Dr. Lucia D'Urzo Profile

Dr. Lucia D'Urzo

at SCREEN SPE Germany GmbH

SPIE Involvement:

Author

Publications (11)

Proceedings Article | 22 February 2021 Presentation + Paper

High performance filtration for bulk materials: a novel HDPE membrane filter designed for EUV lithography

Lucia D'Urzo, Toru Umeda, Takehito Mizuno, Atsushi Hattori, Amarnauth Singh, Rajan Beera, Philippe Foubert, Waut Drent

Proceedings Volume 11612, 116120H (2021) https://doi.org/10.1117/12.2584064

KEYWORDS: Extreme ultraviolet lithography, Particles, Molecules, Lithography, Extreme ultraviolet, Semiconducting wafers, Metals, Liquids, Linear filtering, Coating

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Proceedings Article | 23 March 2020 Paper

Defect mitigation and characterization in silicon hardmask materials

Vineet Alexander, Shyam Paudel, Glenn Dado, Lucia D'Urzo, Virgil Briggs, Mona Bavarian, Rao Varanasi, Tim Limmer, Nick Brakensiek, Levi Gildehaus, Mike Mesawich, Douglas Guerrero

Proceedings Volume 11326, 113261Q (2020) https://doi.org/10.1117/12.2552833

KEYWORDS: Silicon, Particles, Ions, Aluminum, Semiconducting wafers, Scanning electron microscopy, Plasma etching, Lithography

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Proceedings Article | 23 March 2020 Presentation + Paper

Defectivity modulation in EUV resists through advanced filtration technologies

Lucia D'Urzo, Toru Umeda, Takehito Mizuno, Atsushi Hattori, Rao Varanasi, Amarnauth Singh, Rajan Beera, Philippe Foubert, Jelle Vandereyken, Waut Drent

Proceedings Volume 11326, 113260K (2020) https://doi.org/10.1117/12.2560144

KEYWORDS: Semiconducting wafers, Particles, Extreme ultraviolet lithography, Extreme ultraviolet, Inspection, Bridges, Defect inspection

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Proceedings Article | 7 April 2017 Presentation + Paper

High-volume manufacturing compatible dry development rinse process (DDRP): patterning and defectivity performance for EUVL

Safak Sayan, Pieter Vanelderen, Iulian Hetel, BT Chan, Praveen Raghavan, Victor Blanco, Philippe Foubert, Lucia D'urzo, Danilo De Simone, Geert Vandenberghe

Proceedings Volume 10143, 101430U (2017) https://doi.org/10.1117/12.2261741

KEYWORDS: Photoresist materials, Extreme ultraviolet lithography, Photoresist developing, Optical lithography, Extreme ultraviolet, High volume manufacturing, Resolution enhancement technologies, Photomasks, Photoresist processing, Semiconducting wafers, Etching

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Proceedings Article | 27 March 2017 Paper

Continuous improvements of defectivity rates in immersion photolithography via functionalized membranes in point-of-use photochemical filtration

Lucia D'Urzo, Hareen Bayana, Jelle Vandereyken, Philippe Foubert, Aiwen Wu, Jad Jaber, James Hamzik

Proceedings Volume 10146, 101462A (2017) https://doi.org/10.1117/12.2258582

KEYWORDS: Lithography, Photoresist materials, Immersion lithography, Semiconducting wafers, Line width roughness, Line edge roughness, Scanning electron microscopy, Particles, Bridges, Finite element methods, Fermium, Frequency modulation

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Proceedings Article | 22 March 2016 Paper

DSA materials contributions to the defectivity performance of 14nm half-pitch LiNe flow at IMEC

Hari Pathangi, Varun Vaid, Boon Teik Chan, Nadia Vandenbroeck, Jin Li, Sung Eun Hong, Yi Cao, Baskaran Durairaj, Guanyang Lin, Mark Somervell, Takahiro Kitano, Ryota Harukawa, Kaushik Sah, Andrew Cross, Hareen Bayana, Lucia D’Urzo, Roel Gronheid

Proceedings Volume 9777, 97770G (2016) https://doi.org/10.1117/12.2219936

KEYWORDS: Directed self assembly, Metrology, Optical lithography, Silicon, Semiconducting wafers, Etching, Bridges, Polymers, Manufacturing, Scanning electron microscopy, Epitaxy, Lithography, Thin film coatings

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SPIE Journal Paper | 2 July 2015

Defect mitigation and root cause studies in 14 nm half-pitch chemo-epitaxy directed self-assembly LiNe flow

Hari Pathangi, Boon Teik Chan, Hareen Bayana, Nadia Vandenbroeck, Dieter Van den Heuvel, Lieve Van Look, Paulina Rincon-Delgadillo, Yi Cao, JiHoon Kim, Guanyang Lin, Doni Parnell, Kathleen Nafus, Ryota Harukawa, Ito Chikashi, Marco Polli, Lucia D’Urzo, Roel Gronheid, Paul Nealey

JM3, Vol. 14, Issue 03, 031204, (July 2015) https://doi.org/10.1117/12.10.1117/1.JMM.14.3.031204

KEYWORDS: Etching, Scanning electron microscopy, Silicon, Inspection, Semiconducting wafers, Diffractive optical elements, Defect inspection, Thin film coatings, Directed self assembly

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Proceedings Article | 20 March 2015 Paper

Point-of-use filtration strategy for negative tone developer in extended immersion and extreme-ultraviolet (EUV) lithography

L. D'Urzo, P. Foubert, H. Stokes, Y. Thouroude, A. Xia, Aiwen Wu

Proceedings Volume 9425, 94251J (2015) https://doi.org/10.1117/12.2185599

KEYWORDS: Extreme ultraviolet, Particles, Lithography, Extreme ultraviolet lithography, Immersion lithography, Metals, Semiconducting wafers, Bridges, Molecular bridges, Scanning electron microscopy

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Proceedings Article | 20 March 2015 Paper

A comprehensive approach for micro and multiple bridges mitigation in immersion photolithography

L. D'Urzo, W. Schollaert, X. Buch, H. Stokes, Y. Thouroude

Proceedings Volume 9425, 94251Y (2015) https://doi.org/10.1117/12.2085627

KEYWORDS: Bridges, Standards development, Molecular bridges, Particles, Optical lithography, Line width roughness, Photoresist materials, Polymers, Metals, Lithography

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Proceedings Article | 19 March 2015 Paper

Defect mitigation and root cause studies in IMEC's 14nm half-pitch chemo-epitaxy DSA flow

Hari Pathangi, Boon Teik Chan, Hareen Bayana, Nadia Vandenbroeck, Dieter Van Den Heuvel, Lieve Van Look, Paulina Rincon-Delgadillo, Yi Cao, JiHoon Kim, Guanyang Lin, Doni Parnell, Kathleen Nafus, Ryota Harukawa, Ito Chikashi, Venkat Nagaswami, Lucia D'Urzo, Roel Gronheid, Paul Nealey

Proceedings Volume 9423, 94230M (2015) https://doi.org/10.1117/12.2085889

KEYWORDS: Etching, Silicon, Bridges, Scanning electron microscopy, Inspection, Diffractive optical elements, Semiconducting wafers, Thin film coatings, Defect inspection, Directed self assembly

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Proceedings Article | 28 March 2014 Paper

Defect reduction and defect stability in IMEC's 14nm half-pitch chemo-epitaxy DSA flow

Roel Gronheid, Paulina Rincon Delgadillo, Hari Pathangi, Dieter Van den Heuvel, Doni Parnell, Boon Teik Chan, Yu-Tsung Lee, Lieve Van Look, Yi Cao, YoungJun Her, Guanyang Lin, Ryota Harukawa, Venkat Nagaswami, Lucia D'Urzo, Mark Somervell, Paul Nealey

Proceedings Volume 9049, 904905 (2014) https://doi.org/10.1117/12.2047265

KEYWORDS: Etching, Inspection, Silicon, Semiconducting wafers, Scanning electron microscopy, Defect inspection, Polymethylmethacrylate, Particles, Critical dimension metrology, Directed self assembly

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Showing 5 of 11 publications

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