Microscanning is an optical technique used principally to enhance the resolution of cameras using 2-D arrays of detectors. It provides small (typically half pixel pitch) movements of the image across the detector array so that a high-resolution image can be built up by interlacing a number of fields. Microscanning may also be used to provide information to allow non-uniformity correction of the image. Microscanning is frequently used in thermal cameras, where detector resolutions are limited, and where uniformity correction is critical because of the low contrast of the image. In this paper we look at the consequences of microscanning by lateral motions of a lens. It is found that in general the motion of the image caused by motion of the lens varies with position in the field of view, and is different in the radial and tangential directions. This difference is what we refer to here as microscan distortion. This paper describes how to minimise or completely eliminate distortions in the microscan pattern. Eliminating this distortion is particularly useful where the microscan is used to support scene-based uniformity correction.
The design of continuous zoom systems has several challenges. One that is not often though about by the designer is that of setting the system once it has been assembled. The selection of the number and position of “setting points” (discrete positions in the zoom range) at which to perform the setting is one that has sometimes been left to educated guesswork. This paper will walk through some steps that help in assessing the viability of setting laws as well as proposing a way to optimise the number and position of setting points thereby minimising the cost of setting the lens.
With recent developments in multispectral detector technology, the interest in common aperture, common focal plane multispectral imaging systems is increasing. Such systems are particularly desirable for military applications, where increased levels of target discrimination and identification are required in cost-effective, rugged, lightweight systems. During the optical design of dual waveband or multispectral systems, the options for material selection are limited. This selection becomes even more restrictive for military applications, where material resilience, thermal properties, and color correction must be considered. We discuss the design challenges that lightweight multispectral common aperture systems present, along with some potential design solutions. Consideration is given to material selection for optimum color correction, as well as material resilience and thermal correction. This discussion is supported using design examples currently in development at Qioptiq.
KEYWORDS: Diffraction, Modulation transfer functions, Chemical elements, Long wavelength infrared, Diamond, Short wave infrared radiation, Modulation, Sensors, Colorimetry, Defense technologies
With the recent developments in multi-spectral detector technology the interest in common aperture, common focal plane
multi-spectral imaging systems is increasing. Such systems are particularly desirable for military applications where
increased levels of target discrimination and identification are required in cost-effective, rugged, lightweight systems.
During the optical design of dual waveband or multi-spectral systems, the options for material selection are limited. This
selection becomes even more restrictive for military applications as material resilience and thermal properties must be
considered in addition to colour correction.
In this paper we discuss the design challenges that lightweight multi-spectral common aperture systems present along
with some potential design solutions. Consideration will be given to material selection for optimum colour correction as
well as material resilience and thermal correction. This discussion is supported using design examples that are currently
in development at Qioptiq.
Conference Committee Involvement (10)
Advanced Optics for Imaging Applications: UV through LWIR X
13 April 2025 | Orlando, Florida, United States
Advanced Optics for Imaging Applications: UV through LWIR IX
22 April 2024 | National Harbor, Maryland, United States
Advanced Optics for Imaging Applications: UV through LWIR VIII
1 May 2023 | Orlando, Florida, United States
Advanced Optics for Imaging Applications: UV through LWIR VII
3 April 2022 | Orlando, Florida, United States
Advanced Optics for Imaging Applications: UV through LWIR VI
12 April 2021 | Online Only, Florida, United States
Advanced Optics for Imaging Applications: UV through LWIR V
27 April 2020 | Online Only, California, United States
Advanced Optics for Imaging Applications: UV through LWIR IV
14 April 2019 | Baltimore, MD, United States
Advanced Optics for Defense Applications: UV through LWIR III
15 April 2018 | Orlando, FL, United States
Advanced Optics for Defense Applications: UV through LWIR II
9 April 2017 | Anaheim, CA, United States
Advanced Optics for Defense Applications: UV through LWIR
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