Mr. Kazuya Iwase Profile

Kazuya Iwase

Assistant Manager at Sony Corp

SPIE Involvement:

Author

Publications (20)

Proceedings Article | 14 October 2011 Paper

A new source optimization approach for 2X node logic

Kazuya Iwase, Peter De Bisschop, Bart Laenens, Zhipan Li, Keith Gronlund, Paul van Adrichem, Stephen Hsu

Proceedings Volume 8166, 81662A (2011) https://doi.org/10.1117/12.898749

KEYWORDS: SRAF, Photomasks, Logic, Source mask optimization, Critical dimension metrology, Double patterning technology, Resolution enhancement technologies, Molybdenum, Surface plasmons, Model-based design

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Proceedings Article | 23 March 2011 Paper

Joint optimization of layout and litho for SRAM and logic towards the 20nm node using 193i

Peter De Bisschop, Bart Laenens, Kazuya Iwase, Teruyoshi Yao, Mircea Dusa, Michael Smayling

Proceedings Volume 7973, 79730B (2011) https://doi.org/10.1117/12.881688

KEYWORDS: Logic, Lithium, Source mask optimization, Optical lithography, Double patterning technology, Surface plasmons, Transistors, Photovoltaics, Photomasks, Semiconducting wafers

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Proceedings Article | 11 May 2007 Paper

Alternating phase-shift mask and binary mask for 45-nm node and beyond: the impact on the mask error control

Yosuke Kojima, Masanori Shirasaki, Kazuaki Chiba, Tsuyoshi Tanaka, Yukio Inazuki, Hiroki Yoshikawa, Satoshi Okazaki, Kazuya Iwase, Kiichi Ishikawa, Ken Ozawa

Proceedings Volume 6607, 66070C (2007) https://doi.org/10.1117/12.728925

KEYWORDS: Photomasks, Chromium, Semiconducting wafers, Printing, Etching, Binary data, Resolution enhancement technologies, Reflectivity, Scanning electron microscopy, Image enhancement

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Proceedings Article | 20 October 2006 Paper

A new criterion of mask birefringence for polarized illumination

Kazuya Iwase, Boontarika Thunnakart, Tokihisa Kaneguchi, Ken Ozawa, Toshifumi Yokoyama, Yasutaka Morikawa, Fumikatsu Uesawa

Proceedings Volume 6349, 634951 (2006) https://doi.org/10.1117/12.685360

KEYWORDS: Birefringence, Photomasks, Polarization, Cadmium sulfide, Tolerancing, Electroluminescence, Lithography, Critical dimension metrology, Lawrencium, Wave plates

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Proceedings Article | 20 May 2006 Paper

Mask specifications for 45-nm node: the impact of immersion lithography and polarized light imaging

Kazuya Iwase, Ken Ozawa, Fumikatsu Uesawa

Proceedings Volume 6283, 628337 (2006) https://doi.org/10.1117/12.681826

KEYWORDS: Photomasks, Tolerancing, Polarization, Immersion lithography, Electroluminescence, Lithography, Error analysis, Lithographic illumination, Birefringence, Fiber optic illuminators

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Proceedings Article | 5 November 2005 Paper

A novel strategy of lithography-error-budget optimization for the 65-nm node: mask specifications for hyper-NA imaging

Kazuya Iwase, Kiichi Ishikawa, Koichi Takeuchi, Ken Ozawa, Fumikatsu Uesawa

Proceedings Volume 5992, 59920Y (2005) https://doi.org/10.1117/12.632021

KEYWORDS: Photomasks, Tolerancing, Immersion lithography, Error analysis, Lithography, Electroluminescence, Lithographic illumination, Critical dimension metrology, Scanners, Refractive index

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Proceedings Article | 28 June 2005 Paper

A novel robust optimization method of exposure and mask conditions for beyond 65 nm-node lithography

Koichi Takeuchi, Kazuya Iwase, Ken Ozawa, Fumikatsu Uesawa

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617455

KEYWORDS: Chromium, Photomasks, Lithography, Distortion, Critical dimension metrology, Optical proximity correction, Phase shifts, Error analysis, Cadmium, Polarization

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Proceedings Article | 6 May 2005 Paper

BEOL process technology based on proximity electron lithography: demonstration of the via-chain yield comparable with ArF lithography

S. Nohdo, S. Omori, K. Iwase, M. Yoshizawa, T. Motohashi, K. Oguni, K. Nakayama, H. Egawa, T. Takeda, T. Morikawa, S. Nohama, H. Nakano, T. Kitagawa, S. Moriya, H. Kawahira

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.601733

KEYWORDS: Photomasks, Lithography, Resistance, Semiconducting wafers, Inspection, Photoresist processing, Charged-particle lithography, Back end of line, Copper, Etching

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Proceedings Article | 20 August 2004 Paper

A novel approach to the mask inspection for proximity electron lithography based on electron beam imaging

Kazuya Iwase, Shinji Omori, Shoji Nohama, Kenta Yotsui, Gaku Suzuki, Yushin Sasaki, Kojiro Itoh, Akira Tamura, Satoru Maruyama, Shigeru Moriya, Tetsuya Kitagawa

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557822

KEYWORDS: Photomasks, Inspection, Lithography, Defect detection, Electron beam lithography, Etching, Semiconducting wafers, Photoresist processing, Monte Carlo methods, Opacity

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SPIE Journal Paper | 1 July 2004

Progress in proximity electron lithography: demonstration of print and overlay performance using the low-energy electron beam proximity-projection lithography β-tool

Shinji Omori, Shinichiro Nohdo, Shoji Nohama, Kouichi Nakayama, Kazuya Iwase, Tomonori Motohashi, Keiko Amai, Yoko Watanabe, Kazuharu Inoue, Isao Ashida, Hidetoshi Ohnuma, Hiroyuki Nakano, Shigeru Moriya, Tetsuya Kitagawa

JM3, Vol. 3, Issue 03, (July 2004) https://doi.org/10.1117/12.10.1117/1.1759326

KEYWORDS: Photomasks, Semiconducting wafers, Lithography, Overlay metrology, Charged-particle lithography, Optical alignment, Metrology, Distortion, Critical dimension metrology, Electron beam lithography

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Proceedings Article | 20 May 2004 Paper

First via-hole TEG fabricated by using 90-nm CMOS technology and proximity electron lithography: electric and lithographic results

Tetsuya Kitagawa, Masaki Yoshizawa, Kazuya Iwase, Shinji Omori, Shoji Nohama, Hiroyuki Nakano, Shigeru Moriya, Hiroichi Kawahira

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.534423

KEYWORDS: Charged-particle lithography, Photomasks, Lithography, Scanners, Contamination, Semiconducting wafers, Overlay metrology, Photoresist processing, Resistance, Image processing

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Proceedings Article | 20 May 2004 Paper

Analysis of critical dimension uniformity for LEEPL

Masaki Yoshizawa, Kazuya Iwase, Hiizu Ohtorii, Kumiko Oguni, Hiroki Hane, Keiko Amai, Shigeru Moriya, Hiroyuki Nakano, Tetsuya Kitagawa

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.536029

KEYWORDS: Critical dimension metrology, Photomasks, Charged-particle lithography, Edge roughness, Electrons, Scanning electron microscopy, Scattering, Semiconducting wafers, Lithography, Image enhancement

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Proceedings Article | 17 December 2003 Paper

Litho-and-mask concurrent approach to the critical issues for proximity electron lithography

Shinji Omori, Kazuya Iwase, Keiko Amai, Yoko Watanabe, Shoji Nohama, Shinichiro Nohdo, Shigeru Moriya, Tetsuya Kitagawa, Kenta Yotsui, Gaku Suzuki, Akira Tamura

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518816

KEYWORDS: Photomasks, Semiconducting wafers, Lithography, Photoresist processing, Image processing, Scanners, Etching, Electroluminescence, Overlay metrology, Charged-particle lithography

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Proceedings Article | 28 August 2003 Paper

On-site use of 1x stencil mask: control over image placement and dimension

Shinji Omori, Kazuya Iwase, Yoko Watanabe, Keiko Amai, Takayuki Sasaki, Shoji Nohama, Isao Ashida, Shigeru Moriya, Tetuya Kitagawa

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504258

KEYWORDS: Photomasks, Semiconducting wafers, Contamination, Critical dimension metrology, Lithography, Metrology, Distortion, Overlay metrology, Charged-particle lithography, Silicon

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Proceedings Article | 28 August 2003 Paper

State-of-the-art performance of stencil mask for LEEPL

Shoji Nohama, Shinji Omori, Kazuya Iwase, Yoko Watanabe, Keiko Amai, Takayuki Sasaki, Shigeru Moriya, Tetuya Kitagawa

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504273

KEYWORDS: Photomasks, Charged-particle lithography, Semiconducting wafers, Etching, Image enhancement, Scanning electron microscopy, Line edge roughness, Lithography, Photoresist processing, Defect inspection

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Proceedings Article | 1 August 2002 Paper

New mask format for low-energy electron-beam proximity projection lithography

Kaoru Koike, Shinji Omori, Kazuya Iwase, Isao Ashida, Shigeru Moriya

Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.477009

KEYWORDS: Photomasks, Charged-particle lithography, Semiconducting wafers, Projection lithography, Electron beam lithography, Finite element methods, Lithography, Electron beams, Diamond, Computer simulations

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Proceedings Article | 5 September 2001 Paper

Advanced FIB mask repair technology for ArF lithography: III

Ryoji Hagiwara, Anto Yasaka, Osamu Takaoka, Tomokazu Kozakai, S. Yabe, Yoshihiro Koyama, Masashi Muramatsu, Toshio Doi, Kenji Suzuki, Mamoru Okabe, Kazuo Aita, Tatsuya Adachi, Shinji Kubo, Nobuyuki Yoshioka, Hiroaki Morimoto, Yasutaka Morikawa, Kazuya Iwase, Naoya Hayashi

Proceedings Volume 4409, (2001) https://doi.org/10.1117/12.438373

KEYWORDS: Photomasks, Imaging systems, Prototyping, Lithography, Ions, Opacity, Semiconductors, 193nm lithography, Transmittance, Manufacturing

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Proceedings Article | 22 January 2001 Paper

Advanced FIB mask repair technology for ArF lithography: II

Shinji Kubo, Koji Hiruta, Hiroaki Morimoto, Anto Yasaka, Ryoji Hagiwara, Tatsuya Adachi, Yasutaka Morikawa, Kazuya Iwase, Naoya Hayashi

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410689

KEYWORDS: Photomasks, Opacity, Ions, Transmittance, Lithography, Carbon, Ion beams, Etching, Semiconducting wafers, Phase shifts

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Proceedings Article | 19 July 2000 Paper

Advanced FIB mask repair technology in ArF lithography

Koji Hiruta, Shinji Kubo, Hiroaki Morimoto, Anto Yasaka, Ryoji Hagiwara, Tatsuya Adachi, Yasutaka Morikawa, Kazuya Iwase, Naoya Hayashi

Proceedings Volume 4066, (2000) https://doi.org/10.1117/12.392089

KEYWORDS: Carbon, Photomasks, Transmittance, Semiconducting wafers, Atomic force microscopy, Ion beams, Laser irradiation, Opacity, Lithography, Ions

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Proceedings Article | 30 December 1999 Paper

Realization of practical attenuated phase-shift mask with high-transmission KrF excimer laser exposure

Nobuhito Toyama, Hiroyuki Miyashita, Yasutaka Morikawa, Hiroshi Fujita, Kazuya Iwase, Hiroshi Mohri, Naoya Hayashi, Hisatake Sano

Proceedings Volume 3873, (1999) https://doi.org/10.1117/12.373331

KEYWORDS: Optical simulations, Reticles, Manufacturing, Inspection, Photomasks, Excimer lasers, Optics manufacturing, Phase shifts, Transmittance, Optical properties

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Showing 5 of 20 publications

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