Significance: Line-field confocal optical coherence tomography (LC-OCT) is a recently introduced high-resolution imaging modality based on a combination of low-coherence optical interferometry and reflectance confocal optical microscopy with line illumination and line detection. Capable of producing three-dimensional (3D) images of the skin with cellular resolution, in vivo, LC-OCT has been mainly applied in dermatology and dermo-cosmetology. The LC-OCT devices capable of acquiring 3D images reported so far are based on a Linnik interferometer using two identical microscope objectives. In this configuration, LC-OCT cannot be designed to be a very compact and light device, and the image acquisition speed is limited.Aim: The objective of this work was to develop a more compact and lighter LC-OCT device that is capable of acquiring images faster without significant degradation of the resolution and with optimized detection sensitivity.Approach: We developed an LC-OCT device based on a Mirau interferometer using a single objective. Dynamic adjustment of the camera frequency during the depth scan is implemented, using a faster camera and a more powerful light source. The reflectivity of the beam-splitter in the Mirau interferometer was optimized to maximize the detection sensitivity. A galvanometer scanner was incorporated into the device for scanning the illumination line laterally. A stack of adjacent B-scans, constituting a 3D image, can thus be acquired.Results: The device is able to acquire and display B-scans at 17 fps. 3D images with a quasi-isotropic resolution of ∼1.5 μm (1.3, 1.9, and 1.1 μm in the x , y, and z directions, respectively) over a field of 940 μm × 600 μm × 350 μm (x × y × z) can be obtained. 3D imaging of human skin at cellular resolution, in vivo, is reported.Conclusions: The acquisition rate of the B-scans, at 17 fps, is unprecedented in LC-OCT. Compared with the conventional LC-OCT devices based on a Linnik interferometer, the reported Mirau-based LC-OCT device can acquire B-scans ∼2 times faster. With potential advantages in terms of compactness and weight, a Mirau-based device could easily be integrated into a smaller and lighter handheld probe for use by dermatologists in their daily medical practice.
Line-field confocal optical coherence tomography (LC-OCT) is a high-resolution imaging technique based on a combination of time-domain optical coherence tomography and confocal optical microscopy, with line illumination using a spatially coherent broadband light source and line detection using a line camera. We present a LC-OCT device based on a Mirau interferometer consisting of an immersion microscope objective incorporating a miniature interferometer. The device can acquire 17 B-scans per second, which is the fastest acquisition rate reported to date in LC-OCT. By stacking multiple adjacent B-scans, a 3D image with a lateral field of view of 940 μm × 600 μm over a depth of 350 μm can be acquired. Compared to the conventional LC-OCT devices based on a Linnik interferometer, this Mirau-based device has advantages in terms of compactness, weight, and B-scan acquisition speed. Imaging of skin tissue with near-isotropic resolution of ~1.5 micron is demonstrated in vivo.
Manufacturing processes from the private and academic sectors were used to deposit anti-reflective and high-reflective coatings composed of Ta2O5 - SiO2 multilayers. Used deposition techniques included three Ion Assisted Deposition (IAD) systems and an Ion Beam Sputtering (IBS) system. Coatings were performed on fused silica (Corning 7980) substrates polished by two different suppliers. LIDT Measurements were performed using a Q-Switched Nd:YAG laser operating at 1064nm. The paper presents a comparison of the coatings in terms of laser damage threshold values, optical properties and surface quality.
The spectroscopic Mueller polarimetry in conical diffraction was applied for the metrological characterization of
the one-dimensional (1D) holographic gratings, used for the fabrication of nanoimprint molding tool. First we
characterized the master grating that consists of patterned resist layer on chromium-covered glass and then we
studied replicated diffraction grating made of nickel. The experimental spectra of Mueller matrix of both samples
taken at different azimuthal angles were fitted with symmetric trapezoidal model. The optimal values of gratings
critical dimensions (CDs) and height were confirmed by atomic force microscopy (AFM) measurements. The
calculated profiles of corresponding master and replica gratings are found to be complementary. We showed that
Mueller polarimetry in conical diffraction, as a fast and non-contact optical characterization technique, can provide
the basis for the metrology of the molding tool fabrication step in the nanoimprint technique.
We designed and built Matrix Distributed ECR (MDECR) PECVD reactor dedicated for dielectric filters deposition and equipped it with multiple sensors for process control. Planar matrix geometry of plasma source is based on electron cyclotron resonance effect at 2.45 GHz microwave frequency and provides scalability of the deposition on large area substrates. High (up to 5 nm/sec) deposition rate obtained due to high dissociation efficiency and careful design of the gas injection system. Optical emission spectroscopy, quadrupole mass-spectrometry and spectroscopic and multi-channel kinetic ellipsometry are installed for in-situ studies and control of the film deposition. We performed studies of the nature of high-density plasma discharge in silane, oxygen and nitrogen mixture and correlated its properties with optical and physical properties of deposited materials. To demonstrate the capabilities, a wide band gradient index antireflection coating on glass was realized by deposition of SiOxNy alloy thin films. The predefined variation of an index in a profile is obtained by changing the flows of precursors. Real-time control is performed with multi-channel kinetic ellipsometry.
We report on a novel high density ECR plasma deposition system based on matrix-distributed configuration specifically designed for large area applications. System is capable of depositing uniform high quality silica films with rate of up to 10 nm/s onto 300 mm wafers. Films are grown from silane and oxygen, while nitrogen is used for doping. Optical properties of the layers have been assessed by UV-visible ellipsometry while their chemical composition have been evaluated by ERDA and RBS techniques. FTIR spectroscopy was used to evaluate quality of the films for application in communications. Preliminary data show that films are perfectly stoichiometric and contain hydrogen in amount between 1 and 4 per cent, depending on experimental conditions. We have also deposited films doped with nitrogen doping and were able to control precisely refractive index of the material with simple gas flow regulation and in-situ kinetic ellipsometry measurements.
Real time monitoring and control, by multiwavelength phase modulated ellipsometry of the growth of plasma deposited optical structures is presented. The transparent layers consists of SiO2 SiNx and oxynitrides. We present an efficient method for the estimation of the optical parameters based on a sliding window containing the last acquired measurements. This method is used to monitor the deposition of multilayer coatings with homogenous deposition conditions, and is also used in feedback control of such coatings. The sliding window method is further developed to follow slowly time-varying parameters such as the deposition rate. A preliminary study of a fast novel method based on the same principle for real time monitoring of refractive index gradients is described. As an example, the real time monitoring of the growth of a linear gradient index is demonstrated.
The computer-controlled electron cyclotron resonance plasma enhanced chemical vapor deposition of SiOxNy was used for the manufacturing of optical interference coatings with inhomogeneous and traditional multilayer refractive index profiles. Such complex structures as triple-band rugate optical interference filters and graded refractive index antireflection coatings were grown. The design of coatings was performed using measured optical constants of the SiOxNy-system.
An all-fiber Fabry-Perot interferometer using coherence demultiplexing and rugate mirror reflectors grown with electron cyclotron resonance plasma enhanced chemical vapor deposition (ECR-PECVD) on the fiber ends is proposed. The interferometer consists of a laser diode source, two optical fiber cavities, three rugate mirrors, a phase modulator and phase detection system. Coherence demultiplexing allowed the use of fiber cavities of several meters in length with a partially coherent illuminating light source. Truly inhomogeneous refractive index mirrors were designed taking into account dispersion and losses of SiOxNy at the required wavelength of 1.3 micrometers . The reflectance/transmittance ratio during growth were adjustable from 0.05/0.95 to 0.95/0.05 and mirrors used in the experimental interferometer had no inal reflectances of 40%, 68%, and 40% respectively. Design and fabrication procedures permit implementation of window functions and matching layers for flexible control over transmittance and reflectance charateristics. The long-cavity Fabry-Perot sensor was demonstrated for use as a strain gauge. Good agreement was shown with results obtained by a conventional strain gauge.
Fiber Bragg grating written into the core by a sideways exposure to an ultra violet-laser interference pattern have shown great promise for use as practical strain sensors in large structures. One way to sense the strain of the grating is by using active interrogation whereby the fiber Bragg grating is used as the optical feedback element of a laser cavity, and the lasing wavelength is monitored as the system output. Compared to passive broadband techniques, the fiber Bragg laser sensor provides much stronger optical signals, thus leading to a much improved signal-to- noise ratio. In order to optimize the power output from this sensor, one wishes to model the output from the fiber laser in terms of the Er-doped fiber parameters, the pump characteristics, the cavity mirror reflectivities and losses in the cavity. In this paper we solve the rate and propagation equations for a Fabry Perot cavity to obtain explicit closed form equations for the output power, threshold pump power, as well as for the optimum length. Experiments where we used an electron cyclotron resonance plasma enhanced chemical vapor deposition apparatus to deposit dielectric thin films on one fiber end point in order to change the reflectivity of a cavity mirror, while monitoring the reflectivity in situ, verify the validity of the model.
Electron cyclotron resonance plasma enhanced chemical vapor deposition was used to deposit thin films of SiNx of different composition from mixtures of N2 and 30% SiH4 in Ar onto different substrates. Index of refraction ranging from 2.05 to 3.8 (measured at 632.8 nm) was obtained by simply altering the gas flow ratio. A growth rate of 2 - 4 nm/min was obtained depending on experimental conditions. The data was used in the design and computer-controlled fabrication of one- and two-band rugate optical interference filters. The excursion of the continuously varying refractive index was chosen to be 0.8 - 1.2, and window functions and matching layers at both sides were employed for sidelobe suppression. Measured reflection patterns of filters show good agreement with theoretically simulated ones. Filters designed for a center wavelength of 1.0 micrometers , with a total thickness of 2.1 micrometers , achieved maximal reflectance of 97% in the stopband. Typical bandwidth was 240 nm. The two-band filter was designed for stopbands at 1.0 micrometers and 0.77 micrometers with reflectance of 98% and 96% and bandwidths of 150 nm and 120 nm, respectively. Total thickness was 3.33 micrometers . Deposition of filters on optical fibers was also successfully undertaken using one of the fibers for in-situ monitoring of the deposition process.
The properties of thin SiNx films deposited by computer-controlled electron cyclotron resonance plasma-enhanced chemical vapor deposition (ECR-PECVD) from a mixture of SiH4 and N2 onto sapphire substrates were investigated by optical transmission spectroscopy in the wavelength range 200 to 2600 nm. The wavelength dependencies of the refractive index n, extinction coefficient k, absorption coefficient α, and the optical bandgap Eg of the films were studied. The optical properties of SiNx, were found to be strongly dependent on the gas flow ratio during deposition. The optical band gap displays a blue shift with increase of nitrogen content in the layer with values ranging from 1.7 to 4.2 eV.
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