Mr. Masakazu Sanada Profile

Masakazu Sanada

at SCREEN Holdings

SPIE Involvement:

Author

Publications (15)

Proceedings Article | 1 April 2009 Paper

Paper

Backside EBR process performance with various wafer properties

Tomohiro Goto, Kazuhito Shigemori, Rik Vangheluwe, Daub Erich, Masakazu Sanada

Proceedings Volume 7273, 727329 (2009) https://doi.org/10.1117/12.814079

KEYWORDS: Semiconducting wafers, Immersion lithography, Particles, Thin film coatings, System integration, Coating, Chemical vapor deposition, Dielectrics, Carbon, Edge roughness

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Proceedings Article | 16 April 2008 Paper

Paper

Immersion lithography bevel solutions

Len Tedeschi, Osamu Tamada, Masakazu Sanada, Shuichi Yasuda, Masaya Asai

Proceedings Volume 6922, 692206 (2008) https://doi.org/10.1117/12.797082

KEYWORDS: Semiconducting wafers, Particles, Printing, Inspection, Immersion lithography, Coating, Scanners, Lithography, Contamination, Semiconductor manufacturing

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Proceedings Article | 24 March 2008 Paper

Paper

Film stacking architecture for immersion lithography process

Tomohiro Goto, Masakazu Sanada, Tadashi Miyagi, Kazuhito Shigemori, Masashi Kanaoka, Shuichi Yasuda, Osamu Tamada, Masaya Asai

Proceedings Volume 6922, 69222X (2008) https://doi.org/10.1117/12.772411

KEYWORDS: Semiconducting wafers, Particles, Lithography, Coating, Diffractive optical elements, Immersion lithography, Thin film coatings, Inspection, Silicon, Scanning electron microscopy

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Proceedings Article | 23 March 2007 Paper

Paper

Formulated surface conditioners in 50-nm immersion lithography: simultaneously reducing pattern collapse and line-width roughness

Minoru Sugiyama, Masakazu Sanada, Suping Wang, Patrick Wong, Stephan Sinkwitz, Manuel Jaramillo, Gene Parris

Proceedings Volume 6519, 651927 (2007) https://doi.org/10.1117/12.712188

KEYWORDS: Line width roughness, Electroluminescence, Semiconducting wafers, Lithography, Immersion lithography, Finite element methods, Photoresist processing, Scanners, Scanning electron microscopy, Optical lithography

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Proceedings Article | 29 March 2006 Paper

Paper

Analysis of the effect of mechanical strength of the resist film on pattern collapse behavior using atomic force microscope

Osamu Tamada, Tomohiro Goto, Masakazu Sanada, Takahiro Moriuchi, Takayoshi Niiyama, Akira Kawai

Proceedings Volume 6153, 61533P (2006) https://doi.org/10.1117/12.651999

KEYWORDS: Refractive index, Photoresist processing, Temperature metrology, Atomic force microscope, Atomic force microscopy, Ellipsometry, Semiconducting wafers, Scanning electron microscopy, Head-mounted displays, Semiconductor manufacturing

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Proceedings Article | 29 March 2006 Paper

Paper

Adhesion and removal of micro bubbles for immersion lithography

Akira Kawai, Takayoshi Niiyama, Hotaka Endo, Masaki Yamanaka, Atsushi Ishikawa, Kenta Suzuki, Osamu Tamada, Masakazu Sanada

Proceedings Volume 6153, 61531S (2006) https://doi.org/10.1117/12.655444

KEYWORDS: Atomic force microscopy, Silicon, Niobium, Interfaces, Particles, Excimers, Liquids, Stereolithography, Immersion lithography, Solids

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Proceedings Article | 29 March 2006 Paper

Paper

Formulated surface conditioners to enhance the non-collapse window and maintain defect control: a bi-functional approach for sub-100-nm lithography

Masakazu Sanada, Minoru Sugiyama, Manuel Jaramillo, Peng Zhang, Shawn Cassel

Proceedings Volume 6153, 615331 (2006) https://doi.org/10.1117/12.656661

KEYWORDS: Semiconducting wafers, Scanning electron microscopy, Critical dimension metrology, Lithography, Photoresist processing, Optical proximity correction, Manufacturing, Reticles, Wafer-level optics, Control systems

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Proceedings Article | 29 March 2006 Paper

Paper

Trap mechanism of micro bubble in micro concave patterns

Akira Kawai, Tomotaka Ariga, Simpei Hori, Masahiko Harumoto, Osamu Tamada, Masakazu Sanada

Proceedings Volume 6153, 61531T (2006) https://doi.org/10.1117/12.655447

KEYWORDS: Interfaces, Liquids, Manufacturing, Thermodynamics, Immersion lithography, Lawrencium, Plating, Photoresist processing, Etching, Light scattering

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Proceedings Article | 29 March 2006 Paper

Paper

Solid defects condensation during watermark formation for immersion lithography

Takayoshi Niiyama, Akira Kawai, Simpei Hori, Masahiko Harumoto, Osamu Tamada, Masakazu Sanada

Proceedings Volume 6153, 61531U (2006) https://doi.org/10.1117/12.655420

KEYWORDS: Digital watermarking, Particles, Silicon, Liquids, Immersion lithography, Solids, Thermodynamics, Liquid lenses, Convection, Interfaces

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Proceedings Article | 4 May 2005 Paper

Paper

Adhesion and removal behavior of nanoscale bubble on resist film surface for immersion lithography

Akira Kawai, Atsushi Ishikawa, Takayoshi Niiyama, Masahiko Harumoto, Osamu Tamada, Masakazu Sanada

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.599157

KEYWORDS: Atomic force microscopy, Immersion lithography, Copper, Excimers, Interfaces, Liquids, Stereolithography, Atomic force microscope, Photography, Photoresist processing

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Proceedings Article | 4 May 2005 Paper

Paper

Mechanism study of defect improvement by short develop time process

Osamu Tamada, Masakazu Sanada

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.599171

KEYWORDS: Photoresist processing, Semiconducting wafers, Inspection, Infrared spectroscopy, Ions, Bridges, Molecular bridges, Image processing, Spectroscopy, Polymers

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Proceedings Article | 4 May 2005 Paper

Paper

Analysis for collapse behavior of resist pattern in short develop time process using atomic force microscope

Masakazu Sanada, Osamu Tamada, Atsushi Ishikawa, Akira Kawai

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.599152

KEYWORDS: Interfaces, Refractive index, Photoresist processing, Atomic force microscopy, Water, Atomic force microscope, Semiconducting wafers, Thermodynamics, Scanning electron microscopy, Polymers

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Proceedings Article | 4 May 2005 Paper

Paper

Mechanical strength of resist film analyzed by tip indentation method

Osamu Tamada, Masakazu Sanada, Atsushi Ishikawa, Takayoshi Niiyama, Akira Kawai

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.599195

KEYWORDS: Refractive index, Atomic force microscopy, Polymers, Photoresist processing, Polymer thin films, Semiconducting wafers, Image processing, Temperature metrology, Ellipsometry, Atomic force microscope

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Proceedings Article | 14 May 2004 Paper

Paper

Short develop time process with novel develop application system

Masakazu Sanada, Osamu Tamada, Masahiko Harumoto

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.532809

KEYWORDS: Semiconducting wafers, Photoresist processing, Critical dimension metrology, Electroluminescence, Surface roughness, Lanthanum, Deep ultraviolet, Scanning electron microscopy, Semiconductors, Atomic force microscopy

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Proceedings Article | 12 June 2003 Paper

Paper

Improvement of resist process margin with short develop time process

Osamu Tamada, Masakazu Sanada

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.483752

KEYWORDS: Photoresist processing, Electroluminescence, Critical dimension metrology, Semiconducting wafers, Interfaces, Scanning electron microscopy, Image processing, Chemical analysis, Inspection, Reticles

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Showing 5 of 15 publications

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