Dr. Philipp Jaschinsky Profile

Dr. Philipp Jaschinsky

at GLOBALFOUNDRIES Dresden Module One LLC & Co KG

SPIE Involvement:

Author

Publications (6)

Proceedings Article | 21 March 2012 Paper

Feasibility study of optical/e-beam complementary lithography

Christoph Hohle, Kang-Hoon Choi, Martin Freitag, Manuela Gutsch, Philipp Jaschinsky, Frank Kahlenberg, Christof Klein, Jan Klikovits, Jan Paul, Matthias Rudolph, Xaver Thrun

Proceedings Volume 8323, 83232C (2012) https://doi.org/10.1117/12.916386

KEYWORDS: Etching, Lithography, Electron beam lithography, Silicon, Semiconducting wafers, Photomasks, 193nm lithography, Electron beam direct write lithography, Beam shaping, Optics manufacturing

Read Abstract +

Proceedings Article | 27 May 2010 Paper

Practical resist model calibration for e-beam direct write processes

Martin Schulz, Hans-Jürgen Stock, Ulrich Klostermann, Wolfgang Hoppe, Lars Bomholt, Philipp Jaschinsky, Kang-Hoon Choi, Manuela Gutsch, Holger Sailer, Stephan Martens

Proceedings Volume 7748, 774818 (2010) https://doi.org/10.1117/12.866695

KEYWORDS: Calibration, Monte Carlo methods, Photoresist processing, Electron beam lithography, Data modeling, Process modeling, Scanning electron microscopy, Computer simulations, Scattering, Chemically amplified resists

Read Abstract +

Proceedings Article | 3 April 2010 Paper

Conventional and reversed image printing in electron beam direct write lithography with proximity effect corrections based on dose and shape modification

Kang-Hoon Choi, Manuela Gutsch, Martin Freitag, Katja Keil, Philipp Jaschinsky, Christoph Hohle

Proceedings Volume 7637, 76370W (2010) https://doi.org/10.1117/12.846514

KEYWORDS: Electron beam direct write lithography, Cadmium sulfide, Image processing, Printing, Line width roughness, Line edge roughness, Electron beams, Point spread functions, Photoresist processing, Metrology

Read Abstract +

Proceedings Article | 27 May 2009 Paper

Design verification for sub-70-nm DRAM nodes via metal fix using E-beam direct write

K. Keil, P. Jaschinsky, C. Hohle, K.-H. Choi, R. Schneider, M. Tesauro, F. Thrum, R. Zimmermann, J. Kretz

Proceedings Volume 7470, 747017 (2009) https://doi.org/10.1117/12.835206

KEYWORDS: Metals, Electron beam direct write lithography, Semiconducting wafers, Photomasks, Electron beam lithography, Wafer-level optics, Integrated optics, Etching, Reticles, Printing

Read Abstract +

Proceedings Article | 18 March 2009 Paper

PML2: the maskless multibeam solution for the 22nm node and beyond

C. Klein, E. Platzgummer, J. Klikovits, W. Piller, H. Loeschner, T. Bejdak, P. Dolezel, V. Kolarik, W. Klingler, F. Letzkus, J. Butschke, M. Irmscher, M. Witt, W. Pilz, P. Jaschinsky, F. Thrum, C. Hohle, J. Kretz, J. Nogatch, A. Zepka

Proceedings Volume 7271, 72710N (2009) https://doi.org/10.1117/12.813670

KEYWORDS: Semiconducting wafers, Lithography, Electron beams, Electrodes, Prototyping, Electron beam lithography, Electron beam direct write lithography, Silicon, Optical alignment, Photomasks

Read Abstract +

Proceedings Article | 18 March 2009 Paper

Fabrication of metrology test structures for future technology nodes using high-resolution variable-shaped e-beam direct write

László Szikszai, Philipp Jaschinsky, Katja Keil, Marc Hauptmann, Manfred Mört, Uwe Seifert, Christoph Hohle, Kang-Hoon Choi, Frank Thrum, Johannes Kretz, Vaeriano Ferreras Paz, Arie den Boef

Proceedings Volume 7271, 72712M (2009) https://doi.org/10.1117/12.814181

KEYWORDS: Scatterometry, Metrology, Line edge roughness, Critical dimension metrology, Line width roughness, Semiconducting wafers, Electron beams, Electron beam direct write lithography, Lithography, Cadmium

Read Abstract +

Showing 5 of 6 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years