The accurate determination of the azimuth of a given direction, e.g., the true (geographic) North, is of fundamental importance in many fields. Just as few examples, it guides buildings construction in civil engineering, supports environmental and cartographic surveys, allows the correct positioning and stability control of concentrating solar power plants, as well as of airport installations, provides the geographic North reference for geomagnetic measurements, contributes to the interpretation of the orientation choices of ancient constructions in archeoastronomy, can be the primary benchmark to calibrate other compasses or gyroscopes. When aiming at reaching azimuth measurements with accuracies well below 1°, magnetic compasses are unreliable: firstly, they indicate the magnetic North rather than the geographic one; secondly, they are heavily influenced by possible surrounding ferromagnetic items.
The main characteristics of the ENEA Discharge Produced Plasma (DPP) Extreme Ultraviolet (EUV) source are presented together with results of irradiations of various materials. The DPP EUV source, based on a Xe–plasma heated up to a temperature of 30 ÷ 40 eV, emits more than 30 mJ/sr/shot at 10 Hz rep. rate in the 10 ÷ 18 nm wavelength spectral range. The DPP is equipped with a debris mitigation system to protect particularly delicate components needed for patterning applications. The ENEA source has been successfully utilized for sub–micrometer pattern generation on photonic materials and on specifically designed chemically amplified resists. Details down to 100 nm have been replicated on such photoresists by our laboratory–scale apparatus for contact EUV lithography. Preliminary EUV irradiations of graphene films aimed at modifying its properties have been also performed.
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