The In-Zn oxide films with a laminated multilayer structure of each layer of In2O3 and ZnO were grown on glass substrates or polycarbonate disk substrates by pulsed laser deposition using a split target consisted of In2O3 and ZnO. For the disk sample with 60-layers, which was approximately 30 nm thick, fabricated at the trace ratio (the ratio of time required to irradiate each part of the split target) of In2O3:ZnO = 1:1, the CNR of approximately 60 dB was obtained for 3T signal (f = 58.5 MHz, λ = 406 nm, NA = 0.65).
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