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Dr. Michael W. Legenza
at Air Products and Chemicals Inc
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Publications (1)
Proceedings Article | 6 April 2007 Paper
Depth-of-focus (DOF) and line-width roughness (LWR) performance of novel surface conditioner solutions for immersion lithography
Bo Jou Lu, Yongfa Huang, H. Tseng, Chun Chi Yu, Ling-Jen Meng, Ming-Chi Liao, Michale Legenza
Proceedings Volume 6519, 651942 (2007) https://doi.org/10.1117/12.711938
KEYWORDS: Line width roughness, Etching, Photoresist processing, Optical proximity correction, Image processing, Semiconducting wafers, Immersion lithography, Lithography, Line edge roughness, Scanning electron microscopy
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