Mr. Keizo Yamada Profile

Keizo Yamada

at Holon Co Ltd

SPIE Involvement:

Author

Publications (6)

Proceedings Article | 14 October 2011 Paper

Electron beam EUV patterned mask inspection system

Keizo Yamada, Yasunobu Kitayama, Peter Fiekowsky

Proceedings Volume 8166, 81662W (2011) https://doi.org/10.1117/12.896971

KEYWORDS: Inspection, Photomasks, Extreme ultraviolet, Deep ultraviolet, Electron beams, Sensors, Holons, Defect detection, Extreme ultraviolet lithography, Computer aided design

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Proceedings Article | 17 October 2008 Paper

Auto-classification and simulation of mask defects using SEM and CAD images

Tung-Yaw Kang, Hsin-Chang Lee, H. Zhang, K. Yamada, Y. Kitayama, K. Kobayashi, Peter Fiekowsky

Proceedings Volume 7122, 71221F (2008) https://doi.org/10.1117/12.801411

KEYWORDS: Inspection, Photomasks, Scanning electron microscopy, Computer aided design, Semiconducting wafers, Printing, Defect detection, Defect inspection, Holons, Lithography

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Proceedings Article | 6 April 2007 Paper

CD measurement in flash memory using substrate current technology

Yeong-Uk Ko, Keizo Yamada, Takeo Ushiki

Proceedings Volume 6518, 65182T (2007) https://doi.org/10.1117/12.712477

KEYWORDS: Capacitance, Resistance, Signal processing, Signal analyzers, Semiconductors, Inspection, Signal detection, Manufacturing, Sensors, Measurement devices

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Proceedings Article | 24 March 2006 Paper

Modeling of substrate current measurement and charge transfer in insulators

Yeong-Uk Ko, Keizo Yamada, Takeo Ushiki, Robert Newcomb

Proceedings Volume 6152, 615230 (2006) https://doi.org/10.1117/12.656491

KEYWORDS: Electrons, Interfaces, Monte Carlo methods, Dielectrics, Thin films, Image processing, Oxides, Device simulation, Semiconductors, Scattering

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Proceedings Article | 15 July 2003 Paper

Copy result exactly using EB-Scope technology

Keizo Yamada, Takeo Ushiki, Yousuke Itagaki, Robert Newcomb

Proceedings Volume 5041, (2003) https://doi.org/10.1117/12.485238

KEYWORDS: Semiconducting wafers, Process control, Silicon, Silica, Electron beams, Yield improvement, Etching, Scanning electron microscopy, Semiconductors, Manufacturing

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Showing 5 of 6 publications

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