement of EUV-processed resist patterns across a wafer ensuring high throughput and precision

Taeko Matsukata, Kazuhiko Fukazawa, Shigeru Hirukawa, Kaori Mukai, Yosuke Miyazaki, Yoshihiko Fujimori, Tomohiro Iwaki, Tomonori Okada

Proceedings Volume 12955, 129552O (2024) https://doi.org/10.1117/12.3010278

KEYWORDS: Semiconducting wafers, Critical dimension metrology, Reflection, Polarized light, Polarization, Image processing, Refractive index

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Proceedings Article | 27 April 2023 Presentation + Paper

High-density CD measurement technology with high throughput and high precision on the entire surface of a process wafer, capable of capturing randomly occurring CD defects

Kazuhiko Fukazawa, Shigeru Hirukawa, Yosuke Miyazaki, Yoshihiko Fujimori, Tomohiro Iwaki, Tomonori Okada

Proceedings Volume 12496, 1249611 (2023) https://doi.org/10.1117/12.2657873

KEYWORDS: Semiconducting wafers, Critical dimension metrology, Diffraction, Error analysis, Signal intensity, Image processing, Etching, Photoresist processing

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