Dr. Matteo Lorenzoni Profile

Dr. Matteo Lorenzoni

at Institute of Microelectronics of Barcelona IMB-CNM

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Author

Publications (5)

Proceedings Article | 21 October 2015 Paper

Continuous monitoring of tip radius during atomic force microscopy imaging

J. Fraxedas, F. Pérez-Murano, F. Gramazio, M. Lorenzoni, E. Rull Trinidad, U. Staufer

Proceedings Volume 9636, 96360O (2015) https://doi.org/10.1117/12.2196951

KEYWORDS: Atomic force microscopy, Polymethylmethacrylate, Silicon, Microfabrication, Computer simulations, Amplitude modulation, Polymers, Metrology, Actinium, Microscopy

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SPIE Journal Paper | 21 September 2015

Creation of guiding patterns for directed self-assembly of block copolymers by resistless direct e-beam exposure

Laura Evangelio, Marta Fernández-Regúlez, Xavier Borrisé, Matteo Lorenzoni, Jordi Fraxedas, Francesc Pérez-Murano

JM3, Vol. 14, Issue 03, 033511, (September 2015) https://doi.org/10.1117/12.10.1117/1.JMM.14.3.033511

KEYWORDS: Polymers, Electron beam lithography, Atomic force microscopy, Silicon, Photoresist processing, Deep ultraviolet, Annealing, Polymethylmethacrylate, Electrons, Directed self assembly

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SPIE Journal Paper | 11 September 2015

Nanomechanical properties of solvent cast polystyrene and poly(methyl methacrylate) polymer blends and self-assembled block copolymers

Matteo Lorenzoni, Laura Evangelio, Célia Nicolet, Christophe Navarro, Alvaro San Paulo, Gemma Rius, Francesc Pérez-Murano

JM3, Vol. 14, Issue 03, 033509, (September 2015) https://doi.org/10.1117/12.10.1117/1.JMM.14.3.033509

KEYWORDS: Polymethylmethacrylate, Polymers, Atomic force microscopy, Polymer thin films, Thin films, Dewetting, Silicon, Plasma, Manganese, Spatial resolution

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Proceedings Article | 27 March 2015 Paper

Creation of guiding patterns for directed self-assembly of block copolymers by resistless direct e-beam exposure

Laura Evangelio, Marta Fernández-Regúlez, Xavier Borrisé, Matteo Lorenzoni, Jordi Fraxedas, Francesc Pérez-Murano

Proceedings Volume 9423, 942326 (2015) https://doi.org/10.1117/12.2085830

KEYWORDS: Polymers, Electron beam lithography, Atomic force microscopy, Photoresist processing, Silicon, Polymethylmethacrylate, Electrons, Deep ultraviolet, Molecular self-assembly, Directed self assembly

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Proceedings Article | 27 March 2015 Paper

Nanomechanical properties of solvent cast PS and PMMA polymer blends and block co-polymers

Matteo Lorenzoni, Laura Evangelio, Célia Nicolet, Christophe Navarro, Alvaro San Paulo, Francesc Perez Murano

Proceedings Volume 9423, 942325 (2015) https://doi.org/10.1117/12.2085829

KEYWORDS: Polymethylmethacrylate, Polymers, Picosecond phenomena, Erbium, Atomic force microscopy, Polymer thin films, Dewetting, Thin films, Silicon, Manganese

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