Dr. Kevin M. Dorney Profile

Dr. Kevin M. Dorney

at imec

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Author

Publications (7)

Proceedings Article | 12 November 2024 Presentation + Paper

BEFORCE: a pathway to unravel metal oxide resist (MOR) reactions upon EUV exposure, bake, and environment

Ivan Pollentier, Fabian Holzmeier, Kevin Dorney, Hyo Seon Suh

Proceedings Volume 13215, 132150G (2024) https://doi.org/10.1117/12.3034708

KEYWORDS: Extreme ultraviolet lithography, FT-IR spectroscopy, Moisture, Vacuum, Environmental sensing, Chemical analysis, Metal oxides, Metrology

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Metal oxide resists (MORs) have shown excellent performance in EUV lithography, offering high resolution, low line-edge roughness, and low EUV dose sensitivity. These attributes make them strong candidates for advanced patterning solutions. While the basic molecular mechanisms of Sn-based MORs are relatively well understood, environmental factors—such as the presence of moisture and other gases—have been found to influence reactions, leading to variations in critical dimension (CD) stability. Researching these phenomena is challenging because EUV exposures occur in vacuum environments, while conventional measurement techniques like Fourier Transform Infrared (FTIR) spectroscopy are typically conducted on off-line tools. This offline process can introduce variability due to uncontrolled environmental factors, such as atmospheric moisture and time delays. To enable a more detailed investigation of MOR reactions under controlled conditions, imec has developed the BEFORCE* tool. Built on an existing system that already includes EUV exposure and Residual Gas Analysis (RGA) capabilities, the BEFORCE tool integrates FTIR spectroscopy and hotplate units, allowing for post-exposure bake under different gas atmospheres and varying levels of humidity. Additionally, the system employs transfer arms to move MOR samples between units under controlled environments, such as vacuum or dry nitrogen. In this paper, we will clarify the chemical changes in model MORs induced by EUV exposure, baking, and environmental conditions. The high signal-to-noise ratio of the FTIR measurements enables precise quantification of processes such as ligand removal and the presence of water. Moreover, measurements conducted within the BEFORCE tool’s controlled environment were found to be significantly more stable than those taken with off-line FTIR, which are susceptible to delays and environmental variability. * BEFORCE: Bake and Exposure system with FTIR and Outgas measurement for Resist evaluation in Controlled Environment

SPIE Journal Paper | 25 September 2024

Actinic inspection of the extreme ultraviolet optical parameters of lithographic materials enabled by a table-top, coherent extreme ultraviolet source

Kevin Dorney, Fabian Holzmeier, Nicola Kissoon, Esben Larsen, Dhirendra Singh, Shikhar Arvind, Sayantani Santra, Roberto Fallica, Marina Timmermans, Ivan Pollentier, Igor Makhotkin, Vicky Philipsen, Stefan De Gendt, Claudia Fleischmann, Paul A. van der Heide, John Petersen

JM3, Vol. 23, Issue 04, 041406, (September 2024) https://doi.org/10.1117/12.10.1117/1.JMM.23.4.041406

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Photoresist materials, Reflectivity, Ruthenium, Pellicles, EUV optics, Reflectometry, Optical properties, Systems modeling

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Proceedings Article | 10 April 2024 Presentation + Paper

Actinic photoemission spectroscopy of litho materials using a table-top ultrafast EUV source

Dhirendra Singh, Kevin Dorney, Fabian Holzmeier, Esben Larsen, Laura Galleni, Charles Mokhtarzadeh, Michiel van Setten, Thierry Conard, John Petersen, Paul A. van der Heide

Proceedings Volume 12955, 1295504 (2024) https://doi.org/10.1117/12.3010751

KEYWORDS: Photoemission spectroscopy, Extreme ultraviolet lithography, Extreme ultraviolet, Photoresist materials, Photoacid generators, Chemistry, Polymers, Ultrafast laser spectroscopy, Systems modeling, Metal oxides

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Proceedings Article | 1 May 2023 Presentation + Paper

A scientific framework for establishing ultrafast molecular dynamic research in imec’s AttoLab

Laura Galleni, Faegheh Sajjadian, Thierry Conard, Ivan Pollentier, Kevin Dorney, Fabian Holzmeier, Esben Witting Larsen, Daniel Escudero, Geoffrey Pourtois, Michiel van Setten, Paul van der Heide, John Petersen

Proceedings Volume 12498, 124980W (2023) https://doi.org/10.1117/12.2660047

KEYWORDS: X-ray photoelectron spectroscopy, Extreme ultraviolet lithography, Photoacid generators, Ultrafast phenomena, X-rays, Photoresist materials, Quantum processes, Extreme ultraviolet, Lithography, Stochastic processes

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Proceedings Article | 28 April 2023 Presentation + Paper

Actinic inspection of the EUV optical parameters of lithographic materials with lab-based radiometry and reflectometry

Kevin Dorney, Nicola Kissoon, Fabian Holzmeier, Esben Larsen, Dhirendra Singh, Shikhar Arvind, Sayantani Santra, Roberto Fallica, Igor Makhotkin, Vicky Philipsen, Stefan De Gendt, Claudia Fleischmann, Paul A. van der Heide, John Petersen

Proceedings Volume 12494, 1249407 (2023) https://doi.org/10.1117/12.2658359

KEYWORDS: Extreme ultraviolet, Photoresist materials, Reflectometry, Extreme ultraviolet lithography, Optical constants, Interfaces

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Proceedings Article | 22 February 2021 Presentation

Introduction to imec's AttoLab for ultrafast kinetics of EUV exposure processes and ultra-small pitch lithography

Fabian Holzmeier, Kevin Dorney, Esben Larsen, Thomas Nuytten, Dhirendra Singh, Michiel van Setten, Pieter Vanelderen, Clayton Bargsten, Seth Cousin, Daisy Raymondson, Eric Rinard, Rod Ward, Henry Kapteyn, Stefan Böttcher, Oleksiy Dyachenko, Raimund Kremzow, Marko Wietstruk, Geoffrey Pourtois, Paul van der Heide, John Petersen

Proceedings Volume 11610, 1161010 (2021) https://doi.org/10.1117/12.2595038

KEYWORDS: Lithography, Extreme ultraviolet lithography, Ultrafast phenomena, Photoemission spectroscopy, Coherence imaging, Semiconducting wafers, Radiometry, Extreme ultraviolet, Time resolved spectroscopy, Spectroscopy

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Proceedings Article | 22 February 2021 Presentation

Lloyd’s mirror interference lithography below a 22-nm pitch with an accessible, tabletop, 13.5 nm high-harmonic EUV source

Kevin Dorney, Sonia Castellanos, Esben Larsen, Fabian Holzmeier, Dhirendra Singh, Nadia Vandenbroeck, Danilo De Simone, Peter De Schepper, Alessandro VaglioPret, Clayton Bargsten, Seth Cousin, Daisy Raymondson, Eric Rinard, Rod Ward, Henry Kaptyen, Thomas Nuytten, Paul Van der Heide, John Petersen

Proceedings Volume 11610, 1161011 (2021) https://doi.org/10.1117/12.2595048

KEYWORDS: Lithography, Extreme ultraviolet, Mirrors, Extreme ultraviolet lithography, Ultrafast phenomena, Photoresist materials, Yield improvement, Semiconductor manufacturing, Semiconducting wafers, Scanning electron microscopy

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Showing 5 of 7 publications

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