Mr. Kenichi Takahara Profile

Kenichi Takahara

Senior Manager at NuFlare Technology Inc

SPIE Involvement:

Author

Publications (13)

Proceedings Article | 28 June 2013 Paper

Improvement of a DUV mask inspection tool to hand over the baton for next-generation tool smoothly

Hideaki Hashimoto, Nobutaka Kikuiri, Eiji Matsumoto, Hideo Tsuchiya, Riki Ogawa, Ikunao Isomura, Manabu Isobe, Kenichi Takahara

Proceedings Volume 8701, 87010V (2013) https://doi.org/10.1117/12.2029363

KEYWORDS: Lithography, Optical lithography, Deep ultraviolet, Sensors, Inspection, Image sensors, Image transmission, Photomasks, Extreme ultraviolet, Double patterning technology

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Proceedings Article | 29 September 2010 Paper

Study of EUV mask inspection technique using DUV light source for hp22nm and beyond

Ryoichi Hirano, Nobutaka Kikuiri, Hideaki Hashimoto, Kenichi Takahara, Masatoshi Hirono, Hiroyuki Shigemura

Proceedings Volume 7823, 782339 (2010) https://doi.org/10.1117/12.866673

KEYWORDS: Light sources, Lithographic illumination, Defect detection, Inspection, Image sensors, Photomasks, Extreme ultraviolet, Image enhancement, Extreme ultraviolet lithography, Image contrast enhancement

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Proceedings Article | 25 September 2010 Paper

Optimization of MDP, mask writing, and mask inspection for mask manufacturing cost reduction

Masaki Yamabe, Tadao Inoue, Masahiro Shoji, Akio Yamada, Hiromichi Hoshi, Kenichi Takahara

Proceedings Volume 7823, 78230S (2010) https://doi.org/10.1117/12.864196

KEYWORDS: Logic, Manufacturing, Inspection, Diagnostics, Parallel processing, Image transmission, Photomasks, Extreme ultraviolet, System integration, Vestigial sideband modulation

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Proceedings Article | 25 May 2010 Paper

Mask inspection system with variable sensitivity and printability verification function

Takafumi Inoue, Kenichi Takahara, Hideo Tsuchiya, Masakazu Tokita, Tadao Inoue, Masaki Yamabe

Proceedings Volume 7748, 77481G (2010) https://doi.org/10.1117/12.864415

KEYWORDS: Defect detection, Databases, Inspection, Image sensors, Image transmission, Photomasks, Source mask optimization, Data conversion, Semiconducting wafers

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Proceedings Article | 16 April 2010 Paper

Mask data rank and printability verification function of mask inspection system

Kenichi Takahara, Masakazu Tokita, Hideo Tsuchiya, Masaki Yamabe, Nobutaka Kikuiri, Kinya Usuda

Proceedings Volume 7638, 763833 (2010) https://doi.org/10.1117/12.846412

KEYWORDS: Semiconductors, Defect detection, Databases, Inspection, Computer simulations, Photomasks, Source mask optimization, Optical proximity correction, Data conversion, Defect inspection

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Proceedings Article | 2 April 2010 Paper

A novel defect detection optical system using 199-nm light source for EUVL mask

Ryoichi Hirano, Nobutaka Kikuiri, Masatoshi Hirono, Riki Ogawa, Hiroyuki Sigemura, Kenichi Takahara, Hideaki Hashimoto

Proceedings Volume 7638, 76382Z (2010) https://doi.org/10.1117/12.848679

KEYWORDS: Lithography, Defect detection, Inspection, Image sensors, Photomasks, Extreme ultraviolet, Image enhancement, Extreme ultraviolet lithography, Image contrast enhancement, Signal detection

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Proceedings Article | 30 September 2009 Paper

Novel EUV mask inspection tool with 199-nm laser source and high-resolution optics

Nobutaka Kikuiri, Masatoshi Hirono, Ryoichi Hirano, Tsuyoshi Amano, Osamu Suga, Hiroyuki Shigemura, Hideaki Hashimoto, Kenichi Takahara, Kinya Usuda

Proceedings Volume 7488, 74882O (2009) https://doi.org/10.1117/12.829747

KEYWORDS: Laser sources, Super resolution, Defect detection, Inspection, Optical inspection, Photomasks, Extreme ultraviolet, Image contrast enhancement, Optical alignment, EUV optics

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Proceedings Article | 23 September 2009 Paper

Printability verification function of mask inspection system

Hideo Tsuchiya, Masaki Yamabe, Masakazu Tokita, Kenichi Takahara, Kinya Usuda, Fumio Ozaki, Nobutaka Kikuiri

Proceedings Volume 7488, 74880B (2009) https://doi.org/10.1117/12.829739

KEYWORDS: Lithography, Defect detection, Sensors, Inspection, Optical inspection, Telecommunications, Image transmission, Photomasks, SRAF, Semiconducting wafers

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Proceedings Article | 11 May 2009 Paper

Evaluation of EUVL mask pattern defect inspection using 199nm inspection tool with super-resolution method

Hiroyuki Shigemura, Tsuyoshi Amano, Yasushi Nishiyama, Osamu Suga, Yukiyasu Arisawa, Hideaki Hashimoto, Kenichi Takahara, Kinya Usuda, Nobutaka Kikuiri, Ryoichi Hirano

Proceedings Volume 7379, 73792K (2009) https://doi.org/10.1117/12.824334

KEYWORDS: Finite-difference time-domain method, Defect detection, Opacity, Inspection, Reflectivity, Optical inspection, Photomasks, Extreme ultraviolet lithography, Signal detection, Defect inspection

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Proceedings Article | 24 March 2009 Paper

Study of advanced mask inspection optics with super-resolution method for next-generation mask fabrication

Ryoichi Hirano, Masatoshi Hirono, Riki Ogawa, Nobutaka Kikuiri, Kenichi Takahara, Hideaki Hashimoto, Hiroyuki Shigemura

Proceedings Volume 7272, 72722A (2009) https://doi.org/10.1117/12.814466

KEYWORDS: Lithography, Super resolution, Defect detection, Polarization, Inspection, Optical inspection, Image transmission, Photomasks, Image contrast enhancement, 193nm lithography

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Proceedings Article | 5 April 2007 Paper

Development of advanced mask inspection optics with transmitted and reflected light image acquisition

Ryoichi Hirano, Riki Ogawa, Hitoshi Suzuki, Kenichi Takahara, Yoshitake Tsuji, Shingo Murakami, Nobutaka Kikuiri, Kinya Usuda

Proceedings Volume 6518, 65181U (2007) https://doi.org/10.1117/12.712774

KEYWORDS: Lithography, Defect detection, Sensors, Inspection, Image acquisition, Optical inspection, Image transmission, Photomasks, 193nm lithography, Defect inspection

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Proceedings Article | 20 October 2006 Paper

Development of next-generation mask inspection method by using the feature of mask image captured with 199-nm inspection optics

Yoshitake Tsuji, Nobutaka Kikuiri, Shingo Murakami, Kenichi Takahara, Ikunao Isomura, Yukio Tamura, Kyoji Yamashita, Ryoichi Hirano, Motonari Tateno, Kenichi Matsumura, Naohisa Takayama, Kinya Usuda

Proceedings Volume 6349, 63493M (2006) https://doi.org/10.1117/12.692811

KEYWORDS: Point spread functions, Image processing, Inspection, Optical inspection, Image sensors, Image transmission, Photomasks, Image enhancement, Computer aided design, Laser optics

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Proceedings Article | 19 May 2006 Paper

Development of advanced reticle inspection apparatus for hp 65 nm node device and beyond

Nobutaka Kikuiri, Shingo Murakami, Hideo Tsuchiya, Motonari Tateno, Kenichi Takahara, Shinichi Imai, Ryoichi Hirano, Ikunao Isomura, Yoshitake Tsuji, Yukio Tamura, Kenichi Matsumura, Kinya Usuda, Masao Otaki, Osamu Suga, Katsumi Ohira

Proceedings Volume 6283, 62830Y (2006) https://doi.org/10.1117/12.683579

KEYWORDS: Lithography, Defect detection, Sensors, Inspection, Optical inspection, Image sensors, Objectives, Image transmission, Photomasks, Laser optics

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Showing 5 of 13 publications

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