Mr. Kentaro Goto Profile

Kentaro Goto

Manager at JSR Corp

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Publications (7)

Proceedings Article | 20 March 2012 Paper

Investigation of pattern wiggling for spin-on organic hardmask materials

Goji Wakamatsu, Kentaro Goto, Yoshi Hishiro, Taiichi Furukawa, Satoru Murakami, Masayuki Motonari, Yoshikazu Yamaguchi, Tsutomu Shimokawa, Greg Breyta, Anuja DeSilva, Noel Arellano, Luisa Bozano, Carl Larson, Martin Glodde, Ratnam Sooriyakumaran

Proceedings Volume 8325, 83250T (2012) https://doi.org/10.1117/12.915698

KEYWORDS: Etching, Resistance, Hydrogen, Chemical vapor deposition, Fluorine, Fourier transforms, Optical lithography, Critical dimension metrology, Double patterning technology, Extreme ultraviolet

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Proceedings Article | 16 April 2011 Paper

Ultra-thin-film EUV resists beyond 20nm lithography

Hiroki Nakagawa, Tomohisa Fujisawa, Kentaro Goto, Tooru Kimura, Toshiyuki Kai, Yoshi Hishiro

Proceedings Volume 7972, 79721I (2011) https://doi.org/10.1117/12.879303

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Lithography, Etching, Diffusion, Semiconducting wafers, Line width roughness, Photoresist processing, Silica, Optical lithography

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Proceedings Article | 8 April 2011 Paper

Development of EUV resist for 22nm half pitch and beyond

Kouta Nishino, Ken Maruyama, Tooru Kimura, Toshiyuki Kai, Kentaro Goto, Shalini Sharma

Proceedings Volume 7969, 79692I (2011) https://doi.org/10.1117/12.879430

KEYWORDS: Diffusion, Extreme ultraviolet, Extreme ultraviolet lithography, Lithography, Line width roughness, Yield improvement, Glasses, Optical lithography, Polymers, Quantum efficiency

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Proceedings Article | 26 March 2010 Paper

Simplified double patterning process with non-topcoat self-freezing resist

Tomohisa Fujisawa, Yusuke Anno, Masafumi Hori, Goji Wakamatsu, Michihiro Mita, Koji Ito, Hiromitsu Tanaka, Kenji Hoshiko, Takeo Shioya, Kentaro Goto, Yoshifumi Ogawa, Hiroaki Takikawa, Yutaka Kozuma, Koichi Fujiwara, Makoto Sugiura, Yoshikazu Yamaguchi, Tsutomu Shimokawa

Proceedings Volume 7639, 76392Y (2010) https://doi.org/10.1117/12.846493

KEYWORDS: Double patterning technology, Photoresist processing, Lithography, Manufacturing, Optical lithography, Silica, Water, Immersion lithography, Critical dimension metrology, Extreme ultraviolet lithography

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Proceedings Article | 20 March 2010 Paper

Development of EUV resist for 22nm half pitch and beyond

Ken Maruyama, Makoto Shimizu, Yuuki Hirai, Kouta Nishino, Tooru Kimura, Toshiyuki Kai, Kentaro Goto, Shalini Sharma

Proceedings Volume 7636, 76360T (2010) https://doi.org/10.1117/12.846332

KEYWORDS: Diffusion, Line width roughness, Extreme ultraviolet, Extreme ultraviolet lithography, Glasses, Lithography, Amplifiers, Photoresist processing, Optical amplifiers, Magnesium

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Proceedings Article | 4 April 2008 Paper

Process development for high scan speed ArF immersion lithography

Nobuji Matsumura, Norihiko Sugie, Kentaro Goto, Koichi Fujiwara, Yoshikazu Yamaguchi, Hirokazu Tanizaki, Katsushi Nakano, Tomoharu Fujiwara, Shinya Wakamizu, Hirofumi Takeguchi, Hiroshi Arima, Hideharu Kyoda, Kosuke Yoshihara, Junichi Kitano

Proceedings Volume 6923, 69230D (2008) https://doi.org/10.1117/12.771795

KEYWORDS: Lithography, Immersion lithography, Thin film coatings, 193nm lithography, Semiconducting wafers, Bridges, Defect inspection, Photoresist processing, Line width roughness, Semiconductors

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Proceedings Article | 30 March 2007 Paper

Process optimization for developer soluble immersion topcoat material

Hiroki Nakagawa, Kentarou Goto, Motoyuki Shima, Junichi Takahashi, Tsutomu Shimokawa, Katsunori Ichino, Naohiko Nagatani, Hideharu Kyoda, Kosuke Yoshihara

Proceedings Volume 6519, 651923 (2007) https://doi.org/10.1117/12.711858

KEYWORDS: Coating, Semiconducting wafers, Photoresist processing, Immersion lithography, Thin film coatings, Standards development, Materials processing, Molecules, Lithography, Image processing

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Showing 5 of 7 publications

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