CONFERENCE PROCEEDINGS
Advanced Search
Dr. Viktor S. Klimin
at Southern Federal Univ
SPIE Involvement:
Author
Publications (5)
Proceedings Article | 15 March 2019 Paper
Effect of the sublayer material on the formation of electrical contact and the growth rate of carbon nanotubes in a low-temperature plasma using the example of Ni/Ti/Si and Fe/W/Si structures
Proceedings Volume 11022, 1102220 (2019) https://doi.org/10.1117/12.2522337
KEYWORDS: Carbon nanotubes, Thermodynamics, Plasma
Proceedings Article | 15 March 2019 Paper
Mask formation on GaAs substrate by focused ion beams of Ga+ for plasma chemical etching
Viktor Klimin, Ivan Kots, Victoria Polyakova, Alexey Rezvan, Oleg Ageev
Proceedings Volume 11022, 110221R (2019) https://doi.org/10.1117/12.2522332
KEYWORDS: Plasma, Ion beams, Plasma etching, Gallium arsenide, Etching, Nanotechnology, Atomic force microscope
Proceedings Article | 15 March 2019 Paper
Nanoscale profiling and memristor effect of ZnO thin films for RRAM and neuromorphic devices application
Viktor Klimin, Roman Tominov, Vadim Avilov, Denis Dukhan, Alexey Rezvan, Evgeny Zamburg, Vladimir Smirnov, Oleg Ageev
Proceedings Volume 11022, 110220E (2019) https://doi.org/10.1117/12.2522322
KEYWORDS: Zinc oxide, Lawrencium, Resistance, Pulsed laser operation, Thin films, Aluminum, Switching, Nanolithography, Photoresist materials, Nanostructures
Proceedings Article | 15 March 2019 Paper
Influence of annealing on nanocrystalline LiNbO3 films properties
Viktor Klimin, Zakhar Vakulov, Roman Tominov, Yuriy Varzarev, Iosif Clemente, Andrew Miakonkikh, Konstantin Rudenko, Oleg Ageev
Proceedings Volume 11022, 110221E (2019) https://doi.org/10.1117/12.2522316
KEYWORDS: Annealing, Oxygen, Surface roughness, Scanning electron microscopy, Absorption, Oxides, Fabrication, Atmospheric modeling, Atmospheric optics, Acousto-optics
Proceedings Article | 30 December 2016 Paper
A study of the vertical walls and the surface roughness GaAs after the operation in the combined plasma etching
Viktor Klimin, Maxim Solodovnik, Vladimir Smirnov, Andrey Eskov, Roman Tominov, Oleg Ageev
Proceedings Volume 10224, 102241Z (2016) https://doi.org/10.1117/12.2267120
KEYWORDS: Surface roughness, Gallium arsenide, Plasma etching, Plasma, Photoresist materials, Etching, Atomic force microscopy, Lithography, Wet etching, Nanostructures
SIGN IN TO:
  • View contact details
UPDATE YOUR PROFILE
Is this your profile? Update it now.
Sign into your SPIE.org account
Don’t have a profile and want one?
Create an account on SPIE.org
Advertisement
Advertisement
Back to Top